FR2231983B1 - - Google Patents

Info

Publication number
FR2231983B1
FR2231983B1 FR7418171A FR7418171A FR2231983B1 FR 2231983 B1 FR2231983 B1 FR 2231983B1 FR 7418171 A FR7418171 A FR 7418171A FR 7418171 A FR7418171 A FR 7418171A FR 2231983 B1 FR2231983 B1 FR 2231983B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7418171A
Other versions
FR2231983A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of FR2231983A1 publication Critical patent/FR2231983A1/fr
Application granted granted Critical
Publication of FR2231983B1 publication Critical patent/FR2231983B1/fr
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/61Compositions containing diazo compounds as photosensitive substances with non-macromolecular additives
    • G03C1/615Substances generating bases
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/005Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/43Processing agents or their precursors, not covered by groups G03C1/07 - G03C1/42

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
FR7418171A 1973-05-29 1974-05-27 Expired FR2231983B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US36458173A 1973-05-29 1973-05-29

Publications (2)

Publication Number Publication Date
FR2231983A1 FR2231983A1 (fr) 1974-12-27
FR2231983B1 true FR2231983B1 (fr) 1977-10-14

Family

ID=23435154

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7418171A Expired FR2231983B1 (fr) 1973-05-29 1974-05-27

Country Status (6)

Country Link
JP (1) JPS5022625A (fr)
BE (1) BE815695A (fr)
CA (1) CA1010702A (fr)
DE (1) DE2425781A1 (fr)
FR (1) FR2231983B1 (fr)
GB (1) GB1470451A (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59174830A (ja) * 1983-03-25 1984-10-03 Fuji Photo Film Co Ltd 熱現像感光材料
DE3482606D1 (de) 1983-11-25 1990-08-02 Fuji Photo Film Co Ltd Waermeentwickelbares lichtempfindliches material.
US4710631A (en) * 1984-08-28 1987-12-01 Fuji Photo Film Co., Ltd. Temperature compensation for a semiconductor light source used for exposure of light sensitive material
US4775613A (en) 1985-03-30 1988-10-04 Fuji Photo Film Co., Ltd. Heat-developable light-sensitive material
JPH083621B2 (ja) 1985-07-31 1996-01-17 富士写真フイルム株式会社 画像形成方法
JPH0619553B2 (ja) * 1986-03-11 1994-03-16 富士写真フイルム株式会社 熱現像用感光材料
JPS6332536A (ja) * 1986-07-25 1988-02-12 Fuji Photo Film Co Ltd 感光材料
WO2019163981A1 (fr) 2018-02-26 2019-08-29 日本化薬株式会社 Agent de prolifération de bases, et composition de résine réactive aux bases contenant ledit agent de prolifération de bases

Also Published As

Publication number Publication date
CA1010702A (en) 1977-05-24
JPS5022625A (fr) 1975-03-11
DE2425781A1 (de) 1974-12-19
FR2231983A1 (fr) 1974-12-27
BE815695A (fr) 1974-11-29
GB1470451A (en) 1977-04-14

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Legal Events

Date Code Title Description
ST Notification of lapse