FR1572683A - - Google Patents

Info

Publication number
FR1572683A
FR1572683A FR1572683DA FR1572683A FR 1572683 A FR1572683 A FR 1572683A FR 1572683D A FR1572683D A FR 1572683DA FR 1572683 A FR1572683 A FR 1572683A
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Application granted granted Critical
Publication of FR1572683A publication Critical patent/FR1572683A/fr
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D303/00Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02Compounds containing oxirane rings
    • C07D303/12Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
    • C07D303/16Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by esterified hydroxyl radicals
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/0834Compounds having one or more O-Si linkage
    • C07F7/0838Compounds with one or more Si-O-Si sequences
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804Compounds having Si-O-C linkages
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/40Treatment after imagewise removal, e.g. baking
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/40Treatment after imagewise removal, e.g. baking
    • G03F7/405Treatment with inorganic or organometallic reagents after imagewise removal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
FR1572683D 1967-06-09 1968-06-10 Expired FR1572683A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2686067 1967-06-09

Publications (1)

Publication Number Publication Date
FR1572683A true FR1572683A (fr) 1969-06-27

Family

ID=10250381

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1572683D Expired FR1572683A (fr) 1967-06-09 1968-06-10

Country Status (6)

Country Link
US (1) US3652274A (fr)
BE (1) BE716311A (fr)
DE (1) DE1771568A1 (fr)
FR (1) FR1572683A (fr)
GB (1) GB1225754A (fr)
NL (1) NL6808025A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2392815A1 (fr) * 1977-06-02 1978-12-29 Du Pont Procede de post-traitement pour plaques d'impression flexographique
EP0115414A2 (fr) * 1983-01-28 1984-08-08 W.R. Grace K.K. Traitement des plaques d'impression à base de résines

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3890149A (en) * 1973-05-02 1975-06-17 American Can Co Waterless diazo planographic printing plates with epoxy-silane in undercoat and/or overcoat layers
US3877939A (en) * 1973-06-25 1975-04-15 Nippon Paint Co Ltd Photopolymer printing plates and coated relief printing plates
US4751171A (en) * 1984-07-03 1988-06-14 Matsushita Electric Industrial Co., Ltd. Pattern forming method
GB2170015A (en) * 1985-01-11 1986-07-23 Philips Electronic Associated Method of manufacturing a semiconductor device
US4908298A (en) * 1985-03-19 1990-03-13 International Business Machines Corporation Method of creating patterned multilayer films for use in production of semiconductor circuits and systems
US4981909A (en) * 1985-03-19 1991-01-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
US4701390A (en) * 1985-11-27 1987-10-20 Macdermid, Incorporated Thermally stabilized photoresist images
AU6629286A (en) * 1985-11-27 1987-07-01 Macdermid, Inc. Thermally stabilized photoresist images
US4737425A (en) * 1986-06-10 1988-04-12 International Business Machines Corporation Patterned resist and process
US4806455A (en) * 1987-04-03 1989-02-21 Macdermid, Incorporated Thermal stabilization of photoresist images
DE19721524A1 (de) * 1997-05-22 1998-11-26 Hsm Gmbh Verfahren zur Herstellung eines Prägezylinders
JP3087726B2 (ja) 1998-05-25 2000-09-11 日本電気株式会社 半導体装置の製造プロセスにおけるパターニング方法
JP4933063B2 (ja) * 2005-06-24 2012-05-16 東京応化工業株式会社 パターン形成方法
US7943080B2 (en) * 2005-12-23 2011-05-17 Asml Netherlands B.V. Alignment for imprint lithography
CN102503090B (zh) * 2011-10-19 2013-12-04 徐晟伟 一种保温瓶胆圆口机

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2532390A (en) * 1945-05-28 1950-12-05 Preparation of a printing surface
GB738958A (en) * 1953-08-03 1955-10-19 William Warren Triggs Improved method for photographically or photochemically producing a printing plate
US3147116A (en) * 1961-11-28 1964-09-01 Gen Aniline & Film Corp Printing plates comprising hydrophobic resisto formed by crosslinking photopolymerized hydrophilic monomers with an isocyanate
US3390992A (en) * 1964-06-15 1968-07-02 North American Rockwell Non-etching circuit fabrication
US3405017A (en) * 1965-02-26 1968-10-08 Hughes Aircraft Co Use of organosilicon subbing layer in photoresist method for obtaining fine patterns for microcircuitry

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2392815A1 (fr) * 1977-06-02 1978-12-29 Du Pont Procede de post-traitement pour plaques d'impression flexographique
EP0115414A2 (fr) * 1983-01-28 1984-08-08 W.R. Grace K.K. Traitement des plaques d'impression à base de résines
EP0115414A3 (fr) * 1983-01-28 1985-07-03 W.R. Grace K.K. Traitement des plaques d'impression à base de résines

Also Published As

Publication number Publication date
GB1225754A (fr) 1971-03-24
US3652274A (en) 1972-03-28
BE716311A (fr) 1968-11-04
DE1771568A1 (de) 1971-12-30
NL6808025A (fr) 1968-11-25

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Legal Events

Date Code Title Description
ST Notification of lapse