FR2074740A1 - High resolution masks - prepared by electrolytic deposition - Google Patents

High resolution masks - prepared by electrolytic deposition

Info

Publication number
FR2074740A1
FR2074740A1 FR7002390A FR7002390A FR2074740A1 FR 2074740 A1 FR2074740 A1 FR 2074740A1 FR 7002390 A FR7002390 A FR 7002390A FR 7002390 A FR7002390 A FR 7002390A FR 2074740 A1 FR2074740 A1 FR 2074740A1
Authority
FR
France
Prior art keywords
high resolution
electrolytic deposition
prepared
resolution masks
masks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7002390A
Other languages
English (en)
Other versions
FR2074740B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Radiotechnique Compelec RTC SA
Original Assignee
Radiotechnique Compelec RTC SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Radiotechnique Compelec RTC SA filed Critical Radiotechnique Compelec RTC SA
Priority to FR7002390A priority Critical patent/FR2074740A1/fr
Publication of FR2074740A1 publication Critical patent/FR2074740A1/fr
Application granted granted Critical
Publication of FR2074740B1 publication Critical patent/FR2074740B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/10—Moulds; Masks; Masterforms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
FR7002390A 1970-01-23 1970-01-23 High resolution masks - prepared by electrolytic deposition Granted FR2074740A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7002390A FR2074740A1 (en) 1970-01-23 1970-01-23 High resolution masks - prepared by electrolytic deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7002390A FR2074740A1 (en) 1970-01-23 1970-01-23 High resolution masks - prepared by electrolytic deposition

Publications (2)

Publication Number Publication Date
FR2074740A1 true FR2074740A1 (en) 1971-10-08
FR2074740B1 FR2074740B1 (fr) 1973-08-10

Family

ID=9049499

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7002390A Granted FR2074740A1 (en) 1970-01-23 1970-01-23 High resolution masks - prepared by electrolytic deposition

Country Status (1)

Country Link
FR (1) FR2074740A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0007447A1 (fr) * 1978-07-24 1980-02-06 Siemens Aktiengesellschaft Procédé de fabrication de surfaces microperforées et application du procédé
NL1013910C2 (nl) * 1999-12-21 2000-11-07 Stork Veco Bv Elektroformeringsmatrijs en toepassing daarvan.

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR897416A (fr) * 1942-04-15 1945-03-21 Perfectionnements apportés aux procédés d'électrolyse, notamment pour l'obtention de pellicules métalliques perforées du genre des tamis
GB735891A (en) * 1951-11-24 1955-08-31 Wmf Wuerttemberg Metallwaren Method of and apparatus for the production of locally thickened galvanic deposits, especially for silver-plated cutlery or the like
US3342706A (en) * 1964-01-23 1967-09-19 Liben William Method of constructing evaporation masks

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR897416A (fr) * 1942-04-15 1945-03-21 Perfectionnements apportés aux procédés d'électrolyse, notamment pour l'obtention de pellicules métalliques perforées du genre des tamis
GB735891A (en) * 1951-11-24 1955-08-31 Wmf Wuerttemberg Metallwaren Method of and apparatus for the production of locally thickened galvanic deposits, especially for silver-plated cutlery or the like
US3342706A (en) * 1964-01-23 1967-09-19 Liben William Method of constructing evaporation masks

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0007447A1 (fr) * 1978-07-24 1980-02-06 Siemens Aktiengesellschaft Procédé de fabrication de surfaces microperforées et application du procédé
NL1013910C2 (nl) * 1999-12-21 2000-11-07 Stork Veco Bv Elektroformeringsmatrijs en toepassing daarvan.

Also Published As

Publication number Publication date
FR2074740B1 (fr) 1973-08-10

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Legal Events

Date Code Title Description
ST Notification of lapse