FR2259863B3 - - Google Patents
Info
- Publication number
- FR2259863B3 FR2259863B3 FR7502907A FR7502907A FR2259863B3 FR 2259863 B3 FR2259863 B3 FR 2259863B3 FR 7502907 A FR7502907 A FR 7502907A FR 7502907 A FR7502907 A FR 7502907A FR 2259863 B3 FR2259863 B3 FR 2259863B3
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/48—Polymers modified by chemical after-treatment
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL7401407A NL7401407A (nl) | 1974-02-01 | 1974-02-01 | Fotopolymeer. |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2259863A1 FR2259863A1 (en) | 1975-08-29 |
FR2259863B3 true FR2259863B3 (nl) | 1977-10-21 |
Family
ID=19820669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7502907A Granted FR2259863A1 (en) | 1974-02-01 | 1975-01-30 | Photo-sensitive polymers for lithographic plates, etc. - consisting of 3-(2-furyl) acrylic acid esters of phenoxy resins |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE2503526A1 (nl) |
FR (1) | FR2259863A1 (nl) |
NL (1) | NL7401407A (nl) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0204292B1 (de) * | 1985-06-05 | 1991-05-29 | Siemens Aktiengesellschaft | Verfahren zum Herstellen von gedruckten Schaltungen unter Verwendung eines durch Strahlung vernetzenden Fotopolymersystems |
EP0281808B1 (de) * | 1987-03-12 | 1994-07-20 | Siemens Aktiengesellschaft | Strahlungsvernetzbares Polymersystem zur Anwendung als Photoresist und Dielektrikum für Mikroverdrahtungen |
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1974
- 1974-02-01 NL NL7401407A patent/NL7401407A/nl unknown
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1975
- 1975-01-29 DE DE19752503526 patent/DE2503526A1/de active Pending
- 1975-01-30 FR FR7502907A patent/FR2259863A1/fr active Granted
Also Published As
Publication number | Publication date |
---|---|
FR2259863A1 (en) | 1975-08-29 |
NL7401407A (nl) | 1975-08-05 |
DE2503526A1 (de) | 1975-08-07 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |