FR2232782A1 - - Google Patents

Info

Publication number
FR2232782A1
FR2232782A1 FR7419979A FR7419979A FR2232782A1 FR 2232782 A1 FR2232782 A1 FR 2232782A1 FR 7419979 A FR7419979 A FR 7419979A FR 7419979 A FR7419979 A FR 7419979A FR 2232782 A1 FR2232782 A1 FR 2232782A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7419979A
Other languages
French (fr)
Other versions
FR2232782B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Electrographic Corp
Original Assignee
Electrographic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Electrographic Corp filed Critical Electrographic Corp
Publication of FR2232782A1 publication Critical patent/FR2232782A1/fr
Application granted granted Critical
Publication of FR2232782B1 publication Critical patent/FR2232782B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR7419979A 1973-06-08 1974-06-10 Expired FR2232782B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US36832673A 1973-06-08 1973-06-08

Publications (2)

Publication Number Publication Date
FR2232782A1 true FR2232782A1 (en) 1975-01-03
FR2232782B1 FR2232782B1 (en) 1978-02-17

Family

ID=23450761

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7419979A Expired FR2232782B1 (en) 1973-06-08 1974-06-10

Country Status (15)

Country Link
JP (1) JPS5031906A (en)
BE (1) BE816052A (en)
BR (1) BR7404767D0 (en)
CH (1) CH620527A5 (en)
DE (1) DE2427494B2 (en)
DK (1) DK305774A (en)
ES (1) ES427084A1 (en)
FI (1) FI174374A (en)
FR (1) FR2232782B1 (en)
GB (1) GB1481472A (en)
IT (1) IT1014913B (en)
NL (1) NL7407705A (en)
NO (1) NO742048L (en)
SE (1) SE7407419L (en)
ZA (1) ZA743433B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0154237A2 (en) * 1984-02-23 1985-09-11 W.R. Grace & Co.-Conn. Photopolymer for use as a solder mask

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2929313C2 (en) * 1978-07-20 1997-05-15 Minnesota Mining & Mfg Shaped body with a plastic layer with a microstructured surface and process for its production
US4582885A (en) * 1978-07-20 1986-04-15 Minnesota Mining And Manufacturing Company Shaped plastic articles having replicated microstructure surfaces
DE2954645C2 (en) * 1978-07-20 1994-02-10 Minnesota Mining & Mfg Polymeric products with micro-structured surface
DE3131766A1 (en) * 1981-08-11 1983-02-24 Basf Ag, 6700 Ludwigshafen PHOTOPOLYMERIZABLE RECORDING MATERIAL AND METHOD FOR PRODUCING RELIEF FORMS BY THIS RECORDING MATERIAL
DE3328285A1 (en) * 1983-08-05 1985-02-21 Basf Ag, 6700 Ludwigshafen METHOD FOR PRODUCING LIGHT-CURED LAYERS WITH DEFINED HARDNESS
JPH021859A (en) * 1988-06-13 1990-01-08 Toyobo Co Ltd Photosensitive resin composition

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2012382A1 (en) * 1969-03-17 1970-12-23

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2012382A1 (en) * 1969-03-17 1970-12-23

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0154237A2 (en) * 1984-02-23 1985-09-11 W.R. Grace & Co.-Conn. Photopolymer for use as a solder mask
EP0154237A3 (en) * 1984-02-23 1987-05-06 W.R. Grace & Co.-Conn. Photopolymer for use as a solder mask

Also Published As

Publication number Publication date
CH620527A5 (en) 1980-11-28
ZA743433B (en) 1975-05-28
SE7407419L (en) 1974-12-09
DE2427494B2 (en) 1980-09-18
DE2427494A1 (en) 1975-01-09
JPS5031906A (en) 1975-03-28
BE816052A (en) 1974-12-09
BR7404767D0 (en) 1975-01-07
AU6960574A (en) 1975-12-04
IT1014913B (en) 1977-04-30
FR2232782B1 (en) 1978-02-17
NL7407705A (en) 1974-12-10
GB1481472A (en) 1977-07-27
DK305774A (en) 1975-01-27
NO742048L (en) 1975-01-06
ES427084A1 (en) 1976-07-16
FI174374A (en) 1974-12-09

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Legal Events

Date Code Title Description
ST Notification of lapse