FR2115166B1 - - Google Patents
Info
- Publication number
- FR2115166B1 FR2115166B1 FR7137751A FR7137751A FR2115166B1 FR 2115166 B1 FR2115166 B1 FR 2115166B1 FR 7137751 A FR7137751 A FR 7137751A FR 7137751 A FR7137751 A FR 7137751A FR 2115166 B1 FR2115166 B1 FR 2115166B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
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- H10P14/6334—
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- H10P14/6686—
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- H10P14/6923—
Landscapes
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Formation Of Insulating Films (AREA)
- Glass Compositions (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US9163970A | 1970-11-23 | 1970-11-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2115166A1 FR2115166A1 (index.php) | 1972-07-07 |
| FR2115166B1 true FR2115166B1 (index.php) | 1974-05-10 |
Family
ID=22228857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7137751A Expired FR2115166B1 (index.php) | 1970-11-23 | 1971-10-12 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3706597A (index.php) |
| DE (1) | DE2148120C3 (index.php) |
| FR (1) | FR2115166B1 (index.php) |
| GB (1) | GB1366330A (index.php) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4144684A (en) * | 1974-06-14 | 1979-03-20 | Pilkington Brothers Limited | Glazing unit |
| US4098923A (en) * | 1976-06-07 | 1978-07-04 | Motorola, Inc. | Pyrolytic deposition of silicon dioxide on semiconductors using a shrouded boat |
| JPS57201527A (en) * | 1981-06-01 | 1982-12-10 | Toshiba Corp | Ion implantation method |
| GB2131611B (en) * | 1982-11-17 | 1986-11-12 | Standard Telephones Cables Ltd | Dielectric materials |
| EP0141496A1 (en) * | 1983-08-31 | 1985-05-15 | Morton Thiokol, Inc. | Process for deposition silicon dioxide containing dopant onto a substrate |
| US4557950A (en) * | 1984-05-18 | 1985-12-10 | Thermco Systems, Inc. | Process for deposition of borophosphosilicate glass |
| KR870000750A (ko) * | 1985-06-14 | 1987-02-20 | 이마드 마하윌리 | 이산화실리콘 필름을 화학적으로 증기피복하는 방법 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3447958A (en) * | 1964-03-06 | 1969-06-03 | Hitachi Ltd | Surface treatment for semiconductor devices |
| US3481781A (en) * | 1967-03-17 | 1969-12-02 | Rca Corp | Silicate glass coating of semiconductor devices |
-
1970
- 1970-11-23 US US91639A patent/US3706597A/en not_active Expired - Lifetime
-
1971
- 1971-09-27 DE DE2148120A patent/DE2148120C3/de not_active Expired
- 1971-10-12 FR FR7137751A patent/FR2115166B1/fr not_active Expired
- 1971-10-20 GB GB4876071A patent/GB1366330A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB1366330A (en) | 1974-09-11 |
| FR2115166A1 (index.php) | 1972-07-07 |
| US3706597A (en) | 1972-12-19 |
| DE2148120C3 (de) | 1982-04-29 |
| DE2148120B2 (de) | 1981-07-23 |
| DE2148120A1 (de) | 1972-05-25 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |