FR2234583A1 - - Google Patents

Info

Publication number
FR2234583A1
FR2234583A1 FR7421220A FR7421220A FR2234583A1 FR 2234583 A1 FR2234583 A1 FR 2234583A1 FR 7421220 A FR7421220 A FR 7421220A FR 7421220 A FR7421220 A FR 7421220A FR 2234583 A1 FR2234583 A1 FR 2234583A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7421220A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of FR2234583A1 publication Critical patent/FR2234583A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
FR7421220A 1973-06-20 1974-06-19 Withdrawn FR2234583A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US37157873A 1973-06-20 1973-06-20

Publications (1)

Publication Number Publication Date
FR2234583A1 true FR2234583A1 (en) 1975-01-17

Family

ID=23464533

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7421220A Withdrawn FR2234583A1 (en) 1973-06-20 1974-06-19

Country Status (12)

Country Link
JP (1) JPS5036210A (en)
AR (1) AR205345A1 (en)
AU (1) AU470155B2 (en)
BR (1) BR7405009D0 (en)
CA (1) CA1024803A (en)
CH (1) CH607095A5 (en)
DE (1) DE2429251A1 (en)
FR (1) FR2234583A1 (en)
GB (1) GB1474073A (en)
IT (1) IT1015190B (en)
SE (1) SE7407618L (en)
ZA (1) ZA743952B (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2309896A1 (en) * 1975-04-29 1976-11-26 Hoechst Co American PHOTOSENSITIVE COPY MATERIAL
FR2435741A1 (en) * 1978-09-06 1980-04-04 Minnesota Mining & Mfg COMPOSITION FOR POSITIVE PHOTORESERVES
EP0152819A1 (en) * 1984-02-08 1985-08-28 Hoechst Aktiengesellschaft Light-sensitive mixture with diazoresins and light-sensitive registration material prepared therefrom
EP0211391A2 (en) * 1985-08-07 1987-02-25 Hoechst Aktiengesellschaft Light-sensitive mixture and registration material prepared therefrom
EP0273263A2 (en) * 1986-12-23 1988-07-06 Hoechst Aktiengesellschaft Light-sensitive mixture with diazonium salt polycondensation products, and light-sensitive registration material prepared therewith

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4189320A (en) * 1975-04-29 1980-02-19 American Hoechst Corporation Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures
JPS6043892B2 (en) * 1980-11-08 1985-10-01 住友金属工業株式会社 High tensile strength wire manufacturing method
JPS601931B2 (en) * 1980-11-08 1985-01-18 住友金属工業株式会社 High tensile strength wire manufacturing method
JPS5811932A (en) * 1981-07-15 1983-01-22 Konishiroku Photo Ind Co Ltd Photosensitive composition
CA1308595C (en) * 1985-11-22 1992-10-13 Toshiaki Aoai Photosensitive composition
DE3617499A1 (en) * 1986-05-24 1987-11-26 Hoechst Ag LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF
DE3644163A1 (en) * 1986-12-23 1988-07-07 Hoechst Ag LIGHT SENSITIVE MIXTURE BASED ON A DIAZONIUM SALT POLYCONDENSATION PRODUCT AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF
DE3811242A1 (en) * 1988-04-02 1989-10-19 Hoechst Ag BINDING AGENTS SOLUBLE IN Aqueous ALKALINE, CONTAINING SILANYL GROUPS IN THE SIDE CHAIN, PROCESS FOR THEIR PRODUCTION AND LIGHT-SENSITIVE MIXTURE, CONTAINING THESE COMPOUNDS
DE3920230A1 (en) * 1989-06-21 1991-01-24 Hoechst Ag LIGHT-SENSITIVE MIXTURE AND LIGHT-SENSITIVE RECORDING MATERIAL MANUFACTURED THEREFROM
EP0413087A1 (en) * 1989-07-20 1991-02-20 International Business Machines Corporation Photosensitive composition and use thereof
EP2233288A1 (en) * 2009-03-23 2010-09-29 Founder Fine Chemical Industry Co., Ltd. Radiation sensitive composition and method for preparing radiation sensitive composition

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2309896A1 (en) * 1975-04-29 1976-11-26 Hoechst Co American PHOTOSENSITIVE COPY MATERIAL
FR2435741A1 (en) * 1978-09-06 1980-04-04 Minnesota Mining & Mfg COMPOSITION FOR POSITIVE PHOTORESERVES
EP0152819A1 (en) * 1984-02-08 1985-08-28 Hoechst Aktiengesellschaft Light-sensitive mixture with diazoresins and light-sensitive registration material prepared therefrom
EP0211391A2 (en) * 1985-08-07 1987-02-25 Hoechst Aktiengesellschaft Light-sensitive mixture and registration material prepared therefrom
EP0211391A3 (en) * 1985-08-07 1988-08-03 Hoechst Aktiengesellschaft Light-sensitive mixture and registration material prepared therefrom
EP0273263A2 (en) * 1986-12-23 1988-07-06 Hoechst Aktiengesellschaft Light-sensitive mixture with diazonium salt polycondensation products, and light-sensitive registration material prepared therewith
EP0273263A3 (en) * 1986-12-23 1988-09-28 Hoechst Aktiengesellschaft Light-sensitive mixture with diazonium salt polycondensation products, and light-sensitive registration material prepared therewith

Also Published As

Publication number Publication date
ZA743952B (en) 1975-06-25
DE2429251A1 (en) 1975-01-02
SE7407618L (en) 1974-12-23
BR7405009D0 (en) 1975-09-30
AR205345A1 (en) 1976-04-30
AU7023974A (en) 1976-01-08
GB1474073A (en) 1977-05-18
IT1015190B (en) 1977-05-10
CH607095A5 (en) 1978-11-30
CA1024803A (en) 1978-01-24
JPS5036210A (en) 1975-04-05
AU470155B2 (en) 1976-03-04

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Legal Events

Date Code Title Description
ST Notification of lapse