FR2026831A1 - - Google Patents

Info

Publication number
FR2026831A1
FR2026831A1 FR6931755A FR6931755A FR2026831A1 FR 2026831 A1 FR2026831 A1 FR 2026831A1 FR 6931755 A FR6931755 A FR 6931755A FR 6931755 A FR6931755 A FR 6931755A FR 2026831 A1 FR2026831 A1 FR 2026831A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR6931755A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Radio Corporation of America
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp, Radio Corporation of America filed Critical RCA Corp
Publication of FR2026831A1 publication Critical patent/FR2026831A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/10Etching compositions
    • C23F1/14Aqueous compositions
    • C23F1/16Acidic compositions
    • C23F1/30Acidic compositions for etching other metallic material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/482Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Weting (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Electroplating Methods And Accessories (AREA)
  • ing And Chemical Polishing (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
FR6931755A 1968-12-23 1969-09-18 Withdrawn FR2026831A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US78621868A 1968-12-23 1968-12-23

Publications (1)

Publication Number Publication Date
FR2026831A1 true FR2026831A1 (de) 1970-09-25

Family

ID=25137939

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6931755A Withdrawn FR2026831A1 (de) 1968-12-23 1969-09-18

Country Status (4)

Country Link
JP (1) JPS4842023B1 (de)
DE (1) DE1947026B2 (de)
FR (1) FR2026831A1 (de)
GB (1) GB1232126A (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3700569A (en) * 1971-09-10 1972-10-24 Bell Telephone Labor Inc Method of metallizing devices
JPS5174735U (de) * 1974-12-06 1976-06-11
CH648692A5 (en) * 1979-09-05 1985-03-29 Bbc Brown Boveri & Cie Contact arrangement on a semiconductor component
EP0312965B1 (de) * 1987-10-23 1992-12-30 Siemens Aktiengesellschaft Verfahren zur Herstellung eines planaren selbstjustierten Heterobipolartransistors

Also Published As

Publication number Publication date
GB1232126A (de) 1971-05-19
DE1947026A1 (de) 1971-03-04
DE1947026B2 (de) 1973-12-20
JPS4842023B1 (de) 1973-12-10

Similar Documents

Publication Publication Date Title
AU1946070A (de)
AU428130B2 (de)
AU2374870A (de)
AU5184069A (de)
AU6168869A (de)
AU416157B2 (de)
AU429879B2 (de)
AU2581067A (de)
AU4811568A (de)
AU421558B1 (de)
AU4744468A (de)
AU2580267A (de)
AU3224368A (de)
AU3789668A (de)
AR203075Q (de)
AU4503667A (de)
AU5758767A (de)
AU4270368A (de)
BE727050A (de)
AU3083868A (de)
AU2889368A (de)
AU4464266A (de)
AU4558658A (de)
AU463027A (de)
BE727099A (de)

Legal Events

Date Code Title Description
ST Notification of lapse