BE716311A - - Google Patents

Info

Publication number
BE716311A
BE716311A BE716311DA BE716311A BE 716311 A BE716311 A BE 716311A BE 716311D A BE716311D A BE 716311DA BE 716311 A BE716311 A BE 716311A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE716311A publication Critical patent/BE716311A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02—Compounds containing oxirane rings
    • C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
    • C07D303/16—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by esterified hydroxyl radicals
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0834—Compounds having one or more O-Si linkage
    • C07F7/0838—Compounds with one or more Si-O-Si sequences
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G03F7/405—Treatment with inorganic or organometallic reagents after imagewise removal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
BE716311D 1967-06-09 1968-06-10 BE716311A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2686067 1967-06-09

Publications (1)

Publication Number Publication Date
BE716311A true BE716311A (xx) 1968-11-04

Family

ID=10250381

Family Applications (1)

Application Number Title Priority Date Filing Date
BE716311D BE716311A (xx) 1967-06-09 1968-06-10

Country Status (6)

Country Link
US (1) US3652274A (xx)
BE (1) BE716311A (xx)
DE (1) DE1771568A1 (xx)
FR (1) FR1572683A (xx)
GB (1) GB1225754A (xx)
NL (1) NL6808025A (xx)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3890149A (en) * 1973-05-02 1975-06-17 American Can Co Waterless diazo planographic printing plates with epoxy-silane in undercoat and/or overcoat layers
US3877939A (en) * 1973-06-25 1975-04-15 Nippon Paint Co Ltd Photopolymer printing plates and coated relief printing plates
DE2724851C2 (de) * 1977-06-02 1979-08-23 Du Pont De Nemours (Deutschland) Gmbh, 4000 Duesseldorf Verfahren zur Nachbehandlung von photopolymerisierbaren Druckplatten für den Flexodruck
JPS59138454A (ja) * 1983-01-28 1984-08-08 W R Gureesu:Kk 樹脂版用表面処理剤
US4751171A (en) * 1984-07-03 1988-06-14 Matsushita Electric Industrial Co., Ltd. Pattern forming method
GB2170015A (en) * 1985-01-11 1986-07-23 Philips Electronic Associated Method of manufacturing a semiconductor device
US4908298A (en) * 1985-03-19 1990-03-13 International Business Machines Corporation Method of creating patterned multilayer films for use in production of semiconductor circuits and systems
US4981909A (en) * 1985-03-19 1991-01-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
US4701390A (en) * 1985-11-27 1987-10-20 Macdermid, Incorporated Thermally stabilized photoresist images
AU6629286A (en) * 1985-11-27 1987-07-01 Macdermid, Inc. Thermally stabilized photoresist images
US4737425A (en) * 1986-06-10 1988-04-12 International Business Machines Corporation Patterned resist and process
US4806455A (en) * 1987-04-03 1989-02-21 Macdermid, Incorporated Thermal stabilization of photoresist images
DE19721524A1 (de) * 1997-05-22 1998-11-26 Hsm Gmbh Verfahren zur Herstellung eines Prägezylinders
JP3087726B2 (ja) 1998-05-25 2000-09-11 日本電気株式会社 半導体装置の製造プロセスにおけるパターニング方法
JP4933063B2 (ja) * 2005-06-24 2012-05-16 東京応化工業株式会社 パターン形成方法
US7943080B2 (en) * 2005-12-23 2011-05-17 Asml Netherlands B.V. Alignment for imprint lithography
CN102503090B (zh) * 2011-10-19 2013-12-04 徐晟伟 一种保温瓶胆圆口机

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2532390A (en) * 1945-05-28 1950-12-05 Preparation of a printing surface
GB738958A (en) * 1953-08-03 1955-10-19 William Warren Triggs Improved method for photographically or photochemically producing a printing plate
US3147116A (en) * 1961-11-28 1964-09-01 Gen Aniline & Film Corp Printing plates comprising hydrophobic resisto formed by crosslinking photopolymerized hydrophilic monomers with an isocyanate
US3390992A (en) * 1964-06-15 1968-07-02 North American Rockwell Non-etching circuit fabrication
US3405017A (en) * 1965-02-26 1968-10-08 Hughes Aircraft Co Use of organosilicon subbing layer in photoresist method for obtaining fine patterns for microcircuitry

Also Published As

Publication number Publication date
GB1225754A (xx) 1971-03-24
US3652274A (en) 1972-03-28
FR1572683A (xx) 1969-06-27
DE1771568A1 (de) 1971-12-30
NL6808025A (xx) 1968-11-25

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