FR2090672A5 - - Google Patents

Info

Publication number
FR2090672A5
FR2090672A5 FR7114653A FR7114653A FR2090672A5 FR 2090672 A5 FR2090672 A5 FR 2090672A5 FR 7114653 A FR7114653 A FR 7114653A FR 7114653 A FR7114653 A FR 7114653A FR 2090672 A5 FR2090672 A5 FR 2090672A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7114653A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert AG
Original Assignee
Agfa Gevaert AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert AG filed Critical Agfa Gevaert AG
Application granted granted Critical
Publication of FR2090672A5 publication Critical patent/FR2090672A5/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
FR7114653A 1970-04-23 1971-04-23 Expired FR2090672A5 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702019598 DE2019598A1 (de) 1970-04-23 1970-04-23 Lichtvernetzbare Schichten

Publications (1)

Publication Number Publication Date
FR2090672A5 true FR2090672A5 (fr) 1972-01-14

Family

ID=5768935

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7114653A Expired FR2090672A5 (fr) 1970-04-23 1971-04-23

Country Status (6)

Country Link
US (1) US3718474A (fr)
BE (1) BE766036A (fr)
CA (1) CA962506A (fr)
DE (1) DE2019598A1 (fr)
FR (1) FR2090672A5 (fr)
GB (1) GB1334154A (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4041190A (en) * 1971-06-29 1977-08-09 Thomson-Csf Method for producing a silica mask on a semiconductor substrate
JPS56137347A (en) * 1980-03-29 1981-10-27 Tokyo Ohka Kogyo Co Ltd Photosensitive composition for dry development
US4571375A (en) * 1983-10-24 1986-02-18 Benedikt George M Ring-opened polynorbornene negative photoresist with bisazide
GB8827264D0 (en) * 1988-11-22 1988-12-29 Shell Int Research Copolymerization of dicyclopentadiene with norbornene derivatives & copolymers obtainable therewith
GB8904575D0 (en) * 1989-02-28 1989-04-12 Shell Int Research Polymerization of bulky norbornene derivatives and polymers obtainable therewith
JP2768981B2 (ja) * 1989-06-22 1998-06-25 シャープ株式会社 光メモリ素子
JP5457955B2 (ja) * 2010-06-28 2014-04-02 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レーザー彫刻用レリーフ印刷版原版の製造方法、及び、レリーフ印刷版の製版方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2463596A (en) * 1945-11-30 1949-03-08 Rohm & Haas Process of preparing polycyclopentadiene in the presence of a haloalkene
GB767985A (en) * 1954-07-02 1957-02-13 Kodak Ltd Improvements in photomechanical processes and materials therefor
DE1447593A1 (de) * 1964-12-24 1969-04-30 Agfa Gevaert Ag Lichtvernetzbare Schichten

Also Published As

Publication number Publication date
BE766036A (nl) 1971-10-21
US3718474A (en) 1973-02-27
CA962506A (en) 1975-02-11
DE2019598A1 (de) 1971-11-11
GB1334154A (en) 1973-10-17

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Legal Events

Date Code Title Description
ST Notification of lapse