FR2222312A1 - - Google Patents

Info

Publication number
FR2222312A1
FR2222312A1 FR7405840A FR7405840A FR2222312A1 FR 2222312 A1 FR2222312 A1 FR 2222312A1 FR 7405840 A FR7405840 A FR 7405840A FR 7405840 A FR7405840 A FR 7405840A FR 2222312 A1 FR2222312 A1 FR 2222312A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7405840A
Other languages
French (fr)
Other versions
FR2222312B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2222312A1 publication Critical patent/FR2222312A1/fr
Application granted granted Critical
Publication of FR2222312B1 publication Critical patent/FR2222312B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
    • H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
    • H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
    • H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/02255—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by thermal treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Formation Of Insulating Films (AREA)
  • Silicon Compounds (AREA)
FR7405840A 1973-03-24 1974-02-13 Expired FR2222312B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2314746A DE2314746C2 (en) 1973-03-24 1973-03-24 Process for the thermal oxidation of silicon with the addition of a chlorocarbon compound

Publications (2)

Publication Number Publication Date
FR2222312A1 true FR2222312A1 (en) 1974-10-18
FR2222312B1 FR2222312B1 (en) 1976-12-03

Family

ID=5875788

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7405840A Expired FR2222312B1 (en) 1973-03-24 1974-02-13

Country Status (6)

Country Link
JP (1) JPS5247305B2 (en)
CA (1) CA1020849A (en)
DE (1) DE2314746C2 (en)
FR (1) FR2222312B1 (en)
GB (1) GB1447184A (en)
IT (1) IT1003483B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5690528A (en) * 1979-12-22 1981-07-22 Chiyou Lsi Gijutsu Kenkyu Kumiai Surface treatment of semiconductor device
US5268311A (en) * 1988-09-01 1993-12-07 International Business Machines Corporation Method for forming a thin dielectric layer on a substrate
US5139869A (en) * 1988-09-01 1992-08-18 Wolfgang Euen Thin dielectric layer on a substrate
EP0356557B1 (en) * 1988-09-01 1994-12-21 International Business Machines Corporation Thin dielectric layer on a substrate and method for forming such a layer

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NEANT *

Also Published As

Publication number Publication date
JPS5247305B2 (en) 1977-12-01
CA1020849A (en) 1977-11-15
IT1003483B (en) 1976-06-10
GB1447184A (en) 1976-08-25
FR2222312B1 (en) 1976-12-03
JPS5010081A (en) 1975-02-01
DE2314746C2 (en) 1983-11-17
DE2314746A1 (en) 1974-09-26

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Legal Events

Date Code Title Description
ST Notification of lapse