FR2303819A1 - Procede de fabrication d'une resine negative sensible aux electrons, application de ladite resine en optique integree, et guides de lumiere comportant ladite resine - Google Patents

Procede de fabrication d'une resine negative sensible aux electrons, application de ladite resine en optique integree, et guides de lumiere comportant ladite resine

Info

Publication number
FR2303819A1
FR2303819A1 FR7507522A FR7507522A FR2303819A1 FR 2303819 A1 FR2303819 A1 FR 2303819A1 FR 7507522 A FR7507522 A FR 7507522A FR 7507522 A FR7507522 A FR 7507522A FR 2303819 A1 FR2303819 A1 FR 2303819A1
Authority
FR
France
Prior art keywords
resin
electron
manufacturing
application
light guides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7507522A
Other languages
English (en)
Other versions
FR2303819B1 (fr
Inventor
Jean-Claude Dubois
Maryse Gazard
Claude Duchesne
Jean-Claude Laven
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7507522A priority Critical patent/FR2303819A1/fr
Priority to GB9254/76A priority patent/GB1535998A/en
Priority to US05/665,250 priority patent/US4068919A/en
Priority to DE19762610039 priority patent/DE2610039A1/de
Priority to JP51025645A priority patent/JPS51112900A/ja
Publication of FR2303819A1 publication Critical patent/FR2303819A1/fr
Application granted granted Critical
Publication of FR2303819B1 publication Critical patent/FR2303819B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Polymers (AREA)
  • Optical Integrated Circuits (AREA)
FR7507522A 1975-03-11 1975-03-11 Procede de fabrication d'une resine negative sensible aux electrons, application de ladite resine en optique integree, et guides de lumiere comportant ladite resine Granted FR2303819A1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR7507522A FR2303819A1 (fr) 1975-03-11 1975-03-11 Procede de fabrication d'une resine negative sensible aux electrons, application de ladite resine en optique integree, et guides de lumiere comportant ladite resine
GB9254/76A GB1535998A (en) 1975-03-11 1976-03-08 Method of manufacturing an electron-sensitive negative resin and an application of said resin to integrated optics
US05/665,250 US4068919A (en) 1975-03-11 1976-03-09 Method of manufacturing an electron-sensitive resin, and an application of said resin to integrated optics
DE19762610039 DE2610039A1 (de) 1975-03-11 1976-03-10 Verfahren zur herstellung eines elektronenempfindlichen negativen harzes sowie seine verwendung in der integrierten optik
JP51025645A JPS51112900A (en) 1975-03-11 1976-03-11 Process for producing negative resin with electron sensitivity

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7507522A FR2303819A1 (fr) 1975-03-11 1975-03-11 Procede de fabrication d'une resine negative sensible aux electrons, application de ladite resine en optique integree, et guides de lumiere comportant ladite resine

Publications (2)

Publication Number Publication Date
FR2303819A1 true FR2303819A1 (fr) 1976-10-08
FR2303819B1 FR2303819B1 (fr) 1977-11-18

Family

ID=9152389

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7507522A Granted FR2303819A1 (fr) 1975-03-11 1975-03-11 Procede de fabrication d'une resine negative sensible aux electrons, application de ladite resine en optique integree, et guides de lumiere comportant ladite resine

Country Status (5)

Country Link
US (1) US4068919A (fr)
JP (1) JPS51112900A (fr)
DE (1) DE2610039A1 (fr)
FR (1) FR2303819A1 (fr)
GB (1) GB1535998A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0435751A1 (fr) * 1989-12-28 1991-07-03 Thomson-Csf Procédé de synthèse de polysilsesquioxanes et applications des produits obtenus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2822304A1 (fr) * 2001-03-16 2002-09-20 Teem Photonics Structure d'amplification optique realisee en optique integree et boitier d'amplification integrant une telle structure

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3017385A (en) * 1959-01-21 1962-01-16 Gen Electric Novel organopolysiloxanes
US3822928A (en) * 1971-08-02 1974-07-09 Bell Telephone Labor Inc Thin film light guide
US3767445A (en) * 1971-10-14 1973-10-23 Bell Telephone Labor Inc Embossing techniques for producing integrated optical circuits

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
J.CHIM.PHYSIQUE, 69, NO. 7-8, PAGES 1120-1124, 1974,) *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0435751A1 (fr) * 1989-12-28 1991-07-03 Thomson-Csf Procédé de synthèse de polysilsesquioxanes et applications des produits obtenus
FR2656617A1 (fr) * 1989-12-28 1991-07-05 Thomson Csf Procede de synthese de polysilsesquioxanes et applications des produits contenus.

Also Published As

Publication number Publication date
US4068919A (en) 1978-01-17
FR2303819B1 (fr) 1977-11-18
DE2610039A1 (de) 1976-09-23
GB1535998A (en) 1978-12-13
JPS51112900A (en) 1976-10-05

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Legal Events

Date Code Title Description
ST Notification of lapse