IT1015190B - PHOTOSEN SIBLE ORGANOFILE COMPOSITIONS AND LITHOGRAPHIC SHEETS PREPARED WITH THEM - Google Patents

PHOTOSEN SIBLE ORGANOFILE COMPOSITIONS AND LITHOGRAPHIC SHEETS PREPARED WITH THEM

Info

Publication number
IT1015190B
IT1015190B IT24154/74A IT2415474A IT1015190B IT 1015190 B IT1015190 B IT 1015190B IT 24154/74 A IT24154/74 A IT 24154/74A IT 2415474 A IT2415474 A IT 2415474A IT 1015190 B IT1015190 B IT 1015190B
Authority
IT
Italy
Prior art keywords
organofile
photosen
sible
compositions
sheets prepared
Prior art date
Application number
IT24154/74A
Other languages
Italian (it)
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Application granted granted Critical
Publication of IT1015190B publication Critical patent/IT1015190B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
IT24154/74A 1973-06-20 1974-06-19 PHOTOSEN SIBLE ORGANOFILE COMPOSITIONS AND LITHOGRAPHIC SHEETS PREPARED WITH THEM IT1015190B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US37157873A 1973-06-20 1973-06-20

Publications (1)

Publication Number Publication Date
IT1015190B true IT1015190B (en) 1977-05-10

Family

ID=23464533

Family Applications (1)

Application Number Title Priority Date Filing Date
IT24154/74A IT1015190B (en) 1973-06-20 1974-06-19 PHOTOSEN SIBLE ORGANOFILE COMPOSITIONS AND LITHOGRAPHIC SHEETS PREPARED WITH THEM

Country Status (12)

Country Link
JP (1) JPS5036210A (en)
AR (1) AR205345A1 (en)
AU (1) AU470155B2 (en)
BR (1) BR7405009D0 (en)
CA (1) CA1024803A (en)
CH (1) CH607095A5 (en)
DE (1) DE2429251A1 (en)
FR (1) FR2234583A1 (en)
GB (1) GB1474073A (en)
IT (1) IT1015190B (en)
SE (1) SE7407618L (en)
ZA (1) ZA743952B (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2617088A1 (en) * 1975-04-29 1976-11-11 Hoechst Co American LIGHT-SENSITIVE COPY DIMENSIONS
US4189320A (en) * 1975-04-29 1980-02-19 American Hoechst Corporation Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures
CA1119447A (en) * 1978-09-06 1982-03-09 John P. Vikesland Positive-acting photoresist composition containing a crosslinked urethane resin, a cured epoxy resin and a photosensitizer
JPS601931B2 (en) * 1980-11-08 1985-01-18 住友金属工業株式会社 High tensile strength wire manufacturing method
JPS6043892B2 (en) * 1980-11-08 1985-10-01 住友金属工業株式会社 High tensile strength wire manufacturing method
JPS5811932A (en) * 1981-07-15 1983-01-22 Konishiroku Photo Ind Co Ltd Photosensitive composition
DE3404366A1 (en) * 1984-02-08 1985-08-14 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE MIXTURE BASED ON A DIAZONIUM SALT POLYCONDENSATION PRODUCT AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF
DE3528309A1 (en) * 1985-08-07 1987-02-12 Hoechst Ag LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF
CA1308595C (en) * 1985-11-22 1992-10-13 Toshiaki Aoai Photosensitive composition
DE3617499A1 (en) * 1986-05-24 1987-11-26 Hoechst Ag LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF
DE3644163A1 (en) * 1986-12-23 1988-07-07 Hoechst Ag LIGHT SENSITIVE MIXTURE BASED ON A DIAZONIUM SALT POLYCONDENSATION PRODUCT AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF
DE3644161A1 (en) * 1986-12-23 1988-07-07 Hoechst Ag LIGHT SENSITIVE MIXTURE BASED ON A DIAZONIUM SALT POLYCONDENSATION PRODUCT AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF
DE3811242A1 (en) * 1988-04-02 1989-10-19 Hoechst Ag BINDING AGENTS SOLUBLE IN Aqueous ALKALINE, CONTAINING SILANYL GROUPS IN THE SIDE CHAIN, PROCESS FOR THEIR PRODUCTION AND LIGHT-SENSITIVE MIXTURE, CONTAINING THESE COMPOUNDS
DE3920230A1 (en) * 1989-06-21 1991-01-24 Hoechst Ag LIGHT-SENSITIVE MIXTURE AND LIGHT-SENSITIVE RECORDING MATERIAL MANUFACTURED THEREFROM
EP0413087A1 (en) * 1989-07-20 1991-02-20 International Business Machines Corporation Photosensitive composition and use thereof
EP2233288A1 (en) * 2009-03-23 2010-09-29 Founder Fine Chemical Industry Co., Ltd. Radiation sensitive composition and method for preparing radiation sensitive composition

Also Published As

Publication number Publication date
AU470155B2 (en) 1976-03-04
CH607095A5 (en) 1978-11-30
BR7405009D0 (en) 1975-09-30
FR2234583A1 (en) 1975-01-17
DE2429251A1 (en) 1975-01-02
SE7407618L (en) 1974-12-23
AR205345A1 (en) 1976-04-30
GB1474073A (en) 1977-05-18
ZA743952B (en) 1975-06-25
CA1024803A (en) 1978-01-24
AU7023974A (en) 1976-01-08
JPS5036210A (en) 1975-04-05

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