FR2107928B1 - - Google Patents
Info
- Publication number
- FR2107928B1 FR2107928B1 FR7134057A FR7134057A FR2107928B1 FR 2107928 B1 FR2107928 B1 FR 2107928B1 FR 7134057 A FR7134057 A FR 7134057A FR 7134057 A FR7134057 A FR 7134057A FR 2107928 B1 FR2107928 B1 FR 2107928B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US7521770A | 1970-09-24 | 1970-09-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2107928A1 FR2107928A1 (online.php) | 1972-05-12 |
| FR2107928B1 true FR2107928B1 (online.php) | 1977-04-22 |
Family
ID=22124313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7134057A Expired FR2107928B1 (online.php) | 1970-09-24 | 1971-09-22 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3669060A (online.php) |
| JP (1) | JPS5014996B1 (online.php) |
| DE (1) | DE2146985A1 (online.php) |
| FR (1) | FR2107928B1 (online.php) |
| GB (1) | GB1358416A (online.php) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4096821A (en) * | 1976-12-13 | 1978-06-27 | Westinghouse Electric Corp. | System for fabricating thin-film electronic components |
| US4777909A (en) * | 1981-02-09 | 1988-10-18 | Applied Magnetics Corporation | Carriage apparatus for indexing and accurately registering a selected stabilized mask of a plurality of stabilizing masks between a substrate and a source |
| US4492180A (en) * | 1981-03-16 | 1985-01-08 | Applied Magnetics Corporation | Apparatus for indexing and registering a selected deposition mask to a substrate and method therefor |
| US4633810A (en) * | 1981-09-21 | 1987-01-06 | Applied Magnetics Corp. | Apparatus for accurately registering a first member and a second member in an interdependent relationship |
| US5736751A (en) * | 1982-04-13 | 1998-04-07 | Seiko Epson Corporation | Field effect transistor having thick source and drain regions |
| FR2527385B1 (fr) * | 1982-04-13 | 1987-05-22 | Suwa Seikosha Kk | Transistor a couche mince et panneau d'affichage a cristaux liquides utilisant ce type de transistor |
| US5698864A (en) * | 1982-04-13 | 1997-12-16 | Seiko Epson Corporation | Method of manufacturing a liquid crystal device having field effect transistors |
| US6294796B1 (en) | 1982-04-13 | 2001-09-25 | Seiko Epson Corporation | Thin film transistors and active matrices including same |
| GB2140460B (en) * | 1983-05-27 | 1986-06-25 | Dowty Electronics Ltd | Insulated metal substrates |
| JPH068503B2 (ja) * | 1987-03-31 | 1994-02-02 | セントラル硝子株式会社 | 含フツ素樹脂被膜の形成方法 |
| GB8726639D0 (en) * | 1987-11-13 | 1987-12-16 | Vg Instr Groups Ltd | Vacuum evaporation & deposition |
| GB2272225B (en) * | 1992-10-06 | 1996-07-17 | Balzers Hochvakuum | A method for masking a workpiece and a vacuum treatment facility |
| DE4235678C1 (de) * | 1992-10-22 | 1994-05-26 | Balzers Hochvakuum | Verfahren zur Oberflächenbehandlung eines Werkstückes, und Vakuumbehandlungsanlage zur Durchführung des Verfahrens |
| US7019208B2 (en) * | 2001-11-20 | 2006-03-28 | Energy Photovoltaics | Method of junction formation for CIGS photovoltaic devices |
| US6821348B2 (en) * | 2002-02-14 | 2004-11-23 | 3M Innovative Properties Company | In-line deposition processes for circuit fabrication |
| US6897164B2 (en) * | 2002-02-14 | 2005-05-24 | 3M Innovative Properties Company | Aperture masks for circuit fabrication |
| US20030151118A1 (en) * | 2002-02-14 | 2003-08-14 | 3M Innovative Properties Company | Aperture masks for circuit fabrication |
| US7410919B2 (en) * | 2003-06-27 | 2008-08-12 | International Business Machines Corporation | Mask and substrate alignment for solder bump process |
| NL1024215C2 (nl) * | 2003-09-03 | 2005-03-07 | Otb Group Bv | Systeem en werkwijze voor het behandelen van substraten, alsmede een gebruik van een dergelijke systeem en een transportinrichting. |
| US20070137568A1 (en) * | 2005-12-16 | 2007-06-21 | Schreiber Brian E | Reciprocating aperture mask system and method |
| US7763114B2 (en) * | 2005-12-28 | 2010-07-27 | 3M Innovative Properties Company | Rotatable aperture mask assembly and deposition system |
| US8628620B2 (en) * | 2011-01-07 | 2014-01-14 | Sharp Kabushiki Kaisha | Vapor deposition device and vapor deposition method |
| GB2488568B (en) * | 2011-03-02 | 2014-01-01 | Rolls Royce Plc | A method and apparatus for masking a portion of a component |
| CN104213074B (zh) * | 2014-08-21 | 2016-06-29 | 宁波英飞迈材料科技有限公司 | 一种原位掩模转换装置及其使用方法 |
-
1970
- 1970-09-24 US US75217A patent/US3669060A/en not_active Expired - Lifetime
-
1971
- 1971-09-06 GB GB4142571A patent/GB1358416A/en not_active Expired
- 1971-09-07 JP JP46069184A patent/JPS5014996B1/ja active Pending
- 1971-09-21 DE DE19712146985 patent/DE2146985A1/de active Pending
- 1971-09-22 FR FR7134057A patent/FR2107928B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2146985A1 (de) | 1972-03-30 |
| JPS5014996B1 (online.php) | 1975-05-31 |
| GB1358416A (en) | 1974-07-03 |
| FR2107928A1 (online.php) | 1972-05-12 |
| US3669060A (en) | 1972-06-13 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |