FR2147497A5 - - Google Patents

Info

Publication number
FR2147497A5
FR2147497A5 FR7127812A FR7127812A FR2147497A5 FR 2147497 A5 FR2147497 A5 FR 2147497A5 FR 7127812 A FR7127812 A FR 7127812A FR 7127812 A FR7127812 A FR 7127812A FR 2147497 A5 FR2147497 A5 FR 2147497A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7127812A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR7127812A priority Critical patent/FR2147497A5/fr
Priority to US00275304A priority patent/US3778656A/en
Priority to GB3521172A priority patent/GB1352654A/en
Priority to DE2237252A priority patent/DE2237252A1/en
Priority to DE19727228091U priority patent/DE7228091U/en
Application granted granted Critical
Publication of FR2147497A5 publication Critical patent/FR2147497A5/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
FR7127812A 1971-07-29 1971-07-29 Expired FR2147497A5 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR7127812A FR2147497A5 (en) 1971-07-29 1971-07-29
US00275304A US3778656A (en) 1971-07-29 1972-07-26 Ion source employing a microwave resonant cavity
GB3521172A GB1352654A (en) 1971-07-29 1972-07-27 Ion source which makes use of a microwave resonant cavity
DE2237252A DE2237252A1 (en) 1971-07-29 1972-07-28 ION SOURCE WITH HIGH FREQUENCY CAVITY RESONATOR
DE19727228091U DE7228091U (en) 1971-07-29 1972-07-28 ION SOURCE WITH HIGH FREQUENCY CAVITY RESONATOR

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7127812A FR2147497A5 (en) 1971-07-29 1971-07-29

Publications (1)

Publication Number Publication Date
FR2147497A5 true FR2147497A5 (en) 1973-03-09

Family

ID=9081130

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7127812A Expired FR2147497A5 (en) 1971-07-29 1971-07-29

Country Status (4)

Country Link
US (1) US3778656A (en)
DE (2) DE7228091U (en)
FR (1) FR2147497A5 (en)
GB (1) GB1352654A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2475798A1 (en) * 1980-02-13 1981-08-14 Commissariat Energie Atomique METHOD AND DEVICE FOR PRODUCING HIGHLY CHARGED HEAVY IONS AND AN APPLICATION USING THE METHOD
EP0334184A2 (en) * 1988-03-16 1989-09-27 Hitachi, Ltd. Microwave ion source

