FR2311111A1 - Installation de commande de processus pour l'analyse et la regeneration automatique de bains de galvanoplastie - Google Patents

Installation de commande de processus pour l'analyse et la regeneration automatique de bains de galvanoplastie

Info

Publication number
FR2311111A1
FR2311111A1 FR7613763A FR7613763A FR2311111A1 FR 2311111 A1 FR2311111 A1 FR 2311111A1 FR 7613763 A FR7613763 A FR 7613763A FR 7613763 A FR7613763 A FR 7613763A FR 2311111 A1 FR2311111 A1 FR 2311111A1
Authority
FR
France
Prior art keywords
galvanoplasty
baths
regeneration
process control
control plant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7613763A
Other languages
English (en)
Other versions
FR2311111B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of FR2311111A1 publication Critical patent/FR2311111A1/fr
Application granted granted Critical
Publication of FR2311111B1 publication Critical patent/FR2311111B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D21/00—Control of chemical or physico-chemical variables, e.g. pH value
    • G05D21/02—Control of chemical or physico-chemical variables, e.g. pH value characterised by the use of electric means
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C25D21/14—Controlled addition of electrolyte components

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Automation & Control Theory (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Control Of Non-Electrical Variables (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Sampling And Sample Adjustment (AREA)
FR7613763A 1975-05-13 1976-05-07 Installation de commande de processus pour l'analyse et la regeneration automatique de bains de galvanoplastie Granted FR2311111A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19752521282 DE2521282C2 (de) 1975-05-13 1975-05-13 Prozessteueranlage zum selbsttaetigen analysieren und auffrischen von galvanischen baedern

Publications (2)

Publication Number Publication Date
FR2311111A1 true FR2311111A1 (fr) 1976-12-10
FR2311111B1 FR2311111B1 (fr) 1978-11-03

Family

ID=5946446

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7613763A Granted FR2311111A1 (fr) 1975-05-13 1976-05-07 Installation de commande de processus pour l'analyse et la regeneration automatique de bains de galvanoplastie

Country Status (11)

