FR2056469A5 - - Google Patents

Info

Publication number
FR2056469A5
FR2056469A5 FR7027882A FR7027882A FR2056469A5 FR 2056469 A5 FR2056469 A5 FR 2056469A5 FR 7027882 A FR7027882 A FR 7027882A FR 7027882 A FR7027882 A FR 7027882A FR 2056469 A5 FR2056469 A5 FR 2056469A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7027882A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NCR Voyix Corp
National Cash Register Co
Original Assignee
NCR Corp
National Cash Register Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NCR Corp, National Cash Register Co filed Critical NCR Corp
Application granted granted Critical
Publication of FR2056469A5 publication Critical patent/FR2056469A5/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
    • H10P14/69215—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material being a silicon oxide, e.g. SiO2
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/02—Contacts, special
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/043—Dual dielectric
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/118—Oxide films
FR7027882A 1969-08-04 1970-07-29 Expired FR2056469A5 (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US84715369A 1969-08-04 1969-08-04

Publications (1)

Publication Number Publication Date
FR2056469A5 true FR2056469A5 (enExample) 1971-05-14

Family

ID=25299906

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7027882A Expired FR2056469A5 (enExample) 1969-08-04 1970-07-29

Country Status (5)

Country Link
US (1) US3663277A (enExample)
JP (1) JPS4923633B1 (enExample)
DE (1) DE2038109B2 (enExample)
FR (1) FR2056469A5 (enExample)
GB (1) GB1250138A (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4103045A (en) * 1972-07-31 1978-07-25 Rhone-Poulenc, S.A. Process for improving the adhesion of coatings made of photoresistant polymers to surfaces of inorganic oxides
US3868723A (en) * 1973-06-29 1975-02-25 Ibm Integrated circuit structure accommodating via holes
JPS535342A (en) * 1976-07-02 1978-01-18 Hitachi Ltd Ignition device for internal combustion engine
JPS5425178A (en) * 1977-07-27 1979-02-24 Fujitsu Ltd Manufacture for semiconductor device
US4172907A (en) * 1977-12-29 1979-10-30 Honeywell Information Systems Inc. Method of protecting bumped semiconductor chips
JPS5564468U (enExample) * 1979-11-21 1980-05-02
US4630090A (en) * 1984-09-25 1986-12-16 Texas Instruments Incorporated Mercury cadmium telluride infrared focal plane devices having step insulator and process for making same
CA2009518C (en) * 1990-02-07 2000-10-17 Luc Ouellet Spin-on glass processing technique for the fabrication of semiconductor device
US5334415A (en) * 1992-09-21 1994-08-02 Compaq Computer Corporation Method and apparatus for film coated passivation of ink channels in ink jet printhead
US6599643B2 (en) * 1997-01-31 2003-07-29 Elisha Holding Llc Energy enhanced process for treating a conductive surface and products formed thereby
US6592738B2 (en) 1997-01-31 2003-07-15 Elisha Holding Llc Electrolytic process for treating a conductive surface and products formed thereby
US6322687B1 (en) 1997-01-31 2001-11-27 Elisha Technologies Co Llc Electrolytic process for forming a mineral
US6153080A (en) * 1997-01-31 2000-11-28 Elisha Technologies Co Llc Electrolytic process for forming a mineral
ATE326561T1 (de) * 1997-01-31 2006-06-15 Elisha Holding Llc Ein elektrolytisch verfahren zur herstellung einer ein mineral enthaltende beschichtung
US6653718B2 (en) 2001-01-11 2003-11-25 Honeywell International, Inc. Dielectric films for narrow gap-fill applications
US6444495B1 (en) * 2001-01-11 2002-09-03 Honeywell International, Inc. Dielectric films for narrow gap-fill applications
US20040188262A1 (en) * 2002-02-05 2004-09-30 Heimann Robert L. Method for treating metallic surfaces and products formed thereby
WO2003066937A2 (en) * 2002-02-05 2003-08-14 Elisha Holding Llc Method for treating metallic surfaces and products formed thereby
US6967172B2 (en) * 2002-07-03 2005-11-22 Honeywell International Inc. Colloidal silica composite films for premetal dielectric applications

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2539410A (en) * 1944-10-06 1951-01-30 Farnsworth Res Corp Method of forming a glass film on metal
BE629895A (enExample) * 1961-09-29 1900-01-01

Also Published As

Publication number Publication date
GB1250138A (enExample) 1971-10-20
JPS4923633B1 (enExample) 1974-06-17
DE2038109B2 (de) 1973-02-08
DE2038109A1 (de) 1971-04-22
US3663277A (en) 1972-05-16

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Legal Events

Date Code Title Description
CD Change of name or company name
ST Notification of lapse