FR2343330A1 - Procede de masticage de disques semi-conducteurs - Google Patents

Procede de masticage de disques semi-conducteurs

Info

Publication number
FR2343330A1
FR2343330A1 FR7705766A FR7705766A FR2343330A1 FR 2343330 A1 FR2343330 A1 FR 2343330A1 FR 7705766 A FR7705766 A FR 7705766A FR 7705766 A FR7705766 A FR 7705766A FR 2343330 A1 FR2343330 A1 FR 2343330A1
Authority
FR
France
Prior art keywords
sealing process
semiconductor discs
discs sealing
semiconductor
sealing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7705766A
Other languages
English (en)
Other versions
FR2343330B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siltronic AG
Original Assignee
Wacker Siltronic AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wacker Siltronic AG filed Critical Wacker Siltronic AG
Publication of FR2343330A1 publication Critical patent/FR2343330A1/fr
Application granted granted Critical
Publication of FR2343330B1 publication Critical patent/FR2343330B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10S156/918—Delaminating processes adapted for specified product, e.g. delaminating medical specimen slide
    • Y10S156/93—Semiconductive product delaminating, e.g. delaminating emiconductive wafer from underlayer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y10T156/1089—Methods of surface bonding and/or assembly therefor of discrete laminae to single face of additional lamina
    • Y10T156/1092—All laminae planar and face to face
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Laminated Bodies (AREA)
FR7705766A 1976-03-01 1977-02-28 Procede de masticage de disques semi-conducteurs Granted FR2343330A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2608427A DE2608427C2 (de) 1976-03-01 1976-03-01 Verfahren zum Aufkitten von Halbleiterscheiben

Publications (2)

Publication Number Publication Date
FR2343330A1 true FR2343330A1 (fr) 1977-09-30
FR2343330B1 FR2343330B1 (fr) 1978-10-20

Family

ID=5971267

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7705766A Granted FR2343330A1 (fr) 1976-03-01 1977-02-28 Procede de masticage de disques semi-conducteurs

Country Status (10)

Country Link
US (1) US4300965A (fr)
JP (1) JPS52106683A (fr)
BE (1) BE851892A (fr)
CA (1) CA1075579A (fr)
DE (1) DE2608427C2 (fr)
FR (1) FR2343330A1 (fr)
GB (1) GB1505488A (fr)
IT (1) IT1083481B (fr)
NL (1) NL7614209A (fr)
SE (1) SE7702273L (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0256150A1 (fr) * 1986-08-13 1988-02-24 Kabushiki Kaisha Toshiba Appareil pour lier des disques semi-conducteurs

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2809274A1 (de) * 1978-03-03 1979-09-13 Wacker Chemitronic Verfahren zur vergleichmaessigung des polierabtrages von scheiben beim polieren
US4530138A (en) * 1982-09-30 1985-07-23 Westinghouse Electric Corp. Method of making a transducer assembly
US4517041A (en) * 1982-09-30 1985-05-14 Magnetic Peripherals Inc. Method for attaching a workpiece to a workpiece carrier
JP3537688B2 (ja) * 1998-11-24 2004-06-14 富士通株式会社 磁気ヘッドの加工方法
DE10052293A1 (de) * 2000-10-20 2002-04-25 B L E Lab Equipment Gmbh Verfahren zum Aufbringen eines Substrats

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1950468A (en) * 1930-04-18 1934-03-13 Nat Aniline & Chem Co Inc Alkyd resinous composition
US2394689A (en) * 1944-01-07 1946-02-12 American Viscose Corp Method of dyeing
US3335087A (en) * 1965-12-20 1967-08-08 Pennsalt Chemical Corp Method of stripping resins
US3452133A (en) * 1966-03-07 1969-06-24 Schjeldahl Co G T Annealing of metal-plastic laminates
US3475867A (en) * 1966-12-20 1969-11-04 Monsanto Co Processing of semiconductor wafers
US3449870A (en) * 1967-01-24 1969-06-17 Geoscience Instr Corp Method and apparatus for mounting thin elements
US3586559A (en) * 1968-07-01 1971-06-22 Rohr Corp Method of temporarily securing a workpiece to a workholder
JPS5121334B2 (fr) * 1971-08-27 1976-07-01
DE2247067C3 (de) * 1972-09-26 1979-08-09 Wacker-Chemitronic Gesellschaft Fuer Elektronik-Grundstoffe Mbh, 8263 Burghausen Verwendung einer Poliersuspension zum schleierfreien Polieren von Halbleiteroberflächen
US3888053A (en) * 1973-05-29 1975-06-10 Rca Corp Method of shaping semiconductor workpiece

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0256150A1 (fr) * 1986-08-13 1988-02-24 Kabushiki Kaisha Toshiba Appareil pour lier des disques semi-conducteurs

Also Published As

Publication number Publication date
IT1083481B (it) 1985-05-21
DE2608427C2 (de) 1984-07-19
CA1075579A (fr) 1980-04-15
JPS52106683A (en) 1977-09-07
BE851892A (fr) 1977-08-29
DE2608427A1 (de) 1977-09-08
FR2343330B1 (fr) 1978-10-20
SE7702273L (sv) 1977-09-02
US4300965A (en) 1981-11-17
GB1505488A (en) 1978-03-30
JPS5641167B2 (fr) 1981-09-26
NL7614209A (nl) 1977-09-05

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Legal Events

Date Code Title Description
ST Notification of lapse