FR2060532A5 - - Google Patents

Info

Publication number
FR2060532A5
FR2060532A5 FR7023979A FR7023979A FR2060532A5 FR 2060532 A5 FR2060532 A5 FR 2060532A5 FR 7023979 A FR7023979 A FR 7023979A FR 7023979 A FR7023979 A FR 7023979A FR 2060532 A5 FR2060532 A5 FR 2060532A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7023979A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of FR2060532A5 publication Critical patent/FR2060532A5/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32—Polymers modified by chemical after-treatment
    • C08G65/329—Polymers modified by chemical after-treatment with organic compounds
    • C08G65/334—Polymers modified by chemical after-treatment with organic compounds containing sulfur
    • C08G65/3348—Polymers modified by chemical after-treatment with organic compounds containing sulfur containing nitrogen in addition to sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
FR7023979A 1969-09-12 1970-06-29 Expired FR2060532A5 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US85758769A 1969-09-12 1969-09-12

Publications (1)

Publication Number Publication Date
FR2060532A5 true FR2060532A5 (fr) 1971-06-18

Family

ID=25326317

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7023979A Expired FR2060532A5 (fr) 1969-09-12 1970-06-29

Country Status (7)

Country Link
US (1) US3647443A (fr)
AU (1) AU1976070A (fr)
BE (1) BE752770A (fr)
DE (1) DE2044869A1 (fr)
FR (1) FR2060532A5 (fr)
GB (1) GB1320340A (fr)
SU (1) SU383334A3 (fr)

