FR2129996B1 - - Google Patents
Info
- Publication number
- FR2129996B1 FR2129996B1 FR7110598A FR7110598A FR2129996B1 FR 2129996 B1 FR2129996 B1 FR 2129996B1 FR 7110598 A FR7110598 A FR 7110598A FR 7110598 A FR7110598 A FR 7110598A FR 2129996 B1 FR2129996 B1 FR 2129996B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7110598A FR2129996B1 (es) | 1971-03-25 | 1971-03-25 | |
US236609A US3925187A (en) | 1971-03-25 | 1972-03-21 | Apparatus for the formation of coatings on a substratum |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7110598A FR2129996B1 (es) | 1971-03-25 | 1971-03-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2129996A1 FR2129996A1 (es) | 1972-11-03 |
FR2129996B1 true FR2129996B1 (es) | 1975-01-17 |
Family
ID=9074128
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7110598A Expired FR2129996B1 (es) | 1971-03-25 | 1971-03-25 |
Country Status (2)
Country | Link |
---|---|
US (1) | US3925187A (es) |
FR (1) | FR2129996B1 (es) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH611938A5 (es) * | 1976-05-19 | 1979-06-29 | Battelle Memorial Institute | |
US4199448A (en) * | 1976-06-09 | 1980-04-22 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Reverse osmosis membrane of high urea rejection properties |
US4142958A (en) * | 1978-04-13 | 1979-03-06 | Litton Systems, Inc. | Method for fabricating multi-layer optical films |
USRE32849E (en) * | 1978-04-13 | 1989-01-31 | Litton Systems, Inc. | Method for fabricating multi-layer optical films |
DE2847620C2 (de) * | 1978-11-02 | 1984-10-18 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zur Herstellung von elektrischen Bauelementen, insbesondere Schichtkondensatoren |
CH640886A5 (de) * | 1979-08-02 | 1984-01-31 | Balzers Hochvakuum | Verfahren zum aufbringen harter verschleissfester ueberzuege auf unterlagen. |
US4305801A (en) * | 1980-04-16 | 1981-12-15 | The United States Of America As Represented By The United States Department Of Energy | Line-of-sight deposition method |
US5250327A (en) * | 1986-04-28 | 1993-10-05 | Nissin Electric Co. Ltd. | Composite substrate and process for producing the same |
FR2619247A1 (fr) * | 1987-08-05 | 1989-02-10 | Realisations Nucleaires Et | Implanteur d'ions metalliques |
DE3737142A1 (de) * | 1987-11-02 | 1989-05-11 | Christiansen Jens | Erzeugung von (duennen) schichten aus hochschmelzender bzw. sublimierender materie (leitender, halbleitender und nichtleitender) und gemischen davon mit pseudofunkenelektronenstrahlen |
US5087478A (en) * | 1989-08-01 | 1992-02-11 | Hughes Aircraft Company | Deposition method and apparatus using plasma discharge |
US5601652A (en) * | 1989-08-03 | 1997-02-11 | United Technologies Corporation | Apparatus for applying ceramic coatings |
US5855950A (en) * | 1996-12-30 | 1999-01-05 | Implant Sciences Corporation | Method for growing an alumina surface on orthopaedic implant components |
GB2321063A (en) * | 1997-01-08 | 1998-07-15 | Oxford Plasma Technology Ltd | Reactive particle beam sputtering |
US6348113B1 (en) * | 1998-11-25 | 2002-02-19 | Cabot Corporation | High purity tantalum, products containing the same, and methods of making the same |
US6413380B1 (en) | 2000-08-14 | 2002-07-02 | International Business Machines Corporation | Method and apparatus for providing deposited layer structures and articles so produced |
CN101374611B (zh) * | 2006-03-07 | 2015-04-08 | 卡伯特公司 | 制备变形金属制品的方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3472751A (en) * | 1965-06-16 | 1969-10-14 | Ion Physics Corp | Method and apparatus for forming deposits on a substrate by cathode sputtering using a focussed ion beam |
US3484358A (en) * | 1966-09-01 | 1969-12-16 | Bell Telephone Labor Inc | Method and apparatus for reactive sputtering wherein the sputtering target is contacted by an inert gas |
US3408283A (en) * | 1966-09-15 | 1968-10-29 | Kennecott Copper Corp | High current duoplasmatron having an apertured anode positioned in the low pressure region |
GB1217685A (en) * | 1967-06-05 | 1970-12-31 | Smiths Industries Ltd | Improvements in or relating to methods and apparatus for sputtering of materials |
US3409529A (en) * | 1967-07-07 | 1968-11-05 | Kennecott Copper Corp | High current duoplasmatron having an apertured anode comprising a metal of high magnetic permeability |
-
1971
- 1971-03-25 FR FR7110598A patent/FR2129996B1/fr not_active Expired
-
1972
- 1972-03-21 US US236609A patent/US3925187A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US3925187A (en) | 1975-12-09 |
USB236609I5 (es) | 1975-01-28 |
FR2129996A1 (es) | 1972-11-03 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |