FR2188193A1 - - Google Patents
Info
- Publication number
- FR2188193A1 FR2188193A1 FR7320573A FR7320573A FR2188193A1 FR 2188193 A1 FR2188193 A1 FR 2188193A1 FR 7320573 A FR7320573 A FR 7320573A FR 7320573 A FR7320573 A FR 7320573A FR 2188193 A1 FR2188193 A1 FR 2188193A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- ing And Chemical Polishing (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US26198272A | 1972-06-12 | 1972-06-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR2188193A1 true FR2188193A1 (US06653308-20031125-C00199.png) | 1974-01-18 |
Family
ID=22995688
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7320573A Withdrawn FR2188193A1 (US06653308-20031125-C00199.png) | 1972-06-12 | 1973-06-06 |
Country Status (6)
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0301101A1 (en) * | 1987-02-02 | 1989-02-01 | Nippon Paint Co., Ltd. | Positive photosensitive resin composition |
| EP0302941A1 (en) * | 1987-02-02 | 1989-02-15 | Nippon Paint Co., Ltd. | Positive photosensitive resin composition and process for its production |
| EP0430302A2 (en) * | 1989-12-01 | 1991-06-05 | Tosoh Corporation | Positive photosensitive compositions for forming lenses |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2403054C2 (de) * | 1972-07-27 | 1983-01-13 | Hoechst Ag, 6000 Frankfurt | Verfahren zur Herstellung eines lichtempfindlichen Aufzeichnungsmaterials |
| JPS56122031A (en) * | 1980-03-01 | 1981-09-25 | Japan Synthetic Rubber Co Ltd | Positive type photosensitive resin composition |
| JPS57173941A (en) * | 1981-04-21 | 1982-10-26 | Oki Electric Ind Co Ltd | Formation of positive type photo resist pattern |
| US6737212B1 (en) | 1999-10-07 | 2004-05-18 | Clariant Finance (Bvi) Limited | Photosensitive composition |
| JP4213366B2 (ja) * | 2001-06-12 | 2009-01-21 | Ａｚエレクトロニックマテリアルズ株式会社 | 厚膜レジストパターンの形成方法 |
-
1973
- 1973-06-02 JP JP48062462A patent/JPS5114042B2/ja not_active Expired
- 1973-06-06 FR FR7320573A patent/FR2188193A1/fr not_active Withdrawn
- 1973-06-07 NL NL7307936A patent/NL7307936A/xx unknown
- 1973-06-07 DE DE19732329208 patent/DE2329208A1/de active Pending
- 1973-06-08 BE BE132093A patent/BE800708A/xx unknown
- 1973-06-12 GB GB2785873A patent/GB1440244A/en not_active Expired
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0301101A1 (en) * | 1987-02-02 | 1989-02-01 | Nippon Paint Co., Ltd. | Positive photosensitive resin composition |
| EP0302941A1 (en) * | 1987-02-02 | 1989-02-15 | Nippon Paint Co., Ltd. | Positive photosensitive resin composition and process for its production |
| EP0301101A4 (en) * | 1987-02-02 | 1990-02-22 | Nippon Paint Co Ltd | POSITIVE PHOTO-SENSITIVE RESIN PREPARATION. |
| EP0302941A4 (en) * | 1987-02-02 | 1990-02-22 | Nippon Paint Co Ltd | POSITIVE PHOTO-SENSITIVE RESIN PREPARATION AND METHOD FOR PRODUCING THE SAME. |
| EP0430302A2 (en) * | 1989-12-01 | 1991-06-05 | Tosoh Corporation | Positive photosensitive compositions for forming lenses |
| EP0430302A3 (en) * | 1989-12-01 | 1991-12-18 | Tosoh Corporation | Positive photosensitive compositions for forming lenses |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4957055A (US06653308-20031125-C00199.png) | 1974-06-03 |
| DE2329208A1 (de) | 1974-01-03 |
| NL7307936A (US06653308-20031125-C00199.png) | 1973-12-14 |
| BE800708A (fr) | 1973-10-01 |
| JPS5114042B2 (US06653308-20031125-C00199.png) | 1976-05-06 |
| GB1440244A (en) | 1976-06-23 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |