FR2170570A5 - - Google Patents

Info

Publication number
FR2170570A5
FR2170570A5 FR7246309A FR7246309A FR2170570A5 FR 2170570 A5 FR2170570 A5 FR 2170570A5 FR 7246309 A FR7246309 A FR 7246309A FR 7246309 A FR7246309 A FR 7246309A FR 2170570 A5 FR2170570 A5 FR 2170570A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7246309A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Northrop Grumman Properties Ltd
Original Assignee
Lucas Aerospace Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lucas Aerospace Ltd filed Critical Lucas Aerospace Ltd
Application granted granted Critical
Publication of FR2170570A5 publication Critical patent/FR2170570A5/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
FR7246309A 1971-12-29 1972-12-27 Expired FR2170570A5 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB6050171 1971-12-29

Publications (1)

Publication Number Publication Date
FR2170570A5 true FR2170570A5 (de) 1973-09-14

Family

ID=10485691

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7246309A Expired FR2170570A5 (de) 1971-12-29 1972-12-27

Country Status (5)

Country Link
US (1) US3838028A (de)
JP (1) JPS4873380A (de)
DE (1) DE2263737A1 (de)
FR (1) FR2170570A5 (de)
IT (1) IT974360B (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0031704A2 (de) * 1979-12-26 1981-07-08 Western Electric Company, Incorporated Vorrichtung zur Bearbeitung mit reaktivem Plasma

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4109157A (en) * 1975-12-18 1978-08-22 Kawasaki Jukogyo Kabushiki Kaisha Apparatus for ion-nitriding
US4204942A (en) * 1978-10-11 1980-05-27 Heat Mirror Associates Apparatus for multilayer thin film deposition
US4298444A (en) * 1978-10-11 1981-11-03 Heat Mirror Associates Method for multilayer thin film deposition
US4756815A (en) * 1979-12-21 1988-07-12 Varian Associates, Inc. Wafer coating system
US5024747A (en) * 1979-12-21 1991-06-18 Varian Associates, Inc. Wafer coating system
DE4302851A1 (de) * 1993-02-02 1994-08-04 Leybold Ag Vorrichtung zum Anbringen und/oder Entfernen einer Maske an einem Substrat
JP3973112B2 (ja) * 1995-06-07 2007-09-12 バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド ウェーハの向き整合システム
US5985115A (en) * 1997-04-11 1999-11-16 Novellus Systems, Inc. Internally cooled target assembly for magnetron sputtering
CN104404463B (zh) * 2014-11-14 2017-02-22 河海大学 一种平面磁控溅射靶

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0031704A2 (de) * 1979-12-26 1981-07-08 Western Electric Company, Incorporated Vorrichtung zur Bearbeitung mit reaktivem Plasma
EP0031704A3 (en) * 1979-12-26 1982-08-04 Western Electric Company, Incorporated Improvements in or relating to reactive plasma processes and apparatus therefor

Also Published As

Publication number Publication date
JPS4873380A (de) 1973-10-03
US3838028A (en) 1974-09-24
IT974360B (it) 1974-06-20
DE2263737A1 (de) 1973-07-12

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Legal Events

Date Code Title Description
CD Change of name or company name
TP Transmission of property
ST Notification of lapse