FR2296206A1 - Perfectionnements apportes aux compositions photosensibles et solubles a l'eau, a base de resine - Google Patents

Perfectionnements apportes aux compositions photosensibles et solubles a l'eau, a base de resine

Info

Publication number
FR2296206A1
FR2296206A1 FR7539828A FR7539828A FR2296206A1 FR 2296206 A1 FR2296206 A1 FR 2296206A1 FR 7539828 A FR7539828 A FR 7539828A FR 7539828 A FR7539828 A FR 7539828A FR 2296206 A1 FR2296206 A1 FR 2296206A1
Authority
FR
France
Prior art keywords
photosensitive
resin
water
soluble compositions
soluble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7539828A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Chemical Industrial Co Ltd
Original Assignee
Fuji Chemical Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Chemical Industrial Co Ltd filed Critical Fuji Chemical Industrial Co Ltd
Publication of FR2296206A1 publication Critical patent/FR2296206A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025—Crosslinking or vulcanising agents; including accelerators
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/07—Aldehydes; Ketones
    • C08K5/08—Quinones
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
FR7539828A 1974-12-28 1975-12-26 Perfectionnements apportes aux compositions photosensibles et solubles a l'eau, a base de resine Withdrawn FR2296206A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50001418A JPS51149021A (en) 1974-12-28 1974-12-28 Water soluble photosensitive resin composition

Publications (1)

Publication Number Publication Date
FR2296206A1 true FR2296206A1 (fr) 1976-07-23

Family

ID=11500907

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7539828A Withdrawn FR2296206A1 (fr) 1974-12-28 1975-12-26 Perfectionnements apportes aux compositions photosensibles et solubles a l'eau, a base de resine

Country Status (6)

Country Link
US (1) US4097283A (fr)
JP (1) JPS51149021A (fr)
DE (1) DE2558527A1 (fr)
FR (1) FR2296206A1 (fr)
GB (1) GB1516746A (fr)
NL (1) NL7515072A (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4279986A (en) * 1977-06-01 1981-07-21 Nippon Electric Co., Ltd. Negative resist and radical scavenger composition with capability of preventing post-irradiation polymerization
CH640849A5 (de) * 1979-05-18 1984-01-31 Ciba Geigy Ag Thioxanthoncarbonsaeureester, -thioester und -amide.
CA1170887A (fr) * 1980-10-06 1984-07-17 Gary C. Briney Elements aqueux photopolymerisables, pouvant etre developpes
DE3371573D1 (en) * 1982-11-25 1987-06-19 Ciba Geigy Ag Light-sensitive and possibly cross-linkable mixture of compounds apt to condensation and addition reactions, reaction products obtained thereby and use thereof
JPS6042425A (ja) * 1983-08-17 1985-03-06 Toray Ind Inc 化学線感応性重合体組成物
JPS62257147A (ja) * 1986-04-30 1987-11-09 Nitto Boseki Co Ltd 新規な感光性樹脂組成物
US5561194A (en) * 1995-03-29 1996-10-01 International Business Machines Corporation Photoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyrene
US6534618B1 (en) 2000-11-27 2003-03-18 Corning Incorporated Methods of drying optical fiber coatings

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL150528B (nl) * 1949-05-14 Hollandse Signaalapparaten Bv Werkwijze voor het vervaardigen van twistloos of nagenoeg twistloos garen en het door toepassing van deze werkwijze verkregen garen.
US3418295A (en) * 1965-04-27 1968-12-24 Du Pont Polymers and their preparation
US3357831A (en) * 1965-06-21 1967-12-12 Harris Intertype Corp Photopolymer
BE757652A (fr) * 1969-10-17 1971-04-01 Mitsui Mining & Smelting Cy Lt Composition resineuse photosensible
BE759079A (nl) * 1969-12-23 1971-05-18 Agfa Gevaert Nv Verknoping onder invloed van licht van lichtgevoelige polymere samenstellingen die azidogroepen bevatten
JPS492286B1 (fr) * 1970-02-19 1974-01-19
US3795640A (en) * 1971-01-07 1974-03-05 Powers Chemco Inc Furfuryl,allyl and methylol acrylamide esters of polymeric acids
US3715210A (en) * 1971-02-19 1973-02-06 Howson Algraphy Ltd Lithographic printing plates
GB1330263A (en) * 1971-04-30 1973-09-12 Mullard Ltd Light-sensitive compounds and photoresists containing the same
JPS515935B2 (fr) * 1972-04-17 1976-02-24
US3776736A (en) * 1972-08-07 1973-12-04 Rca Corp Stabilized photoresist composition
JPS5240577B2 (fr) * 1972-08-11 1977-10-13
US4065430A (en) * 1973-02-13 1977-12-27 Fuji Photo Film Co., Ltd. Functional group containing polymer and method of preparing the same
DE2406400B2 (de) * 1973-02-14 1977-04-28 Hitachi Chemical Co., Ltd., Tokio Lichtempfindliche harzzusammensetzungen auf der basis von verbindungen mit epoxy- bzw. photopolymerisierbaren acrylgruppen

Also Published As

Publication number Publication date
NL7515072A (nl) 1976-06-30
US4097283A (en) 1978-06-27
GB1516746A (en) 1978-07-05
DE2558527A1 (de) 1976-07-15
JPS51149021A (en) 1976-12-21
JPS5412331B2 (fr) 1979-05-22

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Legal Events

Date Code Title Description
ST Notification of lapse