FR2045457A5 - - Google Patents

Info

Publication number
FR2045457A5
FR2045457A5 FR7014106A FR7014106A FR2045457A5 FR 2045457 A5 FR2045457 A5 FR 2045457A5 FR 7014106 A FR7014106 A FR 7014106A FR 7014106 A FR7014106 A FR 7014106A FR 2045457 A5 FR2045457 A5 FR 2045457A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7014106A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Licentia Patent Verwaltungs GmbH
Original Assignee
Licentia Patent Verwaltungs GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE1919991A external-priority patent/DE1919991C3/de
Priority claimed from DE19691952273 external-priority patent/DE1952273A1/de
Application filed by Licentia Patent Verwaltungs GmbH filed Critical Licentia Patent Verwaltungs GmbH
Application granted granted Critical
Publication of FR2045457A5 publication Critical patent/FR2045457A5/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
FR7014106A 1969-04-19 1970-04-17 Expired FR2045457A5 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE1919991A DE1919991C3 (de) 1969-04-19 1969-04-19 Anordnung zur automatischen Aus richtung von zwei aufeinander einzu justierenden Objekten
DE19691952273 DE1952273A1 (de) 1969-10-17 1969-10-17 Verfahren zum automatischen Ausrichten

Publications (1)

Publication Number Publication Date
FR2045457A5 true FR2045457A5 (de) 1971-02-26

Family

ID=25757289

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7014106A Expired FR2045457A5 (de) 1969-04-19 1970-04-17

Country Status (3)

Country Link
JP (1) JPS4922587B1 (de)
FR (1) FR2045457A5 (de)
GB (1) GB1312825A (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2503416A1 (fr) * 1981-04-03 1982-10-08 Philips Nv Dispositif permettant de detecter la position d'un objet
EP0100526A2 (de) * 1982-08-04 1984-02-15 The Perkin-Elmer Corporation Vorrichtung für die Ausrichtung und Abstandskontrolle einer Maske und einer Scheibe und Anwendung in der Rontgenlithographie

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1473301A (en) * 1973-05-03 1977-05-11 Nippon Kogaku Kk Manufacture of multi-layer structures
JPS5859738A (ja) * 1981-10-02 1983-04-08 Takeda Kikai Seisakusho:Kk 縦型穴明機用ワ−クテ−ブル装置
US20080026305A1 (en) * 2006-07-26 2008-01-31 Wei Wu Apparatus and method for alignment using multiple wavelengths of light

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2503416A1 (fr) * 1981-04-03 1982-10-08 Philips Nv Dispositif permettant de detecter la position d'un objet
EP0100526A2 (de) * 1982-08-04 1984-02-15 The Perkin-Elmer Corporation Vorrichtung für die Ausrichtung und Abstandskontrolle einer Maske und einer Scheibe und Anwendung in der Rontgenlithographie
EP0100526A3 (en) * 1982-08-04 1986-03-19 The Perkin-Elmer Corporation Apparatus for effecting alignment and spacing control of a mask and wafer for use in x-ray lithography

Also Published As

Publication number Publication date
JPS4922587B1 (de) 1974-06-10
GB1312825A (en) 1973-04-11

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Legal Events

Date Code Title Description
ST Notification of lapse