FR2253253A1 - Adjustable and refrigerated sample support - for charged particle appts. can be rotated and inclined - Google Patents

Adjustable and refrigerated sample support - for charged particle appts. can be rotated and inclined

Info

Publication number
FR2253253A1
FR2253253A1 FR7343205A FR7343205A FR2253253A1 FR 2253253 A1 FR2253253 A1 FR 2253253A1 FR 7343205 A FR7343205 A FR 7343205A FR 7343205 A FR7343205 A FR 7343205A FR 2253253 A1 FR2253253 A1 FR 2253253A1
Authority
FR
France
Prior art keywords
rotated
charged particle
refrigerated
disc
channel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7343205A
Other languages
French (fr)
Other versions
FR2253253B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7343205A priority Critical patent/FR2253253A1/en
Publication of FR2253253A1 publication Critical patent/FR2253253A1/en
Application granted granted Critical
Publication of FR2253253B1 publication Critical patent/FR2253253B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/32—Polishing; Etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

The samle support comprises a disc (20) having an external major surface for supporting the sample, and preferably in a plane normal to the direction of the charged particle beam, and able to be inclined at a required angle to this plane, and rotated about a perpendicular axis (oy). The disc (20) is rigidly fixed to a refrigerated channel (21) defined by two concentric cylinders (24, 25), with the refrigerant supplied to the interior of one of the cylinders (24). The channel (21) can be rotated, e.g. by an electric motor (401), to rotate the disc (20) about the perpendicular axis (oy), with a transverse shaft connected to a sealed enclosure (402) housing the motor (401) and refrigerated channel, to tip the whole assembly to the required angle.
FR7343205A 1973-12-04 1973-12-04 Adjustable and refrigerated sample support - for charged particle appts. can be rotated and inclined Granted FR2253253A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7343205A FR2253253A1 (en) 1973-12-04 1973-12-04 Adjustable and refrigerated sample support - for charged particle appts. can be rotated and inclined

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7343205A FR2253253A1 (en) 1973-12-04 1973-12-04 Adjustable and refrigerated sample support - for charged particle appts. can be rotated and inclined

Publications (2)

Publication Number Publication Date
FR2253253A1 true FR2253253A1 (en) 1975-06-27
FR2253253B1 FR2253253B1 (en) 1976-05-14

Family

ID=9128686

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7343205A Granted FR2253253A1 (en) 1973-12-04 1973-12-04 Adjustable and refrigerated sample support - for charged particle appts. can be rotated and inclined

Country Status (1)

Country Link
FR (1) FR2253253A1 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2576918A1 (en) * 1985-02-05 1986-08-08 Balzers Hochvakuum STEAM SOURCE FOR VACUUM COATING SYSTEMS
EP0385708A2 (en) * 1989-02-28 1990-09-05 Eaton Corporation Beam pattern control system for an ion implanter
EP0385707A2 (en) * 1989-02-28 1990-09-05 Eaton Corporation Ion implanter end station
EP0476479A2 (en) * 1990-09-17 1992-03-25 Matsushita Electric Industrial Co., Ltd. Method of producing microscopic structure
US5223109A (en) * 1990-09-27 1993-06-29 Hitachi, Ltd Ion beam processing method and apparatus

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2576918A1 (en) * 1985-02-05 1986-08-08 Balzers Hochvakuum STEAM SOURCE FOR VACUUM COATING SYSTEMS
EP0385708A2 (en) * 1989-02-28 1990-09-05 Eaton Corporation Beam pattern control system for an ion implanter
EP0385707A2 (en) * 1989-02-28 1990-09-05 Eaton Corporation Ion implanter end station
EP0385707A3 (en) * 1989-02-28 1991-04-17 Eaton Corporation Ion implanter end station
EP0385708A3 (en) * 1989-02-28 1991-05-29 Eaton Corporation Beam pattern control system for an ion implanter
EP0476479A2 (en) * 1990-09-17 1992-03-25 Matsushita Electric Industrial Co., Ltd. Method of producing microscopic structure
EP0476479A3 (en) * 1990-09-17 1992-05-06 Matsushita Electric Industrial Co., Ltd. Method of producing microscopic structure
US5350499A (en) * 1990-09-17 1994-09-27 Matsushita Electric Industrial Co., Ltd. Method of producing microscopic structure
US5223109A (en) * 1990-09-27 1993-06-29 Hitachi, Ltd Ion beam processing method and apparatus

Also Published As

Publication number Publication date
FR2253253B1 (en) 1976-05-14

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Legal Events

Date Code Title Description
ST Notification of lapse