FR2104809B3 - - Google Patents

Info

Publication number
FR2104809B3
FR2104809B3 FR7125845A FR7125845A FR2104809B3 FR 2104809 B3 FR2104809 B3 FR 2104809B3 FR 7125845 A FR7125845 A FR 7125845A FR 7125845 A FR7125845 A FR 7125845A FR 2104809 B3 FR2104809 B3 FR 2104809B3
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7125845A
Other languages
French (fr)
Other versions
FR2104809A3 (OSRAM
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
M&T Chemicals Inc
Original Assignee
M&T Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M&T Chemicals Inc filed Critical M&T Chemicals Inc
Publication of FR2104809A3 publication Critical patent/FR2104809A3/fr
Application granted granted Critical
Publication of FR2104809B3 publication Critical patent/FR2104809B3/fr
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
FR7125845A 1970-07-28 1971-07-15 Expired FR2104809B3 (OSRAM)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US5903470A 1970-07-28 1970-07-28

Publications (2)

Publication Number Publication Date
FR2104809A3 FR2104809A3 (OSRAM) 1972-04-21
FR2104809B3 true FR2104809B3 (OSRAM) 1974-04-05

Family

ID=22020395

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7125845A Expired FR2104809B3 (OSRAM) 1970-07-28 1971-07-15

Country Status (7)

Country Link
US (1) US3682788A (OSRAM)
AU (1) AU3040571A (OSRAM)
BE (1) BE770346A (OSRAM)
CA (1) CA1026702A (OSRAM)
DE (1) DE2134757A1 (OSRAM)
FR (1) FR2104809B3 (OSRAM)
NL (1) NL7110413A (OSRAM)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3804729A (en) * 1972-06-19 1974-04-16 M & T Chemicals Inc Electrolyte and process for electro-depositing copper
US3966565A (en) * 1972-12-14 1976-06-29 M & T Chemicals Inc. Electrodeposition of copper
US3956079A (en) * 1972-12-14 1976-05-11 M & T Chemicals Inc. Electrodeposition of copper
US3956078A (en) * 1972-12-14 1976-05-11 M & T Chemicals Inc. Electrodeposition of copper
ZA739310B (en) * 1972-12-14 1974-11-27 M & T Chemicals Inc Electrode position of copper
US3956084A (en) * 1972-12-14 1976-05-11 M & T Chemicals Inc. Electrodeposition of copper
US3940320A (en) * 1972-12-14 1976-02-24 M & T Chemicals Inc. Electrodeposition of copper
US3956120A (en) * 1972-12-14 1976-05-11 M & T Chemicals Inc. Electrodeposition of copper
JPS544329B2 (OSRAM) * 1973-03-20 1979-03-06
NL7415845A (nl) * 1973-12-26 1975-06-30 Upjohn Co Werkwijze voor het bevorderen van de productie van endogene prostaglandinen door zoogdieren, alsmede werkwijze ter bereiding van daarbij te gebruiken preparaten.
US4014760A (en) * 1974-11-21 1977-03-29 M & T Chemicals Inc. Electrodeposition of copper
US4036710A (en) * 1974-11-21 1977-07-19 M & T Chemicals Inc. Electrodeposition of copper
BR7606259A (pt) * 1975-09-22 1977-06-21 M & T Chemicals Inc Aperfeicoamentos em processo e composicao para a preparacao de um eletrodeposito
US4036711A (en) * 1975-12-18 1977-07-19 M & T Chemicals Inc. Electrodeposition of copper
US4374709A (en) * 1980-05-01 1983-02-22 Occidental Chemical Corporation Process for plating polymeric substrates
US4376685A (en) * 1981-06-24 1983-03-15 M&T Chemicals Inc. Acid copper electroplating baths containing brightening and leveling additives
US4490220A (en) * 1982-09-30 1984-12-25 Learonal, Inc. Electrolytic copper plating solutions
DE3462259D1 (de) * 1983-07-22 1987-03-05 Bayer Ag Substituted furazans
US4781801A (en) * 1987-02-03 1988-11-01 Mcgean-Rohco, Inc. Method of copper plating gravure rolls
US4786746A (en) * 1987-09-18 1988-11-22 Pennsylvania Research Corporation Copper electroplating solutions and methods of making and using them
US4948474A (en) * 1987-09-18 1990-08-14 Pennsylvania Research Corporation Copper electroplating solutions and methods
US5403465A (en) * 1990-05-30 1995-04-04 Gould Inc. Electrodeposited copper foil and process for making same using electrolyte solutions having controlled additions of chloride ions and organic additives
AU7952791A (en) * 1990-05-30 1991-12-31 Gould Inc. Electrodeposited copper foil and process for making same using electrolyte solutions having low chloride ion concentrations
DE69110208T2 (de) * 1990-08-03 1995-10-19 Rohco Inc Mcgean Kupferplattieren von Tiefdruckzylindern.
US6544399B1 (en) * 1999-01-11 2003-04-08 Applied Materials, Inc. Electrodeposition chemistry for filling apertures with reflective metal
ATE267278T1 (de) * 2000-10-19 2004-06-15 Atotech Deutschland Gmbh Kupferbad und verfahren zur abscheidung eines matten kupferüberzuges
DE10058896C1 (de) * 2000-10-19 2002-06-13 Atotech Deutschland Gmbh Elektrolytisches Kupferbad, dessen Verwendung und Verfahren zur Abscheidung einer matten Kupferschicht
EP1412560A1 (en) * 2001-07-27 2004-04-28 PIRELLI PNEUMATICI Società per Azioni Electrolytic process for depositing a layer of copper on a steel wire
US6652731B2 (en) * 2001-10-02 2003-11-25 Shipley Company, L.L.C. Plating bath and method for depositing a metal layer on a substrate
US20040074775A1 (en) * 2002-10-21 2004-04-22 Herdman Roderick Dennis Pulse reverse electrolysis of acidic copper electroplating solutions
US6851200B2 (en) * 2003-03-14 2005-02-08 Hopkins Manufacturing Corporation Reflecting lighted level

Also Published As

Publication number Publication date
US3682788A (en) 1972-08-08
BE770346A (fr) 1971-12-01
NL7110413A (OSRAM) 1972-02-01
AU3040571A (en) 1973-01-04
DE2134757A1 (de) 1972-03-30
CA1026702A (en) 1978-02-21
FR2104809A3 (OSRAM) 1972-04-21

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Legal Events

Date Code Title Description
ST Notification of lapse