FR2093930A1 - - Google Patents

Info

Publication number
FR2093930A1
FR2093930A1 FR7115061A FR7115061A FR2093930A1 FR 2093930 A1 FR2093930 A1 FR 2093930A1 FR 7115061 A FR7115061 A FR 7115061A FR 7115061 A FR7115061 A FR 7115061A FR 2093930 A1 FR2093930 A1 FR 2093930A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7115061A
Other languages
French (fr)
Other versions
FR2093930B1 (enExample
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2093930A1 publication Critical patent/FR2093930A1/fr
Application granted granted Critical
Publication of FR2093930B1 publication Critical patent/FR2093930B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
FR717115061A 1970-06-01 1971-04-20 Expired FR2093930B1 (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US4234470A 1970-06-01 1970-06-01

Publications (2)

Publication Number Publication Date
FR2093930A1 true FR2093930A1 (enExample) 1972-02-04
FR2093930B1 FR2093930B1 (enExample) 1974-06-21

Family

ID=21921370

Family Applications (1)

Application Number Title Priority Date Filing Date
FR717115061A Expired FR2093930B1 (enExample) 1970-06-01 1971-04-20

Country Status (2)

Country Link
US (1) US3701659A (enExample)
FR (1) FR2093930B1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6076652A (en) 1971-04-16 2000-06-20 Texas Instruments Incorporated Assembly line system and apparatus controlling transfer of a workpiece
JPS5532250A (en) * 1978-08-25 1980-03-06 Matsushita Electric Ind Co Ltd Duplicating method for fine pattern
JPS5857706A (ja) * 1981-10-02 1983-04-06 Shin Etsu Chem Co Ltd 磁気バブルメモリ−バイアス磁界用永久磁石

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1031978A (en) * 1964-11-06 1966-06-02 Standard Telephones Cables Ltd Improvements in or relating to photolithographic masks

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1031978A (en) * 1964-11-06 1966-06-02 Standard Telephones Cables Ltd Improvements in or relating to photolithographic masks

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
(REVUE AMERICAINE"ELECTRO-CHEMICAL TECHNOLOGY",VOLOME 6,NO 3-4 MARS-AVRIL 1968"SILICON PLANAR CHEMICAL POLISHING"J.REGH AND G.A.SILVEY PAGES 155-158.PAGE 155,COLONNE DE GAUCHE,AVANT DERNIER ALINEA.LE DECAPAGE D'UNE COUCHE SILICIUM,PAR DES POLISSAGES CONSECUTIFS,A L'AIDE D'UNE SOLUTION DE DEPLACEMENT DE CUIVRE DANS LAQUELLE LE CUIVRE DEPLACE LE SILICIUM.) *
CHEMICAL POLISHING"J.REGH AND G.A.SILVEY PAGES 155-158.PAGE 155,COLONNE DE GAUCHE,AVANT *
DERNIER ALINEA.LE DECAPAGE D'UNE COUCHE SILICIUM,PAR DES POLISSAGES CONSECUTIFS,A L'AIDE *
D'UNE SOLUTION DE DEPLACEMENT DE CUIVRE DANS LAQUELLE LE CUIVRE DEPLACE LE SILICIUM.) *
REVUE AMERICAINE"ELECTRO-CHEMICAL TECHNOLOGY",VOLOME 6,NO 3-4 MARS-AVRIL 1968"SILICON PLANAR *

Also Published As

Publication number Publication date
US3701659A (en) 1972-10-31
FR2093930B1 (enExample) 1974-06-21

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Legal Events

Date Code Title Description
ST Notification of lapse