FR2108602A5 - - Google Patents
Info
- Publication number
- FR2108602A5 FR2108602A5 FR7134682A FR7134682A FR2108602A5 FR 2108602 A5 FR2108602 A5 FR 2108602A5 FR 7134682 A FR7134682 A FR 7134682A FR 7134682 A FR7134682 A FR 7134682A FR 2108602 A5 FR2108602 A5 FR 2108602A5
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
- H01L21/3043—Making grooves, e.g. cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
- H01L21/30608—Anisotropic liquid etching
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Weting (AREA)
- Silicon Compounds (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US7677770A | 1970-09-30 | 1970-09-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR2108602A5 true FR2108602A5 (es) | 1972-05-19 |
Family
ID=22134121
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7134682A Expired FR2108602A5 (es) | 1970-09-30 | 1971-09-27 |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS5010095B1 (es) |
| BE (1) | BE773286A (es) |
| CA (1) | CA926035A (es) |
| DE (1) | DE2147703A1 (es) |
| ES (2) | ES395341A1 (es) |
| FR (1) | FR2108602A5 (es) |
| GB (1) | GB1297235A (es) |
| NL (1) | NL7113366A (es) |
| SE (1) | SE382772B (es) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5284893A (en) * | 1975-12-30 | 1977-07-14 | Matsushita Electric Works Ltd | Shoulder patting device circuit configuration |
| JPS5284894A (en) * | 1975-12-30 | 1977-07-14 | Matsushita Electric Works Ltd | Shoulder patting device circuit configuration |
| JP4515790B2 (ja) * | 2004-03-08 | 2010-08-04 | 株式会社東芝 | 半導体装置の製造方法及びその製造装置 |
-
1971
- 1971-07-14 CA CA118269A patent/CA926035A/en not_active Expired
- 1971-09-23 ES ES395341A patent/ES395341A1/es not_active Expired
- 1971-09-23 GB GB1297235D patent/GB1297235A/en not_active Expired
- 1971-09-24 DE DE19712147703 patent/DE2147703A1/de active Pending
- 1971-09-27 FR FR7134682A patent/FR2108602A5/fr not_active Expired
- 1971-09-29 JP JP7623071A patent/JPS5010095B1/ja active Pending
- 1971-09-29 BE BE773286A patent/BE773286A/xx unknown
- 1971-09-29 NL NL7113366A patent/NL7113366A/xx unknown
- 1971-09-29 SE SE1232871A patent/SE382772B/xx unknown
-
1973
- 1973-10-15 ES ES419651A patent/ES419651A1/es not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| NL7113366A (es) | 1972-04-05 |
| ES419651A1 (es) | 1976-05-16 |
| JPS5010095B1 (es) | 1975-04-18 |
| SE382772B (sv) | 1976-02-16 |
| GB1297235A (es) | 1972-11-22 |
| CA926035A (en) | 1973-05-08 |
| BE773286A (fr) | 1972-01-17 |
| AU3334071A (en) | 1973-03-15 |
| DE2147703A1 (de) | 1972-04-06 |
| ES395341A1 (es) | 1974-12-16 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |