FR1584608A - - Google Patents

Info

Publication number
FR1584608A
FR1584608A FR1584608DA FR1584608A FR 1584608 A FR1584608 A FR 1584608A FR 1584608D A FR1584608D A FR 1584608DA FR 1584608 A FR1584608 A FR 1584608A
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Application granted granted Critical
Publication of FR1584608A publication Critical patent/FR1584608A/fr
Expired legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
FR1584608D 1968-07-30 1968-07-30 Expired FR1584608A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR161160 1968-07-30

Publications (1)

Publication Number Publication Date
FR1584608A true FR1584608A (en) 1969-12-26

Family

ID=8653205

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1584608D Expired FR1584608A (en) 1968-07-30 1968-07-30

Country Status (1)

Country Link
FR (1) FR1584608A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2378873A1 (en) * 1977-02-01 1978-08-25 G Pi Emitter layer application in semiconductor prodn. - involves application of emitter from supply of an intermediate element, from which it is transferred to emitter support
FR2456144A1 (en) * 1979-04-20 1980-12-05 Kishinevsky G Unive Vacuum vapour deposition of semiconductor layers on substrates - esp. continuous deposition of arsenic selenide or sulphide on wide strip for opto-electronic devices
EP1136586A1 (en) * 2000-03-18 2001-09-26 Aguasolar Advances Technologies SA Evaporation apparatus, particularly adapted to an evaporation plant for forming thin layers on a substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2378873A1 (en) * 1977-02-01 1978-08-25 G Pi Emitter layer application in semiconductor prodn. - involves application of emitter from supply of an intermediate element, from which it is transferred to emitter support
FR2456144A1 (en) * 1979-04-20 1980-12-05 Kishinevsky G Unive Vacuum vapour deposition of semiconductor layers on substrates - esp. continuous deposition of arsenic selenide or sulphide on wide strip for opto-electronic devices
EP1136586A1 (en) * 2000-03-18 2001-09-26 Aguasolar Advances Technologies SA Evaporation apparatus, particularly adapted to an evaporation plant for forming thin layers on a substrate

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Legal Events

Date Code Title Description
ST Notification of lapse