FR2191263A1 - - Google Patents

Info

Publication number
FR2191263A1
FR2191263A1 FR7321785A FR7321785A FR2191263A1 FR 2191263 A1 FR2191263 A1 FR 2191263A1 FR 7321785 A FR7321785 A FR 7321785A FR 7321785 A FR7321785 A FR 7321785A FR 2191263 A1 FR2191263 A1 FR 2191263A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7321785A
Other languages
French (fr)
Other versions
FR2191263B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR39852D priority Critical patent/FR39852E/en
Priority to GB1483473A priority patent/GB1416077A/en
Priority claimed from JP6208073A external-priority patent/JPS4964097A/ja
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Priority to FR7321785A priority patent/FR2191263B1/fr
Priority to DE2332091A priority patent/DE2332091C2/en
Priority to US429438A priority patent/US3876883A/en
Publication of FR2191263A1 publication Critical patent/FR2191263A1/fr
Application granted granted Critical
Publication of FR2191263B1 publication Critical patent/FR2191263B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3005—Observing the objects or the point of impact on the object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
FR7321785A 1972-06-30 1973-07-06 Expired FR2191263B1 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR39852D FR39852E (en) 1972-06-30 1931-03-09 Process for the production of solid dyes for vats
GB1483473A GB1416077A (en) 1972-06-30 1973-03-28 Electron beam apparatus
FR7321785A FR2191263B1 (en) 1972-06-30 1973-07-06
DE2332091A DE2332091C2 (en) 1972-06-30 1973-07-23 Method for operating a focusable and alignable electron beam projection device and electron beam projection device intended therefor
US429438A US3876883A (en) 1972-06-30 1973-12-28 Method and system for focusing and registration in electron beam projection microfabrication

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US26784472A 1972-06-30 1972-06-30
GB1483473A GB1416077A (en) 1972-06-30 1973-03-28 Electron beam apparatus
JP6208073A JPS4964097A (en) 1972-06-30 1973-06-04
FR7321785A FR2191263B1 (en) 1972-06-30 1973-07-06
DE2332091A DE2332091C2 (en) 1972-06-30 1973-07-23 Method for operating a focusable and alignable electron beam projection device and electron beam projection device intended therefor
US429438A US3876883A (en) 1972-06-30 1973-12-28 Method and system for focusing and registration in electron beam projection microfabrication

Publications (2)

Publication Number Publication Date
FR2191263A1 true FR2191263A1 (en) 1974-02-01
FR2191263B1 FR2191263B1 (en) 1977-02-11

Family

ID=27544212

Family Applications (2)

Application Number Title Priority Date Filing Date
FR39852D Expired FR39852E (en) 1972-06-30 1931-03-09 Process for the production of solid dyes for vats
FR7321785A Expired FR2191263B1 (en) 1972-06-30 1973-07-06

Family Applications Before (1)

Application Number Title Priority Date Filing Date
FR39852D Expired FR39852E (en) 1972-06-30 1931-03-09 Process for the production of solid dyes for vats

Country Status (4)

Country Link
US (1) US3876883A (en)
DE (1) DE2332091C2 (en)
FR (2) FR39852E (en)
GB (1) GB1416077A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2425661A1 (en) * 1978-05-08 1979-12-07 Rockwell International Corp PROCESS FOR LITHOGRAPHIC FORMATION OF MICROCIRCUITS BY MASKING WITH ELECTRON TRANSMISSION USING AN ELECTRON TRANSPARENT MASK

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2294489A1 (en) * 1974-12-13 1976-07-09 Thomson Csf DEVICE FOR THE PROGRAM TRACE OF DRAWINGS BY PARTICLE BOMBARDING
JPS5818213Y2 (en) * 1975-11-13 1983-04-13 日本ビクター株式会社 Denshijiyuu
US4393312A (en) * 1976-02-05 1983-07-12 Bell Telephone Laboratories, Incorporated Variable-spot scanning in an electron beam exposure system
JPS6051261B2 (en) * 1976-05-26 1985-11-13 株式会社東芝 Charged particle beam lithography equipment
US4039810A (en) * 1976-06-30 1977-08-02 International Business Machines Corporation Electron projection microfabrication system
US4097745A (en) * 1976-10-13 1978-06-27 General Electric Company High resolution matrix lens electron optical system
JPS6038020B2 (en) * 1976-11-08 1985-08-29 日本電子株式会社 Electron beam exposure equipment
SE403440B (en) * 1977-01-05 1978-08-21 Svenska Flaektfabriken Ab DEVICE FOR CLAMPING A CASSETTE FILTER IN A FILTER HOUSE
DE2702444C3 (en) * 1977-01-20 1980-10-09 Siemens Ag, 1000 Berlin Und 8000 Muenchen Corpuscular beam optical device for imaging a mask on a specimen
DE2702445C3 (en) * 1977-01-20 1980-10-09 Siemens Ag, 1000 Berlin Und 8000 Muenchen Corpuscular beam optical device for reducing the image of a mask onto a specimen to be irradiated
DE2702448C2 (en) * 1977-01-20 1982-12-16 Siemens AG, 1000 Berlin und 8000 München Method for positioning a workpiece provided with a mark relative to a scanning field or to a mask
JPS53121574A (en) * 1977-03-31 1978-10-24 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam exposing device
JPS53146575A (en) * 1977-05-27 1978-12-20 Nippon Telegr & Teleph Corp <Ntt> Electron beam projection image forming device
US4182958A (en) * 1977-05-31 1980-01-08 Rikagaku Kenkyusho Method and apparatus for projecting a beam of electrically charged particles
US4218621A (en) * 1977-06-15 1980-08-19 Vlsi Technology Research Association Electron beam exposure apparatus
US4167676A (en) * 1978-02-21 1979-09-11 Bell Telephone Laboratories, Incorporated Variable-spot scanning in an electron beam exposure system
DE2837590A1 (en) * 1978-08-29 1980-03-13 Ibm Deutschland METHOD FOR SHADOW EXPOSURE
US4213053A (en) * 1978-11-13 1980-07-15 International Business Machines Corporation Electron beam system with character projection capability
JPS5572807A (en) * 1978-11-27 1980-06-02 Hitachi Ltd Electron-beam mask check unit
JPS5621321A (en) * 1979-07-27 1981-02-27 Fujitsu Ltd Automatically setting method of focus and exposure coefficient of electron beam exposure apparatus
DE2939044A1 (en) * 1979-09-27 1981-04-09 Ibm Deutschland Gmbh, 7000 Stuttgart DEVICE FOR ELECTRON BEAM LITHOGRAPHY
JPS5968928A (en) * 1982-10-13 1984-04-19 Pioneer Electronic Corp Manufacture of semiconductor device
US4546260A (en) * 1983-06-30 1985-10-08 International Business Machines Corporation Alignment technique
JPS63166228A (en) * 1986-12-27 1988-07-09 Canon Inc Position detector
US5130547A (en) * 1989-11-30 1992-07-14 Fujitsu Limited Charged-particle beam exposure method and apparatus
DE4243489A1 (en) * 1992-12-22 1994-06-23 Zeiss Carl Fa Process for lighting with a focused electron beam and associated electron-optical lighting system
US5466904A (en) * 1993-12-23 1995-11-14 International Business Machines Corporation Electron beam lithography system
US6060711A (en) * 1997-01-27 2000-05-09 Nikon Corporation Charged-particle optical systems and pattern transfer apparatus comprising same
US6146910A (en) * 1999-02-02 2000-11-14 The United States Of America, As Represented By The Secretary Of Commerce Target configuration and method for extraction of overlay vectors from targets having concealed features
DE10034412A1 (en) 2000-07-14 2002-01-24 Leo Elektronenmikroskopie Gmbh Process for electron beam lithography and electron optical lithography system
EP1428006B1 (en) * 2001-01-26 2012-10-03 Fei Company Method and apparatus for scanned instrument calibration
US6770867B2 (en) 2001-06-29 2004-08-03 Fei Company Method and apparatus for scanned instrument calibration
US20040121069A1 (en) * 2002-08-08 2004-06-24 Ferranti David C. Repairing defects on photomasks using a charged particle beam and topographical data from a scanning probe microscope
WO2006076036A2 (en) * 2004-05-25 2006-07-20 The Trustees Of The University Of Pennsylvania Nanostructure assemblies, methods and devices thereof
US7332729B1 (en) * 2004-06-18 2008-02-19 Novelx, Inc. System and method for multiple electron, ion, and photon beam alignment
US7893697B2 (en) 2006-02-21 2011-02-22 Cyberoptics Semiconductor, Inc. Capacitive distance sensing in semiconductor processing tools
WO2008042199A2 (en) 2006-09-29 2008-04-10 Cyberoptics Semiconductor, Inc. Particles sensor integrated with substrate

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3434894A (en) * 1965-10-06 1969-03-25 Ion Physics Corp Fabricating solid state devices by ion implantation
US3472997A (en) * 1966-08-26 1969-10-14 Us Navy Secondary electron collection system

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3118050A (en) * 1960-04-06 1964-01-14 Alloyd Electronics Corp Electron beam devices and processes
US3326176A (en) * 1964-10-27 1967-06-20 Nat Res Corp Work-registration device including ionic beam probe
US3519788A (en) * 1967-01-13 1970-07-07 Ibm Automatic registration of an electron beam
US3491236A (en) * 1967-09-28 1970-01-20 Gen Electric Electron beam fabrication of microelectronic circuit patterns

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3434894A (en) * 1965-10-06 1969-03-25 Ion Physics Corp Fabricating solid state devices by ion implantation
US3472997A (en) * 1966-08-26 1969-10-14 Us Navy Secondary electron collection system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2425661A1 (en) * 1978-05-08 1979-12-07 Rockwell International Corp PROCESS FOR LITHOGRAPHIC FORMATION OF MICROCIRCUITS BY MASKING WITH ELECTRON TRANSMISSION USING AN ELECTRON TRANSPARENT MASK

Also Published As

Publication number Publication date
DE2332091C2 (en) 1982-04-01
DE2332091A1 (en) 1974-01-03
FR39852E (en) 1932-03-24
FR2191263B1 (en) 1977-02-11
US3876883A (en) 1975-04-08
GB1416077A (en) 1975-12-03

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Legal Events

Date Code Title Description
ST Notification of lapse