FR2288995B2 - - Google Patents
Info
- Publication number
- FR2288995B2 FR2288995B2 FR7523801A FR7523801A FR2288995B2 FR 2288995 B2 FR2288995 B2 FR 2288995B2 FR 7523801 A FR7523801 A FR 7523801A FR 7523801 A FR7523801 A FR 7523801A FR 2288995 B2 FR2288995 B2 FR 2288995B2
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polyurethanes Or Polyureas (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19742437422 DE2437422C3 (de) | 1974-08-02 | Verfahren zur Herstellung von Reliefstrukturen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2288995A2 FR2288995A2 (fr) | 1976-05-21 |
| FR2288995B2 true FR2288995B2 (US20030157025A1-20030821-C00018.png) | 1978-11-03 |
Family
ID=5922340
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7523801A Granted FR2288995A2 (fr) | 1974-08-02 | 1975-07-30 | Procede de fabrication de structures en relief |
Country Status (8)
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3069448D1 (en) * | 1979-05-18 | 1984-11-22 | Ciba Geigy Ag | Photocrosslinkable copolymers, photosensitive recording material containing them, its utilisation in the production of photographic pictures and process for the production of photographic pictures |
| DE2933856A1 (de) * | 1979-08-21 | 1981-03-12 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung eines zugfesten lichtwellenleiters |
| DE3233912A1 (de) * | 1982-09-13 | 1984-03-15 | Merck Patent Gmbh, 6100 Darmstadt | Fotolacke zur ausbildung von reliefstrukturen aus hochwaermebestaendigen polymeren |
| US4663268A (en) * | 1984-12-28 | 1987-05-05 | Eastman Kodak Company | High-temperature resistant photoresists featuring maleimide binders |
| DE3717933A1 (de) * | 1987-05-27 | 1988-12-08 | Hoechst Ag | Photopolymerisierbares gemisch, dieses enthaltendes aufzeichnungsmaterial und verfahren zur herstellung von hochwaermebestaendigen reliefstrukturen |
| DE4217688A1 (de) * | 1992-05-29 | 1993-12-02 | Basf Lacke & Farben | Durch Einwirkung von Strahlung vernetzendes Gemisch und dessen Verwendung zur Herstellung hochtemperaturbeständiger Reliefstrukturen |
| US6006667A (en) * | 1998-03-12 | 1999-12-28 | Presstek, Inc. | Method of lithographic imaging with reduced debris-generated performance degradation and related constructions |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3475176A (en) * | 1966-09-06 | 1969-10-28 | Eastman Kodak Co | Azide sensitized photosensitive prepolymer compositions |
| US3650746A (en) * | 1969-06-16 | 1972-03-21 | Grace W R & Co | Dual image formation on separate supports of photocurable composition |
| US3858510A (en) * | 1971-03-11 | 1975-01-07 | Asahi Chemical Ind | Relief structures prepared from photosensitive compositions |
| US3801638A (en) * | 1971-03-12 | 1974-04-02 | Gaf Corp | Triacrylyldiethylenetriamine,method of producing the same,and photopolymerization process and system utilizing the same |
| BE793732A (fr) * | 1972-01-10 | 1973-05-02 | Grace W R & Co | Composition contenant un polyene et un polythiol |
| NL177718C (nl) * | 1973-02-22 | 1985-11-01 | Siemens Ag | Werkwijze ter vervaardiging van reliefstructuren uit warmte-bestendige polymeren. |
| US3847767A (en) * | 1973-03-13 | 1974-11-12 | Grace W R & Co | Method of producing a screen printable photocurable solder resist |
-
1975
- 1975-06-12 AT AT450675A patent/AT352406B/de not_active IP Right Cessation
- 1975-07-24 US US05/598,828 patent/US4088489A/en not_active Expired - Lifetime
- 1975-07-24 BE BE158566A patent/BE831682R/xx not_active IP Right Cessation
- 1975-07-25 IT IT25728/75A patent/IT1049570B/it active
- 1975-07-30 FR FR7523801A patent/FR2288995A2/fr active Granted
- 1975-08-01 NL NLAANVRAGE7509203,A patent/NL180145C/xx not_active IP Right Cessation
- 1975-08-01 GB GB32363/75A patent/GB1512972A/en not_active Expired
- 1975-08-01 JP JP9411975A patent/JPS5541421B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| IT1049570B (it) | 1981-02-10 |
| JPS5541421B2 (US20030157025A1-20030821-C00018.png) | 1980-10-24 |
| AT352406B (de) | 1979-09-25 |
| NL180145C (nl) | 1987-01-02 |
| JPS5140921A (US20030157025A1-20030821-C00018.png) | 1976-04-06 |
| DE2437422A1 (de) | 1976-02-19 |
| BE831682R (fr) | 1975-11-17 |
| NL7509203A (nl) | 1976-02-04 |
| US4088489A (en) | 1978-05-09 |
| NL180145B (nl) | 1986-08-01 |
| ATA450675A (de) | 1979-02-15 |
| DE2437422B2 (de) | 1976-08-26 |
| GB1512972A (en) | 1978-06-01 |
| FR2288995A2 (fr) | 1976-05-21 |
