FR2290504A1 - Vacuum vapour deposition of a dielectric material - by using a gas plasma (BE040576) - Google Patents

Vacuum vapour deposition of a dielectric material - by using a gas plasma (BE040576)

Info

Publication number
FR2290504A1
FR2290504A1 FR7533742A FR7533742A FR2290504A1 FR 2290504 A1 FR2290504 A1 FR 2290504A1 FR 7533742 A FR7533742 A FR 7533742A FR 7533742 A FR7533742 A FR 7533742A FR 2290504 A1 FR2290504 A1 FR 2290504A1
Authority
FR
France
Prior art keywords
gas plasma
matl
dielectric material
vapour deposition
vacuum vapour
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7533742A
Other languages
French (fr)
Other versions
FR2290504B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of FR2290504A1 publication Critical patent/FR2290504A1/en
Application granted granted Critical
Publication of FR2290504B1 publication Critical patent/FR2290504B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Inorganic Insulating Materials (AREA)
  • Light Receiving Elements (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)

Abstract

A substrate is coated with a photosensitive dielectric matl. in a partially evacuated chamber by evapn. and deposn. of the matl. and by producing at the same time a gas plasma in the region of the surface of the substrate. The gas plasma may be produced during evapn. of the photosensitive matl. or prior to its evapn. Pref. the photosensitive matl. is Pb monoxide and the gas plasma is produced from Ar or an Ar-O mixt., or by using dry or moist air.
FR7533742A 1974-11-05 1975-11-05 Vacuum vapour deposition of a dielectric material - by using a gas plasma (BE040576) Granted FR2290504A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US52101174A 1974-11-05 1974-11-05

Publications (2)

Publication Number Publication Date
FR2290504A1 true FR2290504A1 (en) 1976-06-04
FR2290504B1 FR2290504B1 (en) 1979-04-27

Family

ID=24074968

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7533742A Granted FR2290504A1 (en) 1974-11-05 1975-11-05 Vacuum vapour deposition of a dielectric material - by using a gas plasma (BE040576)

Country Status (4)

Country Link
JP (1) JPS5169383A (en)
DE (1) DE2549405A1 (en)
FR (1) FR2290504A1 (en)
NL (1) NL7512990A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2484463A1 (en) * 1980-06-16 1981-12-18 Illinois Tool Works METHOD AND APPARATUS FOR NON-GAS IONIC SPRAY COATING

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2636855A (en) * 1948-03-25 1953-04-28 Hilger & Watts Ltd Method of producing photoconductive coatings
US3472679A (en) * 1965-08-25 1969-10-14 Xerox Corp Coating surfaces
FR2066947A1 (en) * 1969-11-03 1971-08-13 Rca Corp

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2636855A (en) * 1948-03-25 1953-04-28 Hilger & Watts Ltd Method of producing photoconductive coatings
US3472679A (en) * 1965-08-25 1969-10-14 Xerox Corp Coating surfaces
FR2066947A1 (en) * 1969-11-03 1971-08-13 Rca Corp

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
IBM TECHNICAL DISCLOSURE BULLETIN, 1970, VOLUME 13, NO. 7, PAGE 2082, ARTICLE "R.F.CATHODE FOR ION-PLATING", PAR B.I. BERTELSEN *
SOLID STATE TECHNOLOGY, 1973, VOLUME 16, NO. 12, PAGES 79-86, ARTICLE "EVAPORATION, SPUTTERING AND ION-PLATING PROS AND CONS", PAR J.E. VARGA *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2484463A1 (en) * 1980-06-16 1981-12-18 Illinois Tool Works METHOD AND APPARATUS FOR NON-GAS IONIC SPRAY COATING

Also Published As

Publication number Publication date
FR2290504B1 (en) 1979-04-27
JPS5169383A (en) 1976-06-15
NL7512990A (en) 1976-05-07
DE2549405A1 (en) 1976-05-06

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Legal Events

Date Code Title Description
ST Notification of lapse