FR2233154B3 - - Google Patents

Info

Publication number
FR2233154B3
FR2233154B3 FR7420938A FR7420938A FR2233154B3 FR 2233154 B3 FR2233154 B3 FR 2233154B3 FR 7420938 A FR7420938 A FR 7420938A FR 7420938 A FR7420938 A FR 7420938A FR 2233154 B3 FR2233154 B3 FR 2233154B3
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7420938A
Other languages
French (fr)
Other versions
FR2233154A1 (enrdf_load_stackoverflow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Boeing North American Inc
Original Assignee
Rockwell International Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rockwell International Corp filed Critical Rockwell International Corp
Publication of FR2233154A1 publication Critical patent/FR2233154A1/fr
Application granted granted Critical
Publication of FR2233154B3 publication Critical patent/FR2233154B3/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/53—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone involving the removal of at least part of the materials of the treated article, e.g. etching, drying of hardened concrete
    • C04B41/5338—Etching
    • C04B41/5361—Etching with molten material
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/91—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics involving the removal of part of the materials of the treated articles, e.g. etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
    • H01L21/4803—Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks
    • H01L21/4807—Ceramic parts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
FR7420938A 1973-06-18 1974-06-17 Expired FR2233154B3 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US371197A US3878005A (en) 1973-06-18 1973-06-18 Method of chemically polishing metallic oxides

Publications (2)

Publication Number Publication Date
FR2233154A1 FR2233154A1 (enrdf_load_stackoverflow) 1975-01-10
FR2233154B3 true FR2233154B3 (enrdf_load_stackoverflow) 1977-04-15

Family

ID=23462925

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7420938A Expired FR2233154B3 (enrdf_load_stackoverflow) 1973-06-18 1974-06-17

Country Status (4)

Country Link
US (1) US3878005A (enrdf_load_stackoverflow)
JP (1) JPS5022389A (enrdf_load_stackoverflow)
DE (1) DE2428696A1 (enrdf_load_stackoverflow)
FR (1) FR2233154B3 (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4033743A (en) * 1974-03-22 1977-07-05 General Electric Company Chemically polished polycrystalline alumina material
US4038117A (en) * 1975-09-04 1977-07-26 Ilc Technology, Inc. Process for gas polishing sapphire and the like
US4011099A (en) * 1975-11-07 1977-03-08 Monsanto Company Preparation of damage-free surface on alpha-alumina
US4069094A (en) * 1976-12-30 1978-01-17 Rca Corporation Method of manufacturing apertured aluminum oxide substrates
US4124698A (en) * 1977-02-14 1978-11-07 Tyco Laboratories, Inc. Method of chemically sharpening monocrystalline ribbon
JPS56122507A (en) * 1980-03-03 1981-09-26 Nec Corp Antenna having rotary asymmetrical radial beam
DE3523961A1 (de) * 1985-07-04 1987-01-15 Licentia Gmbh Vorrichtung zum behandeln mindestens eines keramikgegenstandes in einer alkalihydroxidschmelze
JPH0611617Y2 (ja) * 1987-03-31 1994-03-23 日本電気株式会社 アンテナ装置
US5330842A (en) * 1992-03-17 1994-07-19 David M. Volz Surface treated vestibule block and process of making the same
FR3023464B1 (fr) * 2014-07-08 2017-02-03 Seb Sa Revetement antiadhesif comprenant au moins une couche de decor fonctionnel et article muni d'un tel revetement
KR102074340B1 (ko) 2017-05-26 2020-02-06 한국생산기술연구원 사파이어 웨이퍼의 표면처리 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1242972B (de) * 1964-03-06 1967-06-22 Ibm Deutschland Verfahren zum AEtzen von SiC
US3510219A (en) * 1966-10-13 1970-05-05 Xerox Corp Optical alignment system
US3668082A (en) * 1970-12-07 1972-06-06 Ibm Method for strongly adhering a metal film on epoxy substrates
US3808065A (en) * 1972-02-28 1974-04-30 Rca Corp Method of polishing sapphire and spinel

Also Published As

Publication number Publication date
JPS5022389A (enrdf_load_stackoverflow) 1975-03-10
FR2233154A1 (enrdf_load_stackoverflow) 1975-01-10
DE2428696A1 (de) 1975-01-16
US3878005A (en) 1975-04-15

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Legal Events

Date Code Title Description
ST Notification of lapse