FR2022140A1 - - Google Patents

Info

Publication number
FR2022140A1
FR2022140A1 FR6928992A FR6928992A FR2022140A1 FR 2022140 A1 FR2022140 A1 FR 2022140A1 FR 6928992 A FR6928992 A FR 6928992A FR 6928992 A FR6928992 A FR 6928992A FR 2022140 A1 FR2022140 A1 FR 2022140A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR6928992A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Publication of FR2022140A1 publication Critical patent/FR2022140A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
FR6928992A 1968-08-29 1969-08-25 Withdrawn FR2022140A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US75618668A 1968-08-29 1968-08-29

Publications (1)

Publication Number Publication Date
FR2022140A1 true FR2022140A1 (fr) 1970-07-31

Family

ID=25042380

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6928992A Withdrawn FR2022140A1 (fr) 1968-08-29 1969-08-25

Country Status (5)

Country Link
JP (1) JPS4822659B1 (fr)
DE (1) DE1943029B2 (fr)
FR (1) FR2022140A1 (fr)
GB (1) GB1282322A (fr)
NL (1) NL6913234A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2336796A1 (fr) * 1975-12-22 1977-07-22 Siemens Ag Procede pour le traitement thermique de disques semi-conducteurs
EP0119103A2 (fr) * 1983-03-14 1984-09-19 Energy Conversion Devices, Inc. Dispositif pour introduire et diriger un gaz réactif

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5426526Y2 (fr) * 1973-10-24 1979-09-01

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2336796A1 (fr) * 1975-12-22 1977-07-22 Siemens Ag Procede pour le traitement thermique de disques semi-conducteurs
EP0119103A2 (fr) * 1983-03-14 1984-09-19 Energy Conversion Devices, Inc. Dispositif pour introduire et diriger un gaz réactif
EP0119103A3 (fr) * 1983-03-14 1986-06-18 Energy Conversion Devices, Inc. Dispositif pour introduire et diriger un gaz réactif

Also Published As

Publication number Publication date
NL6913234A (fr) 1970-03-03
DE1943029A1 (de) 1970-03-26
JPS4822659B1 (fr) 1973-07-07
DE1943029B2 (de) 1972-01-13
GB1282322A (en) 1972-07-19

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Legal Events

Date Code Title Description
ST Notification of lapse