FR1572683A - - Google Patents
Info
- Publication number
- FR1572683A FR1572683A FR1572683DA FR1572683A FR 1572683 A FR1572683 A FR 1572683A FR 1572683D A FR1572683D A FR 1572683DA FR 1572683 A FR1572683 A FR 1572683A
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
- C07D303/16—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by esterified hydroxyl radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
- G03F7/405—Treatment with inorganic or organometallic reagents after imagewise removal
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Weting (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2686067 | 1967-06-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1572683A true FR1572683A (fr) | 1969-06-27 |
Family
ID=10250381
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1572683D Expired FR1572683A (fr) | 1967-06-09 | 1968-06-10 |
Country Status (6)
Country | Link |
---|---|
US (1) | US3652274A (fr) |
BE (1) | BE716311A (fr) |
DE (1) | DE1771568A1 (fr) |
FR (1) | FR1572683A (fr) |
GB (1) | GB1225754A (fr) |
NL (1) | NL6808025A (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2392815A1 (fr) * | 1977-06-02 | 1978-12-29 | Du Pont | Procede de post-traitement pour plaques d'impression flexographique |
EP0115414A2 (fr) * | 1983-01-28 | 1984-08-08 | W.R. Grace K.K. | Traitement des plaques d'impression à base de résines |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3890149A (en) * | 1973-05-02 | 1975-06-17 | American Can Co | Waterless diazo planographic printing plates with epoxy-silane in undercoat and/or overcoat layers |
US3877939A (en) * | 1973-06-25 | 1975-04-15 | Nippon Paint Co Ltd | Photopolymer printing plates and coated relief printing plates |
US4751171A (en) * | 1984-07-03 | 1988-06-14 | Matsushita Electric Industrial Co., Ltd. | Pattern forming method |
GB2170015A (en) * | 1985-01-11 | 1986-07-23 | Philips Electronic Associated | Method of manufacturing a semiconductor device |
US4908298A (en) * | 1985-03-19 | 1990-03-13 | International Business Machines Corporation | Method of creating patterned multilayer films for use in production of semiconductor circuits and systems |
US4981909A (en) * | 1985-03-19 | 1991-01-01 | International Business Machines Corporation | Plasma-resistant polymeric material, preparation thereof, and use thereof |
US4782008A (en) * | 1985-03-19 | 1988-11-01 | International Business Machines Corporation | Plasma-resistant polymeric material, preparation thereof, and use thereof |
US4701390A (en) * | 1985-11-27 | 1987-10-20 | Macdermid, Incorporated | Thermally stabilized photoresist images |
AU6629286A (en) * | 1985-11-27 | 1987-07-01 | Macdermid, Inc. | Thermally stabilized photoresist images |
US4737425A (en) * | 1986-06-10 | 1988-04-12 | International Business Machines Corporation | Patterned resist and process |
US4806455A (en) * | 1987-04-03 | 1989-02-21 | Macdermid, Incorporated | Thermal stabilization of photoresist images |
DE19721524A1 (de) * | 1997-05-22 | 1998-11-26 | Hsm Gmbh | Verfahren zur Herstellung eines Prägezylinders |
JP3087726B2 (ja) | 1998-05-25 | 2000-09-11 | 日本電気株式会社 | 半導体装置の製造プロセスにおけるパターニング方法 |
JP4933063B2 (ja) * | 2005-06-24 | 2012-05-16 | 東京応化工業株式会社 | パターン形成方法 |
US7943080B2 (en) * | 2005-12-23 | 2011-05-17 | Asml Netherlands B.V. | Alignment for imprint lithography |
CN102503090B (zh) * | 2011-10-19 | 2013-12-04 | 徐晟伟 | 一种保温瓶胆圆口机 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2532390A (en) * | 1945-05-28 | 1950-12-05 | Preparation of a printing surface | |
GB738958A (en) * | 1953-08-03 | 1955-10-19 | William Warren Triggs | Improved method for photographically or photochemically producing a printing plate |
US3147116A (en) * | 1961-11-28 | 1964-09-01 | Gen Aniline & Film Corp | Printing plates comprising hydrophobic resisto formed by crosslinking photopolymerized hydrophilic monomers with an isocyanate |
US3390992A (en) * | 1964-06-15 | 1968-07-02 | North American Rockwell | Non-etching circuit fabrication |
US3405017A (en) * | 1965-02-26 | 1968-10-08 | Hughes Aircraft Co | Use of organosilicon subbing layer in photoresist method for obtaining fine patterns for microcircuitry |
-
1967
- 1967-06-09 GB GB2686067A patent/GB1225754A/en not_active Expired
-
1968
- 1968-06-07 NL NL6808025A patent/NL6808025A/xx unknown
- 1968-06-10 US US735582A patent/US3652274A/en not_active Expired - Lifetime
- 1968-06-10 BE BE716311D patent/BE716311A/xx unknown
- 1968-06-10 FR FR1572683D patent/FR1572683A/fr not_active Expired
- 1968-06-10 DE DE19681771568 patent/DE1771568A1/de active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2392815A1 (fr) * | 1977-06-02 | 1978-12-29 | Du Pont | Procede de post-traitement pour plaques d'impression flexographique |
EP0115414A2 (fr) * | 1983-01-28 | 1984-08-08 | W.R. Grace K.K. | Traitement des plaques d'impression à base de résines |
EP0115414A3 (fr) * | 1983-01-28 | 1985-07-03 | W.R. Grace K.K. | Traitement des plaques d'impression à base de résines |
Also Published As
Publication number | Publication date |
---|---|
GB1225754A (fr) | 1971-03-24 |
US3652274A (en) | 1972-03-28 |
BE716311A (fr) | 1968-11-04 |
DE1771568A1 (de) | 1971-12-30 |
NL6808025A (fr) | 1968-11-25 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |