CN106102301B - It can high voltage bearing electrostatic deflection plates in compact superconduction bevatron - Google Patents
It can high voltage bearing electrostatic deflection plates in compact superconduction bevatron Download PDFInfo
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- CN106102301B CN106102301B CN201610616102.5A CN201610616102A CN106102301B CN 106102301 B CN106102301 B CN 106102301B CN 201610616102 A CN201610616102 A CN 201610616102A CN 106102301 B CN106102301 B CN 106102301B
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- earth plate
- electrostatic deflection
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- field electrode
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H13/00—Magnetic resonance accelerators; Cyclotrons
- H05H13/005—Cyclotrons
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Abstract
The present invention relates to can high voltage bearing electrostatic deflection plates in a kind of compact superconduction bevatron, including the space crowded around by upper earth plate, lower earth plate, rear earth plate and cutting plate, high-field electrode is equipped in the space, the high-field electrode is fixed on rear earth plate by insulated column, the length of insulated column should ensure that creepage distance not less than 25mm, and cutting plate is in thick, intermediate thin structure up and down.Present invention optimizes the structure size of electrostatic deflection plates high-field electrode in superconduction bevatron and the distance between high-field electrode surfaces and grounding plate, it can reduce high-field electrode surface field, weaken Field Electron Emission, helps to improve the voltage endurance capability of deflecting plates；The difficulty of deflecting plates treatment of electrode surfaces is reduced simultaneously, reduces manufacturing cost.
Description
Technical field
A kind of electrostatic high-pressure technology that the invention belongs to be applied in superconduction bevatron, and in particular to compact
It can high voltage bearing electrostatic deflection plates in superconduction bevatron.
Background technique
Superconduction bevatron has in fields such as nuclear medicine, space flight military project and nuclear physics basic research widely answers
With.Electrostatic deflection plates are common line outbound courses in cyclotron.Electrostatic deflection plates by cutting plate, negative high-voltage electrode,
Grounded metal enclosure and insulated column composition, cut plate earthing, electrode is by external power supply feed-in high pressure.Exist in electrostatic deflection plates
Two kinds of discharge breakdown mechanism: vacuum breakdown and insulation breakdown.For the former, mainly high-field electrode surface field emitted electron draws
It rises.Electronics is beaten on metal shell from electrode surface transmitting, and metal discharges gaseous contamination vacuum environment, and it is existing to be easy to produce sparking
As；On the other hand, the excessively high possibility of metal local temperature melts, and being dropped on high-field electrode causes electrode surface generation recessed
It falls into, to generate the electrostatic deflection plates damage of unrepairable.Magnetic pole gap very little in compact superconducting cyclotron, generally not
More than 60mm, electrostatic deflection plates are placed in the gap of peak area magnetic pole, cause high-field electrode non-at a distance from ground metal surface
Chang Jin, and desired deflecting plates voltage is often higher, and spark phenomenon easily occurs.For insulation breakdown, it is ensured that insulated column
Creepage distance, and keep the vacuum degree of deflecting plates local environment.
Summary of the invention
The purpose of the present invention is sparking easily occurs for electrostatic deflection plates in compact superconduction bevatron to hit
The problem of wearing, providing one kind can high voltage bearing electrostatic deflection plates structure.
Technical scheme is as follows: can high voltage bearing electrostatic deflection in a kind of compact superconduction bevatron
Plate is equipped with high pressure including the space crowded around by upper earth plate, lower earth plate, rear earth plate and cutting plate in the space
Electrode, the high-field electrode are fixed on rear earth plate by insulated column, wherein the insulated column is in thread-like structure, spiral shell
Airspace between line is 2-5mm, and the length of insulated column should ensure that creepage distance not less than 25mm.
It further, can high voltage bearing electrostatic deflection plates in compact superconduction bevatron as described above, wherein
The cutting plate is inserted into earth plate and lower earth plate in thick, intermediate thin structure, the upper and lower ends of cutting plate up and down respectively
Sliding slot realize fix.
Further, the cutting plate middle section with a thickness of 0.1-0.3mm；Top and the bottom with a thickness of 1-2mm.
It further, can high voltage bearing electrostatic deflection plates in compact superconduction bevatron as described above, wherein
It is respectively equipped with groove on the inside of the upper earth plate, lower earth plate, for increasing high-field electrode upper and lower ends and upper earth plate
The distance between lower earth plate.
Further, the depth of the groove is 1-3mm.
It further, can high voltage bearing electrostatic deflection plates in compact superconduction bevatron as described above, wherein
The high-field electrode perpendicular to the section of the line direction of motion be it is run-track shaped, the length of the straightway in section is 8-10mm, ring
Shape chamfer radius is 6-7mm.
Beneficial effects of the present invention are as follows: present invention optimizes electrostatic deflection plates high-voltage electricity in superconduction bevatron
The structure size of pole and the distance between high-field electrode surface and grounding plate, can reduce high-field electrode surface field,
Weaken Field Electron Emission, helps to improve the voltage endurance capability of deflecting plates；The difficulty of deflecting plates treatment of electrode surfaces is reduced simultaneously,
Reduce manufacturing cost.
Detailed description of the invention
Fig. 1 is the overall structure diagram of electrostatic deflection plates of the present invention；
Fig. 2 is the view in transverse section of electrostatic deflection plates of the present invention；
Fig. 3 is the corresponding surface electric field distribution figure of high-field electrode of different dimensional structures.
Specific embodiment
The present invention is described in detail below with reference to the accompanying drawings and embodiments.
As shown in Figure 1, electrostatic deflection plates provided by the present invention mainly by high-field electrode 1, cutting plate 2, upper earth plate 3,
Earth plate 4, lower earth plate 7 and insulated column 5 form afterwards.In order to avoid high-field electrode 1 and earth plate, cutting plate and metal shell it
Between strike sparks, on the one hand require high-field electrode surface and grounded metal to keep certain distance, while also requiring high-field electrode flat
The height h of face part is greater than line axial direction largest enveloping, provides impartial deflection voltage for major part line.
Nut connection is respectively adopted between upper earth plate 3, lower earth plate 7 and rear earth plate 4；Insulated column 5 is made pottery using glass
Ceramic material, both ends welding metal, one end are fixed on rear earth plate 4 using nut, the fixed high-field electrode 1 of the other end, to high pressure
Electrode 1 is played a supporting role.
As shown in Fig. 2, insulated column 5, which is made into shape of threads, increases its creepage distance, the airspace d between screw thread is 2-5mm；
Cutting plate 2 is made into upper and lower thick, intermediate thin structure, is slid into deflecting plates by the sliding slot of upper and lower earth plate.
The length of insulated column 5 should be ensured that creepage distance is not less than in 25mm；Cutting plate middle section thickness w1 is 0.1-
0.3mm, reduces the beam loss on cutting plate to the full extent, and top and the bottom thickness w2 improves whole mechanicalness up to 1-2mm
Energy.
1 upper and lower ends of high-field electrode are the places for being easiest to strike sparks, in order to increase high-field electrode both ends and connect above and below
The depth s of the distance on floor, the recessing 6 in upper and lower earth plate, groove is 1-3mm, so as to increase high-field electrode both ends
Between upper and lower earth plate at a distance from 1-3mm.
As shown in Fig. 2, high-field electrode perpendicular to the line direction of motion section be it is run-track shaped, the length h of straightway is
8-10mm, annular chamfer radius r are 6-7mm, have both guaranteed that all beam acceleration voltages were relatively uniform, and have also ensured electrode surface
Sparking voltage is smaller.
Above-mentioned electrostatic deflection plates, which are placed, is suitable for compact-sized superconduction bevatron magnet, and magnetic pole gap is general
For 50mm-60mm, required voltage is more critical, is higher than 50kV, but still within 80kV.
The cutting plate of electrostatic deflection plates and several pieces of metal ground plates constitute the shape grounding frame of electrostatic deflection plates, high-voltage electricity
Pole is supported by the way that insulated column is fixed, and shape determines the field distribution in deflecting plates, line from cutting plate and high pole electrode it
Between pass through.
Embodiment
In certain superconduction bevatron, extraction proton energy is 240MeV, is drawn by two electrostatic deflection plates, first
The cutting plate of a deflecting plates between high-field electrode at a distance from be 6mm, it is desirable that deflecting electric field intensity be 100kV/cm, it is corresponding to require
Voltage be 60kV.Accelerator magnetic pole gap is 50mm, and the axial space for leaving deflecting plates for is very limited, using in the present invention
The design of deflecting plates structure, as shown in Fig. 2, the height H of electrostatic deflection plates takes 50mm, is just installed in magnetic pole gap, and take height
Piezoelectricity pole length of straigh line h is 10mm, and chamfer radius r is 7mm, and depth of groove s takes 3mm, reaches electrode at a distance from upper and lower plates
To 9mm, avoid striking sparks as far as possible.Insulated column uses thread-like structure, and the space interval d between screw thread is 3mm, the straight line of threaded post
Distance is 20mm, this kind of structure makes creepage distance increase to 28mm.Fig. 3 gives the electrode under different deflecting plates electrode structures
Field distribution in arc-shaped surface, the present invention used in deflecting plates electrode size voltage endurance capability than other structures shape
10%-20% is improved, this realizes that higher ejection efficiency is very crucial in compact superconducting cyclotron.
Obviously, various changes and modifications can be made to the invention without departing from essence of the invention by those skilled in the art
Mind and range.If in this way, belonging to the model of the claims in the present invention and its equivalent technology to these modifications and changes of the present invention
Within enclosing, then the present invention is also intended to include these modifications and variations.
