FR2047506A5 - - Google Patents

Info

Publication number
FR2047506A5
FR2047506A5 FR7016848A FR7016848A FR2047506A5 FR 2047506 A5 FR2047506 A5 FR 2047506A5 FR 7016848 A FR7016848 A FR 7016848A FR 7016848 A FR7016848 A FR 7016848A FR 2047506 A5 FR2047506 A5 FR 2047506A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7016848A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Original Assignee
Shipley Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Inc filed Critical Shipley Co Inc
Application granted granted Critical
Publication of FR2047506A5 publication Critical patent/FR2047506A5/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
FR7016848A 1969-05-08 1970-05-08 Expired FR2047506A5 (enrdf_load_stackoverflow)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US82305269A 1969-05-08 1969-05-08
DE19702022849 DE2022849A1 (de) 1969-05-08 1970-05-11 Verfahren zum Aufbringen einer lichtempfindlichen Schicht auf eine Unterlage sowie lichtempfindlicher Schichtkoerper zur Verwendung in diesem Verfahren

Publications (1)

Publication Number Publication Date
FR2047506A5 true FR2047506A5 (enrdf_load_stackoverflow) 1971-03-12

Family

ID=25759108

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7016848A Expired FR2047506A5 (enrdf_load_stackoverflow) 1969-05-08 1970-05-08

Country Status (4)

Country Link
JP (1) JPS4935448B1 (enrdf_load_stackoverflow)
DE (1) DE2022849A1 (enrdf_load_stackoverflow)
FR (1) FR2047506A5 (enrdf_load_stackoverflow)
GB (1) GB1310126A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0041639A3 (en) * 1980-05-27 1982-02-17 E.I. Du Pont De Nemours And Company Laminating process
EP0099426A1 (en) * 1982-07-19 1984-02-01 Asahi Kasei Kogyo Kabushiki Kaisha A process for coating a liquid photopolymerizable composition and a process for producing a printed circuit board thereby
EP0260590A3 (en) * 1986-09-12 1989-11-08 E.I. Du Pont De Nemours And Company Lamination of photopolymerizable film onto a substrate employing an intermediate nonphotosensitive liquid layer

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4289480A (en) * 1979-11-02 1981-09-15 E. I. Du Pont De Nemours And Company Process for heating thin surface layers

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0041639A3 (en) * 1980-05-27 1982-02-17 E.I. Du Pont De Nemours And Company Laminating process
EP0099426A1 (en) * 1982-07-19 1984-02-01 Asahi Kasei Kogyo Kabushiki Kaisha A process for coating a liquid photopolymerizable composition and a process for producing a printed circuit board thereby
EP0260590A3 (en) * 1986-09-12 1989-11-08 E.I. Du Pont De Nemours And Company Lamination of photopolymerizable film onto a substrate employing an intermediate nonphotosensitive liquid layer

Also Published As

Publication number Publication date
DE2022849A1 (de) 1971-11-25
GB1310126A (en) 1973-03-14
JPS4935448B1 (enrdf_load_stackoverflow) 1974-09-21

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Legal Events

Date Code Title Description
ST Notification of lapse