FR2130353B1 - - Google Patents

Info

Publication number
FR2130353B1
FR2130353B1 FR7209315A FR7209315A FR2130353B1 FR 2130353 B1 FR2130353 B1 FR 2130353B1 FR 7209315 A FR7209315 A FR 7209315A FR 7209315 A FR7209315 A FR 7209315A FR 2130353 B1 FR2130353 B1 FR 2130353B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7209315A
Other languages
French (fr)
Other versions
FR2130353A1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Micronas GmbH
ITT Inc
Original Assignee
Deutsche ITT Industries GmbH
ITT Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Deutsche ITT Industries GmbH, ITT Industries Inc filed Critical Deutsche ITT Industries GmbH
Publication of FR2130353A1 publication Critical patent/FR2130353A1/fr
Application granted granted Critical
Publication of FR2130353B1 publication Critical patent/FR2130353B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H10P14/69433—
    • H10P14/6334—
    • H10P14/6529—
    • H10P14/6682—
    • H10P50/283—
FR7209315A 1971-03-19 1972-03-17 Gas-etching for silicon nitride deposits - by glow discharge technique Granted FR2130353A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12626471A 1971-03-19 1971-03-19

Publications (2)

Publication Number Publication Date
FR2130353A1 FR2130353A1 (en) 1972-11-03
FR2130353B1 true FR2130353B1 (enExample) 1977-03-25

Family

ID=22423889

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7209315A Granted FR2130353A1 (en) 1971-03-19 1972-03-17 Gas-etching for silicon nitride deposits - by glow discharge technique

Country Status (2)

Country Link
DE (1) DE2213036C3 (enExample)
FR (1) FR2130353A1 (enExample)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3479680A (en) * 1967-05-08 1969-11-25 Stewart Warner Corp Caster seal
US3637423A (en) * 1969-02-10 1972-01-25 Westinghouse Electric Corp Pyrolytic deposition of silicon nitride films
US3615956A (en) * 1969-03-27 1971-10-26 Signetics Corp Gas plasma vapor etching process

Also Published As

Publication number Publication date
DE2213036B2 (de) 1976-11-11
DE2213036C3 (de) 1978-06-15
FR2130353A1 (en) 1972-11-03
DE2213036A1 (de) 1972-09-21

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Legal Events

Date Code Title Description
ST Notification of lapse