Claims (5)
1. in a kind of compact superconduction bevatron can high voltage bearing electrostatic deflection plates, including by upper earth plate (3), under
The space that earth plate (7), rear earth plate (4) and cutting plate (2) are crowded around is equipped with high-field electrode (1) in the space, described
High-field electrode (1) is fixed on rear earth plate (4) by insulated column (5), it is characterised in that: the insulated column (5) is in screw thread
Shape structure, the airspace between screw thread are 2-5mm, the length of insulated column (5) should ensure that creepage distance not less than 25mm, it is described
Cutting plate (2) in thick, intermediate thin structure up and down, the upper and lower ends of cutting plate (2) be inserted into respectively earth plate (3) and under connect
The sliding slot on floor (7), which is realized, to be fixed.
2. in compact superconduction bevatron as described in claim 1 can high voltage bearing electrostatic deflection plates, feature
Be: described cutting plate (2) middle section with a thickness of 0.1-0.3mm；Top and the bottom with a thickness of 1-2mm, guarantee mechanical
On stability.
3. in compact superconduction bevatron as claimed in claim 1 or 2 can high voltage bearing electrostatic deflection plates, it is special
Sign is: groove (6) is respectively equipped on the inside of the upper earth plate, lower earth plate, for increasing high-field electrode upper and lower ends
With the distance between upper earth plate and lower earth plate.
4. in compact superconduction bevatron as claimed in claim 3 can high voltage bearing electrostatic deflection plates, feature
Be: the depth of the groove (6) is 1-3mm.
5. in compact superconduction bevatron as claimed in claim 1 or 2 can high voltage bearing electrostatic deflection plates, it is special
Sign is: the high-field electrode perpendicular to the section of the line direction of motion be it is run-track shaped, the length of the straightway in section is 8-
10mm, annular chamfer radius are 6-7mm.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610616102.5A CN106102301B (en) | 2016-07-29 | 2016-07-29 | It can high voltage bearing electrostatic deflection plates in compact superconduction bevatron |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610616102.5A CN106102301B (en) | 2016-07-29 | 2016-07-29 | It can high voltage bearing electrostatic deflection plates in compact superconduction bevatron |
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| Publication Number | Publication Date |
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| CN106102301A CN106102301A (en) | 2016-11-09 |
| CN106102301B true CN106102301B (en) | 2019-01-29 |
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| CN201610616102.5A Active CN106102301B (en) | 2016-07-29 | 2016-07-29 | It can high voltage bearing electrostatic deflection plates in compact superconduction bevatron |
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Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107333379B (en) * | 2017-08-22 | 2018-03-30 | 合肥中科离子医学技术装备有限公司 | A kind of superconduction bevatron beam bending device |
| CN110582156B (en) * | 2019-07-31 | 2021-06-01 | 中国科学院近代物理研究所 | Particle beam deflection device for annular particle accelerator |
| CN112437534B (en) * | 2020-11-20 | 2024-08-23 | 中国科学院近代物理研究所 | Adjusting mechanism and adjusting method for high-voltage electrode |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3778656A (en) * | 1971-07-29 | 1973-12-11 | Commissariat Energie Atomique | Ion source employing a microwave resonant cavity |
| CN101699929A (en) * | 2009-08-03 | 2010-04-28 | 中国科学院近代物理研究所 | High-voltage feed-in vacuum state device with motion compensation |
| CN201491364U (en) * | 2009-08-03 | 2010-05-26 | 中国科学院近代物理研究所 | High-voltage feed-in vacuum state device |
| CN205883694U (en) * | 2016-07-29 | 2017-01-11 | 中国原子能科学研究院 | Electrostatic deflection plate that can be high pressure resistant among superconductive proton cyclotron of compact |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2869719B1 (en) * | 2004-04-29 | 2007-03-30 | Pascal Sortais | LIGHT SOURCE WITH ELECTRON CYCLOTRONIC RESONANCE |
-
2016
- 2016-07-29 CN CN201610616102.5A patent/CN106102301B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3778656A (en) * | 1971-07-29 | 1973-12-11 | Commissariat Energie Atomique | Ion source employing a microwave resonant cavity |
| CN101699929A (en) * | 2009-08-03 | 2010-04-28 | 中国科学院近代物理研究所 | High-voltage feed-in vacuum state device with motion compensation |
| CN201491364U (en) * | 2009-08-03 | 2010-05-26 | 中国科学院近代物理研究所 | High-voltage feed-in vacuum state device |
| CN205883694U (en) * | 2016-07-29 | 2017-01-11 | 中国原子能科学研究院 | Electrostatic deflection plate that can be high pressure resistant among superconductive proton cyclotron of compact |
Non-Patent Citations (1)
| Title |
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| SFC引出静电偏转板高压放电研究;李兆龙等;《原子核物理评论》;20081231;摘要、图1、正文第1-3节 |
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