FR2111924A1 - - Google Patents

Info

Publication number
FR2111924A1
FR2111924A1 FR7138817A FR7138817A FR2111924A1 FR 2111924 A1 FR2111924 A1 FR 2111924A1 FR 7138817 A FR7138817 A FR 7138817A FR 7138817 A FR7138817 A FR 7138817A FR 2111924 A1 FR2111924 A1 FR 2111924A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7138817A
Other languages
French (fr)
Other versions
FR2111924B1 (enrdf_load_stackoverflow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of FR2111924A1 publication Critical patent/FR2111924A1/fr
Application granted granted Critical
Publication of FR2111924B1 publication Critical patent/FR2111924B1/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/891Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D44/00, e.g. integration of charge-coupled devices [CCD] or charge injection devices [CID
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C19/00Digital stores in which the information is moved stepwise, e.g. shift registers
    • G11C19/28Digital stores in which the information is moved stepwise, e.g. shift registers using semiconductor elements
    • G11C19/282Digital stores in which the information is moved stepwise, e.g. shift registers using semiconductor elements with charge storage in a depletion layer, i.e. charge coupled devices [CCD]
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C27/00Electric analogue stores, e.g. for storing instantaneous values
    • G11C27/04Shift registers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D44/00Charge transfer devices
    • H10D44/40Charge-coupled devices [CCD]
    • H10D44/45Charge-coupled devices [CCD] having field effect produced by insulated gate electrodes 
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D44/00Charge transfer devices
    • H10D44/40Charge-coupled devices [CCD]
    • H10D44/45Charge-coupled devices [CCD] having field effect produced by insulated gate electrodes 
    • H10D44/472Surface-channel CCD
    • H10D44/474Two-phase CCD
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D44/00Charge transfer devices
    • H10D44/40Charge-coupled devices [CCD]
    • H10D44/45Charge-coupled devices [CCD] having field effect produced by insulated gate electrodes 
    • H10D44/472Surface-channel CCD
    • H10D44/476Three-phase CCD
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D44/00Charge transfer devices
    • H10D44/40Charge-coupled devices [CCD]
    • H10D44/45Charge-coupled devices [CCD] having field effect produced by insulated gate electrodes 
    • H10D44/472Surface-channel CCD
    • H10D44/478Four-phase CCD
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/213Channel regions of field-effect devices
    • H10D62/335Channel regions of field-effect devices of charge-coupled devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/60Electrodes characterised by their materials
    • H10D64/66Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/661Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes the conductor comprising a layer of silicon contacting the insulator, e.g. polysilicon having vertical doping variation
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/60Electrodes characterised by their materials
    • H10D64/66Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/665Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes the conductor comprising a layer of elemental metal contacting the insulator, e.g. tungsten or molybdenum
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/0198Integrating together multiple components covered by H10D44/00, e.g. integrating charge coupled devices
FR7138817A 1970-10-29 1971-10-28 Expired FR2111924B1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US8502670A 1970-10-29 1970-10-29

Publications (2)

Publication Number Publication Date
FR2111924A1 true FR2111924A1 (enrdf_load_stackoverflow) 1972-06-09
FR2111924B1 FR2111924B1 (enrdf_load_stackoverflow) 1976-03-26

Family

ID=22188999

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7138817A Expired FR2111924B1 (enrdf_load_stackoverflow) 1970-10-29 1971-10-28

Country Status (14)

Country Link
JP (1) JPS5310817B1 (enrdf_load_stackoverflow)
KR (1) KR780000481B1 (enrdf_load_stackoverflow)
BE (1) BE774391A (enrdf_load_stackoverflow)
CA (1) CA1075811A (enrdf_load_stackoverflow)
CH (1) CH569342A5 (enrdf_load_stackoverflow)
DE (1) DE2153675C3 (enrdf_load_stackoverflow)
ES (1) ES396891A1 (enrdf_load_stackoverflow)
FR (1) FR2111924B1 (enrdf_load_stackoverflow)
GB (1) GB1344646A (enrdf_load_stackoverflow)
IE (1) IE35680B1 (enrdf_load_stackoverflow)
IT (1) IT939683B (enrdf_load_stackoverflow)
NL (1) NL163061C (enrdf_load_stackoverflow)
SE (1) SE379111B (enrdf_load_stackoverflow)
ZA (1) ZA717200B (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2280975A1 (fr) * 1973-08-01 1976-02-27 Trw Inc Dispositif a couplage par charges a puits de potentiel asymetrique
EP0342699A3 (de) * 1988-05-19 1990-08-29 Deutsche Aerospace AG Ladungsgekoppeltes Halbleiterbauelement

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4646119A (en) * 1971-01-14 1987-02-24 Rca Corporation Charge coupled circuits
GB1444047A (en) * 1973-02-28 1976-07-28 Hitachi Ltd Charge transfer semiconductor devices and methods of fabricating such devices
JPS58184760A (ja) * 1982-04-22 1983-10-28 Sony Corp 電荷転送素子
NL8300366A (nl) * 1983-02-01 1984-09-03 Philips Nv Beeldopneeminrichting.

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2280975A1 (fr) * 1973-08-01 1976-02-27 Trw Inc Dispositif a couplage par charges a puits de potentiel asymetrique
EP0342699A3 (de) * 1988-05-19 1990-08-29 Deutsche Aerospace AG Ladungsgekoppeltes Halbleiterbauelement

Also Published As

Publication number Publication date
JPS5310817B1 (enrdf_load_stackoverflow) 1978-04-17
ES396891A1 (es) 1974-06-16
AU3398971A (en) 1973-04-05
NL7114859A (enrdf_load_stackoverflow) 1972-05-03
ZA717200B (en) 1972-08-30
GB1344646A (en) 1974-01-23
NL163061C (nl) 1980-07-15
DE2153675B2 (de) 1976-08-12
BE774391A (fr) 1972-02-14
KR780000481B1 (en) 1978-10-24
IE35680B1 (en) 1976-04-28
IE35680L (en) 1972-04-29
CH569342A5 (enrdf_load_stackoverflow) 1975-11-14
FR2111924B1 (enrdf_load_stackoverflow) 1976-03-26
DE2153675C3 (de) 1980-09-18
NL163061B (nl) 1980-02-15
IT939683B (it) 1973-02-10
CA1075811A (en) 1980-04-15
DE2153675A1 (de) 1972-05-18
SE379111B (enrdf_load_stackoverflow) 1975-09-22

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