Families Citing this family (59)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3837860A (en) * 1969-06-16 1974-09-24 L Roos PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS
NL165852C (nl) * 1970-09-29 1981-05-15 Hoechst Ag Werkwijze voor het vervaardigen van een reprografisch kopieermateriaal door een lichtgevoelige laag aan te brengen op een drager.
GB1375461A (fr) * 1972-05-05 1974-11-27
JPS5024641B2 (fr) * 1972-10-17 1975-08-18
US3859099A (en) * 1972-12-22 1975-01-07 Eastman Kodak Co Positive plate incorporating diazoquinone
DE2331377C2 (de) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Kopiermaterial
JPS5635854B2 (fr) * 1973-08-03 1981-08-20
US4139384A (en) * 1974-02-21 1979-02-13 Fuji Photo Film Co., Ltd. Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate
JPS5645127B2 (fr) * 1974-02-25 1981-10-24
US4123279A (en) * 1974-03-25 1978-10-31 Fuji Photo Film Co., Ltd. Light-sensitive o-quinonediazide containing planographic printing plate
US3961101A (en) * 1974-09-16 1976-06-01 Rca Corporation Process for improved development of electron-beam-sensitive resist films
DE2847878A1 (de) * 1978-11-04 1980-05-22 Hoechst Ag Lichtempfindliches gemisch
US4308368A (en) * 1979-03-16 1981-12-29 Daicel Chemical Industries Ltd. Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
JPS561044A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS561045A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
EP0054258B1 (fr) * 1980-12-17 1986-03-05 Konica Corporation Compositions photosensibles
DE3100077A1 (de) 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
DE3100856A1 (de) * 1981-01-14 1982-08-12 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-napthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
US4377631A (en) * 1981-06-22 1983-03-22 Philip A. Hunt Chemical Corporation Positive novolak photoresist compositions
US4587196A (en) * 1981-06-22 1986-05-06 Philip A. Hunt Chemical Corporation Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
DE3124936A1 (de) * 1981-06-25 1983-01-20 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
DE3127754A1 (de) * 1981-07-14 1983-02-03 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
JPS58134631A (ja) * 1982-01-08 1983-08-10 Konishiroku Photo Ind Co Ltd 感光性組成物
JPS5986046A (ja) * 1982-11-10 1984-05-18 Fuji Photo Film Co Ltd 感光性組成物
EP0136110A3 (fr) * 1983-08-30 1986-05-28 Mitsubishi Kasei Corporation Composition photosensible positive et emploi pour photoréserves
US4626491A (en) * 1983-10-07 1986-12-02 J. T. Baker Chemical Company Deep ultra-violet lithographic resist composition and process of using
EP0147596A3 (fr) * 1983-12-30 1987-03-04 International Business Machines Corporation Composition photosensible positive pour réserve lithographique
JPS61185741A (ja) * 1985-02-13 1986-08-19 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
US5264319A (en) * 1985-05-10 1993-11-23 Hitachi, Ltd. Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor
US4684597A (en) * 1985-10-25 1987-08-04 Eastman Kodak Company Non-precipitating quinone diazide polymer containing photoresist composition with o-quinone diazide trisester as dissolution inhibitor
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
US4732837A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US5162510A (en) * 1986-05-02 1992-11-10 Hoechst Celanese Corporation Process for the preparation of photosensitive compositions containing a mixed ester o-quinone photosensitizer
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US4902785A (en) * 1986-05-02 1990-02-20 Hoechst Celanese Corporation Phenolic photosensitizers containing quinone diazide and acidic halide substituents
DE3629122A1 (de) * 1986-08-27 1988-03-10 Hoechst Ag Verfahren zur herstellung eines o-naphthochinondiazidsulfonsaeureesters und diesen enthaltendes lichtempfindliches gemisch
US4871644A (en) * 1986-10-01 1989-10-03 Ciba-Geigy Corporation Photoresist compositions with a bis-benzotriazole
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
DE3930087A1 (de) * 1989-09-09 1991-03-14 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
US5196517A (en) * 1989-10-30 1993-03-23 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use as photoactive compounds
US5019478A (en) * 1989-10-30 1991-05-28 Olin Hunt Specialty Products, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
US5219714A (en) * 1989-10-30 1993-06-15 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
JP2639853B2 (ja) * 1990-05-18 1997-08-13 富士写真フイルム株式会社 新規キノンジアジド化合物及びそれを含有する感光性組成物
US5242780A (en) * 1991-10-18 1993-09-07 Industrial Technology Research Institute Electrophoretic positive working photosensitive composition comprising as the photosensitive ingredient an aliphatic polyester having o-quinone diazide on the side chain and end groups
JP3156945B2 (ja) * 1993-03-24 2001-04-16 富士写真フイルム株式会社 リード・フレーム形成用材の作製方法
JPH0876380A (ja) 1994-09-06 1996-03-22 Fuji Photo Film Co Ltd ポジ型印刷版組成物
DE29724584U1 (de) 1996-04-23 2002-04-18 Kodak Polychrome Graphics Co. Ltd., Norwalk, Conn. Wärmeempfindliche Zusammensetzung und damit hergestellter Vorläufer einer Lithographie-Druckform
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
GB9622657D0 (en) 1996-10-31 1997-01-08 Horsell Graphic Ind Ltd Direct positive lithographic plate
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
JP2002511955A (ja) 1997-07-05 2002-04-16 コダック・ポリクローム・グラフィックス・エルエルシー パターン形成方法
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6045963A (en) * 1998-03-17 2000-04-04 Kodak Polychrome Graphics Llc Negative-working dry planographic printing plate
US6296982B1 (en) 1999-11-19 2001-10-02 Kodak Polychrome Graphics Llc Imaging articles
DE10345362A1 (de) * 2003-09-25 2005-04-28 Kodak Polychrome Graphics Gmbh Verfahren zur Verhinderung von Beschichtungsdefekten
CN101517487B (zh) * 2006-09-25 2012-08-08 日立化成工业株式会社 放射线敏感性组合物、二氧化硅系覆膜的形成方法、二氧化硅系覆膜、具有二氧化硅系覆膜的装置和部件以及绝缘膜用感光剂

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE506677A (fr) * 1950-10-31
NL247406A (fr) * 1959-01-17
BE586713A (fr) * 1959-01-21
NL255517A (fr) * 1959-09-04
BE620660A (fr) * 1961-07-28
GB1116737A (en) * 1966-02-28 1968-06-12 Agfa Gevaert Nv Bis-(o-quinone diazide) modified bisphenols
GB1136544A (en) * 1966-02-28 1968-12-11 Agfa Gevaert Nv Photochemical cross-linking of polymers
AU410535B2 (en) * 1967-02-22 1971-02-10 Fuji Photofilm Company Limited Lithographic printing plates

Also Published As

Publication number Publication date
DE2044868A1 (de) 1971-04-08
GB1320340A (en) 1973-06-13
AU1976070A (en) 1972-03-16
US3647443A (en) 1972-03-07
DE2044868B2 (de) 1973-02-22
DE2044869A1 (de) 1971-04-01
SU383334A3 (fr) 1973-05-25
BE752770A (fr) 1970-12-01

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Legal Events

Date Code Title Description
ST Notification of lapse