FR2128822A1 - - Google Patents

Info

Publication number
FR2128822A1
FR2128822A1 FR7208432A FR7208432A FR2128822A1 FR 2128822 A1 FR2128822 A1 FR 2128822A1 FR 7208432 A FR7208432 A FR 7208432A FR 7208432 A FR7208432 A FR 7208432A FR 2128822 A1 FR2128822 A1 FR 2128822A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7208432A
Other versions
FR2128822B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pentax Corp
Original Assignee
Asahi Kogaku Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kogaku Kogyo Co Ltd filed Critical Asahi Kogaku Kogyo Co Ltd
Publication of FR2128822A1 publication Critical patent/FR2128822A1/fr
Application granted granted Critical
Publication of FR2128822B1 publication Critical patent/FR2128822B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
FR7208432A 1971-03-11 1972-03-10 Expired FR2128822B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46012815A JPS5117297B1 (fr) 1971-03-11 1971-03-11

Publications (2)

Publication Number Publication Date
FR2128822A1 true FR2128822A1 (fr) 1972-10-20
FR2128822B1 FR2128822B1 (fr) 1975-10-24

Family

ID=11815867

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7208432A Expired FR2128822B1 (fr) 1971-03-11 1972-03-10

Country Status (5)

Country Link
US (1) US3751170A (fr)
JP (1) JPS5117297B1 (fr)
DE (1) DE2211476C3 (fr)
FR (1) FR2128822B1 (fr)
GB (1) GB1382148A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0032716A2 (fr) * 1980-01-18 1981-07-29 Eaton-Optimetrix Inc. Système d'illumination pour une pastille semiconductrice
FR2560397A1 (fr) * 1984-02-28 1985-08-30 Commissariat Energie Atomique Appareil de microlithographie optique a systeme d'alignement local

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50130A (fr) * 1973-05-15 1975-01-06
US3990798A (en) * 1975-03-07 1976-11-09 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer
NL7606548A (nl) * 1976-06-17 1977-12-20 Philips Nv Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat.
DE2843282A1 (de) * 1977-10-05 1979-04-12 Canon Kk Fotoelektrische erfassungsvorrichtung
US4172664A (en) * 1977-12-30 1979-10-30 International Business Machines Corporation High precision pattern registration and overlay measurement system and process
US4597664A (en) * 1980-02-29 1986-07-01 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
JPS5972728A (ja) * 1982-10-20 1984-04-24 Canon Inc 自動整合装置
JPS5979527A (ja) * 1982-10-29 1984-05-08 Hitachi Ltd パタ−ン検出装置
US5448355A (en) * 1993-03-31 1995-09-05 Asahi Kogaku Kogyo Kabushiki Kaisha System for measuring tilt of image plane of optical system using diffracted light
US5519535A (en) * 1994-04-04 1996-05-21 Motorola, Inc. Precision placement apparatus having liquid crystal shuttered dual prism probe

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1934083A1 (de) * 1968-07-05 1970-01-29 Fujitsu Ltd Verfahren und Vorrichtung zum Justieren der Muster einer fotografischen Maske auf der Oberflaeche eines Plaettchens an Hand der rueckseitigen Muster dieses Plaettchens

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3671125A (en) * 1970-11-13 1972-06-20 Anatoly Matveevich Lutchenkov Device for aligning prefabricated circuit with a photographic plate to make printed circuits

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1934083A1 (de) * 1968-07-05 1970-01-29 Fujitsu Ltd Verfahren und Vorrichtung zum Justieren der Muster einer fotografischen Maske auf der Oberflaeche eines Plaettchens an Hand der rueckseitigen Muster dieses Plaettchens

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0032716A2 (fr) * 1980-01-18 1981-07-29 Eaton-Optimetrix Inc. Système d'illumination pour une pastille semiconductrice
EP0032716A3 (fr) * 1980-01-18 1982-09-01 Eaton-Optimetrix Inc. Système d'illumination pour une pastille semiconductrice
FR2560397A1 (fr) * 1984-02-28 1985-08-30 Commissariat Energie Atomique Appareil de microlithographie optique a systeme d'alignement local
EP0156683A1 (fr) * 1984-02-28 1985-10-02 Commissariat A L'energie Atomique Appareil de microlithographie optique à système d'alignement local

Also Published As

Publication number Publication date
DE2211476C3 (de) 1975-12-18
GB1382148A (en) 1975-01-29
DE2211476A1 (de) 1972-10-26
DE2211476B2 (de) 1975-04-30
FR2128822B1 (fr) 1975-10-24
JPS5117297B1 (fr) 1976-06-01
US3751170A (en) 1973-08-07

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Legal Events

Date Code Title Description
ST Notification of lapse