FR2073447A1 - - Google Patents

Info

Publication number
FR2073447A1
FR2073447A1 FR7043379A FR7043379A FR2073447A1 FR 2073447 A1 FR2073447 A1 FR 2073447A1 FR 7043379 A FR7043379 A FR 7043379A FR 7043379 A FR7043379 A FR 7043379A FR 2073447 A1 FR2073447 A1 FR 2073447A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7043379A
Other languages
French (fr)
Other versions
FR2073447B1 (Direct
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Licentia Patent Verwaltungs GmbH
Original Assignee
Licentia Patent Verwaltungs GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Licentia Patent Verwaltungs GmbH filed Critical Licentia Patent Verwaltungs GmbH
Publication of FR2073447A1 publication Critical patent/FR2073447A1/fr
Application granted granted Critical
Publication of FR2073447B1 publication Critical patent/FR2073447B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B15/00—Special procedures for taking photographs; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
FR7043379A 1969-12-02 1970-12-02 Expired FR2073447B1 (Direct)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19691960463 DE1960463A1 (de) 1969-12-02 1969-12-02 Verfahren zum fehlerfreien fotografischen UEbertragen

Publications (2)

Publication Number Publication Date
FR2073447A1 true FR2073447A1 (Direct) 1971-10-01
FR2073447B1 FR2073447B1 (Direct) 1973-02-02

Family

ID=5752748

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7043379A Expired FR2073447B1 (Direct) 1969-12-02 1970-12-02

Country Status (4)

Country Link
JP (1) JPS5517505B1 (Direct)
DE (1) DE1960463A1 (Direct)
FR (1) FR2073447B1 (Direct)
GB (1) GB1334377A (Direct)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2375665A1 (fr) * 1976-12-27 1978-07-21 Ibm Procede de lithographie par faisceau electronique

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4394437A (en) 1981-09-24 1983-07-19 International Business Machines Corporation Process for increasing resolution of photolithographic images
US7190434B2 (en) 2004-02-18 2007-03-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2375665A1 (fr) * 1976-12-27 1978-07-21 Ibm Procede de lithographie par faisceau electronique

Also Published As

Publication number Publication date
FR2073447B1 (Direct) 1973-02-02
GB1334377A (en) 1973-10-17
JPS5517505B1 (Direct) 1980-05-12
DE1960463A1 (de) 1971-06-09

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Legal Events

Date Code Title Description
ST Notification of lapse