FR2007542A1 - - Google Patents

Info

Publication number
FR2007542A1
FR2007542A1 FR6913186A FR6913186A FR2007542A1 FR 2007542 A1 FR2007542 A1 FR 2007542A1 FR 6913186 A FR6913186 A FR 6913186A FR 6913186 A FR6913186 A FR 6913186A FR 2007542 A1 FR2007542 A1 FR 2007542A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR6913186A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Micronas GmbH
ITT Inc
Original Assignee
Deutsche ITT Industries GmbH
ITT Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Deutsche ITT Industries GmbH, ITT Industries Inc filed Critical Deutsche ITT Industries GmbH
Publication of FR2007542A1 publication Critical patent/FR2007542A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/761—PN junctions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00—Subject matter not provided for in other groups of this subclass

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Element Separation (AREA)
  • Bipolar Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)
FR6913186A 1968-04-27 1969-04-25 Withdrawn FR2007542A1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1769271A DE1769271C3 (de) 1968-04-27 1968-04-27 Verfahren zum Herstellen einer Festkörperschaltung

Publications (1)

Publication Number Publication Date
FR2007542A1 true FR2007542A1 (enrdf_load_stackoverflow) 1970-01-09

Family

ID=5700073

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6913186A Withdrawn FR2007542A1 (enrdf_load_stackoverflow) 1968-04-27 1969-04-25

Country Status (4)

Country Link
CH (1) CH490737A (enrdf_load_stackoverflow)
DE (1) DE1769271C3 (enrdf_load_stackoverflow)
FR (1) FR2007542A1 (enrdf_load_stackoverflow)
GB (1) GB1231543A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2342556A1 (fr) * 1976-02-28 1977-09-23 Itt Methode de fabrication d'une zone isolee par jonction p.n dans un circuit integre monolithique

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4132573A (en) * 1977-02-08 1979-01-02 Murata Manufacturing Co., Ltd. Method of manufacturing a monolithic integrated circuit utilizing epitaxial deposition and simultaneous outdiffusion
DE2710878A1 (de) * 1977-03-12 1978-09-14 Itt Ind Gmbh Deutsche Verfahren zum herstellen einer an der oberflaeche eines halbleiterkoerpers aus silicium liegenden zone einer monolithisch integrierten i hoch 2 l-schaltung

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2342556A1 (fr) * 1976-02-28 1977-09-23 Itt Methode de fabrication d'une zone isolee par jonction p.n dans un circuit integre monolithique

Also Published As

Publication number Publication date
CH490737A (de) 1970-05-15
DE1769271B2 (de) 1973-11-22
DE1769271A1 (de) 1970-12-17
DE1769271C3 (de) 1975-04-30
GB1231543A (enrdf_load_stackoverflow) 1971-05-12

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Legal Events

Date Code Title Description
ST Notification of lapse