FR2303378A1 - Procede lithographique pour la fabrication de dispositifs a couches multiples tels que des dispositifs de domaines en bulle - Google Patents

Procede lithographique pour la fabrication de dispositifs a couches multiples tels que des dispositifs de domaines en bulle

Info

Publication number
FR2303378A1
FR2303378A1 FR7601476A FR7601476A FR2303378A1 FR 2303378 A1 FR2303378 A1 FR 2303378A1 FR 7601476 A FR7601476 A FR 7601476A FR 7601476 A FR7601476 A FR 7601476A FR 2303378 A1 FR2303378 A1 FR 2303378A1
Authority
FR
France
Prior art keywords
devices
manufacture
lithographic process
bubble domain
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7601476A
Other languages
English (en)
French (fr)
Other versions
FR2303378B1 (de
Inventor
Kie Y Ahn
Michael Hatzakis
John V Powers
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2303378A1 publication Critical patent/FR2303378A1/fr
Application granted granted Critical
Publication of FR2303378B1 publication Critical patent/FR2303378B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
    • H01F41/34—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film in patterns, e.g. by lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Thin Magnetic Films (AREA)
  • Magnetic Heads (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Wiring (AREA)
FR7601476A 1975-03-05 1976-01-14 Procede lithographique pour la fabrication de dispositifs a couches multiples tels que des dispositifs de domaines en bulle Granted FR2303378A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/555,644 US4001061A (en) 1975-03-05 1975-03-05 Single lithography for multiple-layer bubble domain devices

Publications (2)

Publication Number Publication Date
FR2303378A1 true FR2303378A1 (fr) 1976-10-01
FR2303378B1 FR2303378B1 (de) 1978-05-19

Family

ID=24218061

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7601476A Granted FR2303378A1 (fr) 1975-03-05 1976-01-14 Procede lithographique pour la fabrication de dispositifs a couches multiples tels que des dispositifs de domaines en bulle

Country Status (5)

Country Link
US (1) US4001061A (de)
JP (1) JPS5821808B2 (de)
DE (1) DE2606563A1 (de)
FR (1) FR2303378A1 (de)
GB (1) GB1507947A (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1578259A (en) * 1977-05-11 1980-11-05 Philips Electronic Associated Methods of manufacturing solid-state devices apparatus for use therein and devices manufactured thereby
US4187553A (en) * 1977-12-23 1980-02-05 International Business Machines Corporation Pedestal bubble domain chip and processes for making same
JPS5568610A (en) * 1978-11-20 1980-05-23 Hitachi Ltd Preparing magnetic bubble memory element
US4328298A (en) * 1979-06-27 1982-05-04 The Perkin-Elmer Corporation Process for manufacturing lithography masks
JPS5626450A (en) * 1979-08-13 1981-03-14 Hitachi Ltd Manufacture of semiconductor device
US4379833A (en) * 1981-12-31 1983-04-12 International Business Machines Corporation Self-aligned photoresist process
US4544940A (en) * 1983-01-14 1985-10-01 General Motors Corporation Method for more uniformly spacing features in a lateral bipolar transistor
US4586243A (en) * 1983-01-14 1986-05-06 General Motors Corporation Method for more uniformly spacing features in a semiconductor monolithic integrated circuit
JP7203939B2 (ja) * 2019-12-10 2023-01-13 日東電工株式会社 配線回路基板の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2216369A1 (de) * 1973-01-31 1974-08-30 Siemens Ag

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2728693A (en) * 1953-08-24 1955-12-27 Motorola Inc Method of forming electrical conductor upon an insulating base
US2912312A (en) * 1956-10-10 1959-11-10 Cleveland Metal Specialties Co Method of making components for printed circuits
US3075866A (en) * 1958-06-19 1963-01-29 Xerox Corp Method of making printed circuits
US3443915A (en) * 1965-03-26 1969-05-13 Westinghouse Electric Corp High resolution patterns for optical masks and methods for their fabrication
US3649393A (en) * 1970-06-12 1972-03-14 Ibm Variable depth etching of film layers using variable exposures of photoresists
US3832176A (en) * 1973-04-06 1974-08-27 Eastman Kodak Co Novel photoresist article and process for its use

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2216369A1 (de) * 1973-01-31 1974-08-30 Siemens Ag

Also Published As

Publication number Publication date
FR2303378B1 (de) 1978-05-19
GB1507947A (en) 1978-04-19
JPS51110930A (en) 1976-09-30
US4001061A (en) 1977-01-04
JPS5821808B2 (ja) 1983-05-04
DE2606563A1 (de) 1976-09-16

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Legal Events

Date Code Title Description
ST Notification of lapse