Country Link
US (1) US4055751A (fr)
JP (1) JPS51137675A (fr)
AT (1) AT348065B (fr)
BE (1) BE841796A (fr)
CH (1) CH601504A5 (fr)
DE (1) DE2521282C2 (fr)
FR (1) FR2311111A1 (fr)
GB (1) GB1539046A (fr)
IT (1) IT1063210B (fr)
NL (1) NL7604087A (fr)
SE (1) SE7602546L (fr)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4237538A (en) * 1978-11-24 1980-12-02 Permo S.A. Electronic means for controlling the regeneration of resins in a resin type ion exchange device
DE2911073C2 (de) * 1979-03-21 1984-01-12 Siemens AG, 1000 Berlin und 8000 München Verfahren und Vorrichtung zum automatischen Messen und Regeln der Konzentration der Hauptkomponenten eines Bades zum stromlosen Abscheiden von Kupfer
US4326940A (en) * 1979-05-21 1982-04-27 Rohco Incorporated Automatic analyzer and control system for electroplating baths
US4256695A (en) * 1979-12-20 1981-03-17 Texaco Development Corporation Copper liquor control system
US4292039A (en) * 1980-03-24 1981-09-29 Farris Clyde A Method and apparatus for controlling dissolved solid concentrations
DE3340342A1 (de) * 1983-11-08 1985-05-15 ELO-CHEM Ätztechnik GmbH, 7758 Meersburg Verfahren und anlage zum regenerieren einer ammoniakalischen aetzloesung
US4725339A (en) * 1984-02-13 1988-02-16 International Business Machines Corporation Method for monitoring metal ion concentrations in plating baths
US4989157A (en) * 1985-01-22 1991-01-29 The Boeing Company Automated chemical milling controller
EP0194103B1 (fr) * 1985-02-28 1990-02-07 C. Uyemura & Co Ltd Procédé et appareillage pour déceler le déclenchement d'un dépôt chimique
US4623554A (en) * 1985-03-08 1986-11-18 International Business Machines Corp. Method for controlling plating rate in an electroless plating system
US5117370A (en) * 1988-12-22 1992-05-26 Ford Motor Company Detection system for chemical analysis of zinc phosphate coating solutions
US5352350A (en) * 1992-02-14 1994-10-04 International Business Machines Corporation Method for controlling chemical species concentration
DE19539760C2 (de) * 1995-10-26 1998-06-04 Manz Galvanotechnik Gmbh Verfahren zur Steuerung des Wasserflusses in einem Spülsystem einer Anlage für die Galvano- und Oberflächentechnik
KR100201377B1 (ko) * 1995-10-27 1999-06-15 김무 다성분 도금용액의 농도조절장치
KR20010072569A (ko) * 1998-04-09 2001-07-31 추후제출 자동화 화학공정 제어 시스템
USRE38931E1 (en) * 1998-05-01 2006-01-10 Semitool, Inc. Methods for controlling and/or measuring additive concentration in an electroplating bath
US6814855B2 (en) * 1998-05-01 2004-11-09 Semitool, Inc. Automated chemical management system having improved analysis unit
JP2002506531A (ja) * 1998-05-01 2002-02-26 セミトウール・インコーポレーテツド 電気メッキ浴中の添加物の測定法
US6365033B1 (en) * 1999-05-03 2002-04-02 Semitoof, Inc. Methods for controlling and/or measuring additive concentration in an electroplating bath
US6899805B2 (en) * 1998-05-01 2005-05-31 Semitool, Inc. Automated chemical management system executing improved electrolyte analysis method
US7147827B1 (en) * 1998-05-01 2006-12-12 Applied Materials, Inc. Chemical mixing, replenishment, and waste management system
DE69929607T2 (de) 1998-06-30 2006-07-27 Semitool, Inc., Kalispell Metallisierungsstrukturen für mikroelektronische anwendungen und verfahren zur herstellung dieser strukturen
DE20104072U1 (de) * 2001-03-08 2001-06-07 Siemens Ag Galvanikanlage
US6584989B2 (en) 2001-04-17 2003-07-01 International Business Machines Corporation Apparatus and method for wet cleaning
US6592736B2 (en) 2001-07-09 2003-07-15 Semitool, Inc. Methods and apparatus for controlling an amount of a chemical constituent of an electrochemical bath
US6991710B2 (en) 2002-02-22 2006-01-31 Semitool, Inc. Apparatus for manually and automatically processing microelectronic workpieces
US20050051433A1 (en) * 2003-04-23 2005-03-10 Zdunek Alan D. Method and apparatus for monitoring, dosing and distribution of chemical solutions
US7306765B2 (en) * 2003-07-15 2007-12-11 The Boeing Company Apparatus and method for chemical analysis
US7851222B2 (en) * 2005-07-26 2010-12-14 Applied Materials, Inc. System and methods for measuring chemical concentrations of a plating solution
KR101423024B1 (ko) * 2014-03-26 2014-07-29 손치호 전해액 자동 분석을 통한 약품 투입 기능을 갖는 금속의 아노다이징 처리 시스템

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2928406A (en) * 1956-06-22 1960-03-15 Ind Instr Inc Solution conductivity measuring and controlling apparatus
FR2203997A1 (fr) * 1972-10-20 1974-05-17 Siemens Ag

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3497449A (en) * 1966-05-17 1970-02-24 Mobil Oil Corp Controlling a continuous process by concentration measurements
GB1285693A (en) * 1968-09-04 1972-08-16 Nat Res Dev Actuator drive apparatus
US3654113A (en) * 1969-11-24 1972-04-04 North American Rockwell Programmed fluid sampling and analysis apparatus
US3690833A (en) * 1970-05-04 1972-09-12 Damon Corp Automated fluids analyzer having selectively interrupted flow
DE2039634B2 (de) * 1970-08-10 1972-03-09 Grundig Emv Verfahren zur messung der abscheidungsgeschwindigkeit von metallabscheidungen in reduktiven und galvanischen metalli sierungsbaedern sowie eine vorrichtung zur durchfuehrung dieses verfahrens

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2928406A (en) * 1956-06-22 1960-03-15 Ind Instr Inc Solution conductivity measuring and controlling apparatus
FR2203997A1 (fr) * 1972-10-20 1974-05-17 Siemens Ag

Also Published As

Publication number Publication date
GB1539046A (en) 1979-01-24
SE7602546L (sv) 1976-11-14
CH601504A5 (fr) 1978-07-14
IT1063210B (it) 1985-02-11
DE2521282C2 (de) 1977-03-03
US4055751A (en) 1977-10-25
AT348065B (de) 1979-01-25
JPS51137675A (en) 1976-11-27
DE2521282B1 (de) 1976-07-15
BE841796A (nl) 1976-09-01
FR2311111B1 (fr) 1978-11-03
ATA250776A (de) 1978-06-15
NL7604087A (nl) 1976-11-16

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Legal Events

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