FR2354575A1 - Couche sensible utilisable dans un procede pour l'enregistrement d'images au moyen d'un rayonnement laser - Google Patents

Couche sensible utilisable dans un procede pour l'enregistrement d'images au moyen d'un rayonnement laser

Info

Publication number
FR2354575A1
FR2354575A1 FR7717657A FR7717657A FR2354575A1 FR 2354575 A1 FR2354575 A1 FR 2354575A1 FR 7717657 A FR7717657 A FR 7717657A FR 7717657 A FR7717657 A FR 7717657A FR 2354575 A1 FR2354575 A1 FR 2354575A1
Authority
FR
France
Prior art keywords
binder
photosensitive layer
recording process
laser radiation
opt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7717657A
Other languages
English (en)
French (fr)
Other versions
FR2354575B1 (enrdf_load_stackoverflow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CNA Holdings LLC
Original Assignee
American Hoechst Corp
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Hoechst Corp, Hoechst Celanese Corp filed Critical American Hoechst Corp
Publication of FR2354575A1 publication Critical patent/FR2354575A1/fr
Application granted granted Critical
Publication of FR2354575B1 publication Critical patent/FR2354575B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laser Beam Printer (AREA)
  • Exposure Or Original Feeding In Electrophotography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Dot-Matrix Printers And Others (AREA)
FR7717657A 1976-06-10 1977-06-09 Couche sensible utilisable dans un procede pour l'enregistrement d'images au moyen d'un rayonnement laser Granted FR2354575A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US69469376A 1976-06-10 1976-06-10

Publications (2)

Publication Number Publication Date
FR2354575A1 true FR2354575A1 (fr) 1978-01-06
FR2354575B1 FR2354575B1 (enrdf_load_stackoverflow) 1980-02-15

Family

ID=24789881

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7717657A Granted FR2354575A1 (fr) 1976-06-10 1977-06-09 Couche sensible utilisable dans un procede pour l'enregistrement d'images au moyen d'un rayonnement laser

Country Status (8)

Country Link
JP (1) JPS52151024A (enrdf_load_stackoverflow)
BE (1) BE855507A (enrdf_load_stackoverflow)
BR (1) BR7703742A (enrdf_load_stackoverflow)
CA (1) CA1094860A (enrdf_load_stackoverflow)
DE (1) DE2725309A1 (enrdf_load_stackoverflow)
FR (1) FR2354575A1 (enrdf_load_stackoverflow)
NL (1) NL7706254A (enrdf_load_stackoverflow)
SE (1) SE7706658L (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0375929A3 (en) * 1988-12-30 1991-03-13 International Business Machines Corporation Method for patterning cationic curable photoresist

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4419675A (en) * 1979-05-24 1983-12-06 American Hoechst Corporation Imaging system and method for printed circuit artwork and the like
EP0089506A3 (de) * 1982-03-18 1984-04-11 American Hoechst Corporation Lichtempfindliches Gemisch auf Basis von Diazoniumsalz-Polykondensationsprodukten und daraus hergestelltes lichtempfindliches Aufzeichnungsmaterial
DE3660339D1 (en) * 1985-01-15 1988-07-28 Merck Patent Gmbh Photoresist compositions with enhanced sensitivity using polyamide esters
DE3606266A1 (de) * 1986-02-27 1987-09-03 Basf Ag Lichtempfindliches aufzeichnungselement
DE3733874A1 (de) * 1987-10-07 1989-04-27 Hell Rudolf Dr Ing Gmbh Druckformherstellung mittels auswaschbarem bildtraeger
US5814431A (en) 1996-01-10 1998-09-29 Mitsubishi Chemical Corporation Photosensitive composition and lithographic printing plate
JP3814961B2 (ja) 1996-08-06 2006-08-30 三菱化学株式会社 ポジ型感光性印刷版

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0375929A3 (en) * 1988-12-30 1991-03-13 International Business Machines Corporation Method for patterning cationic curable photoresist

Also Published As

Publication number Publication date
BR7703742A (pt) 1978-04-04
DE2725309A1 (de) 1977-12-22
FR2354575B1 (enrdf_load_stackoverflow) 1980-02-15
BE855507A (fr) 1977-12-08
NL7706254A (nl) 1977-12-13
JPS52151024A (en) 1977-12-15
CA1094860A (en) 1981-02-03
SE7706658L (sv) 1977-12-11

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Legal Events

Date Code Title Description
ST Notification of lapse