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2621824C2 (en) * 1976-05-17 1982-04-29 Hitachi, Ltd., Tokyo Microwave Discharge Ion Source
US4185213A (en) * 1977-08-31 1980-01-22 Reynolds Metals Company Gaseous electrode for MHD generator
JPS55131175A (en) * 1979-03-30 1980-10-11 Toshiba Corp Surface treatment apparatus with microwave plasma
US4240007A (en) * 1979-06-29 1980-12-16 International Business Machines Corporation Microchannel ion gun
US4393333A (en) * 1979-12-10 1983-07-12 Hitachi, Ltd. Microwave plasma ion source
JPS5947421B2 (en) * 1980-03-24 1984-11-19 株式会社日立製作所 microwave ion source
CA1159012A (en) * 1980-05-02 1983-12-20 Seitaro Matsuo Plasma deposition apparatus
JPS5779621A (en) * 1980-11-05 1982-05-18 Mitsubishi Electric Corp Plasma processing device
JPS6043620B2 (en) * 1982-11-25 1985-09-28 日新ハイボルテージ株式会社 microwave ion source
US4507588A (en) * 1983-02-28 1985-03-26 Board Of Trustees Operating Michigan State University Ion generating apparatus and method for the use thereof
FR2546358B1 (en) * 1983-05-20 1985-07-05 Commissariat Energie Atomique ION SOURCE WITH ELECTRON CYCLOTRON RESONANCE
FR2572847B1 (en) * 1984-11-06 1986-12-26 Commissariat Energie Atomique METHOD AND DEVICE FOR IGNITION OF A MICROWAVE ION SOURCE
US4649278A (en) * 1985-05-02 1987-03-10 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Generation of intense negative ion beams
DE3703207A1 (en) * 1987-02-04 1988-08-18 Loet Und Schweissgeraete Gmbh High-frequency (radio-frequency) ion source
DE3712971A1 (en) * 1987-04-16 1988-11-03 Plasonic Oberflaechentechnik G Method and device for producing (generating) a plasma
US4778561A (en) * 1987-10-30 1988-10-18 Veeco Instruments, Inc. Electron cyclotron resonance plasma source
DE3738352A1 (en) * 1987-11-11 1989-05-24 Technics Plasma Gmbh FILAMENTLESS MAGNETRON ION BEAM SYSTEM
DE3803355A1 (en) * 1988-02-05 1989-08-17 Leybold Ag PARTICLE SOURCE FOR A REACTIVE ION BEAM OR PLASMA POSITIONING PLANT
DE3834984A1 (en) * 1988-10-14 1990-04-19 Leybold Ag DEVICE FOR GENERATING ELECTRICALLY CHARGED AND / OR UNCHARGED PARTICLES
GB9224745D0 (en) * 1992-11-26 1993-01-13 Atomic Energy Authority Uk Microwave plasma generator
DE19513345C2 (en) * 1995-04-08 2000-08-03 Ehret Hans P ECR ion source
DE19600223A1 (en) * 1996-01-05 1997-07-17 Ralf Dr Dipl Phys Spitzl Device for generating plasmas using microwaves
DE19608949A1 (en) * 1996-03-08 1997-09-11 Ralf Dr Spitzl Device for generating powerful microwave plasmas
DE19757852C2 (en) * 1997-12-24 2001-06-28 Karlsruhe Forschzent Device and method for doping vascular supports with radioactive and non-radioactive atoms
DE19900437B4 (en) * 1999-01-11 2009-04-23 Ehret, Hans-P. Method and device for ion implantation in solids and / or for coating solid surfaces and the use of methods and apparatus
ATE335928T1 (en) 2003-03-20 2006-09-15 Elwing Llc PROPULSION SYSTEM FOR SPACE VEHICLES
US7461502B2 (en) * 2003-03-20 2008-12-09 Elwing Llc Spacecraft thruster
DE602004024993D1 (en) * 2004-09-22 2010-02-25 Elwing Llc Drive system for spacecraft
CN101855700B (en) 2007-10-10 2012-12-05 Mks仪器股份有限公司 Chemical ionization reaction or proton transfer reaction mass spectrometry with a quadrupole or time-of-flight mass spectrometer
NL2014415B1 (en) * 2015-03-06 2016-10-13 Jiaco Instr Holding B V System and method for decapsulation of plastic integrated circuit packages.
CN106102301B (en) * 2016-07-29 2019-01-29 中国原子能科学研究院 It can high voltage bearing electrostatic deflection plates in compact superconduction bevatron
ES2696227B2 (en) * 2018-07-10 2019-06-12 Centro De Investig Energeticas Medioambientales Y Tecnologicas Ciemat INTERNAL ION SOURCE FOR LOW EROSION CYCLONES

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3418206A (en) * 1963-04-29 1968-12-24 Boeing Co Particle accelerator

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2475798A1 (en) * 1980-02-13 1981-08-14 Commissariat Energie Atomique METHOD AND DEVICE FOR PRODUCING HIGHLY CHARGED HEAVY IONS AND AN APPLICATION USING THE METHOD
EP0334184A2 (en) * 1988-03-16 1989-09-27 Hitachi, Ltd. Microwave ion source
EP0334184A3 (en) * 1988-03-16 1989-11-29 Hitachi, Ltd. Microwave ion source

Also Published As

Publication number Publication date
US3778656A (en) 1973-12-11
GB1352654A (en) 1974-05-08
DE7228091U (en) 1973-09-20
DE2237252A1 (en) 1973-02-01

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Legal Events

Date Code Title Description
ST Notification of lapse