FR1517876A - Film de matériau étranger pour des éléments semi-conducteurs et procédé de fabrication - Google Patents
Film de matériau étranger pour des éléments semi-conducteurs et procédé de fabricationInfo
- Publication number
- FR1517876A FR1517876A FR8288A FR06008288A FR1517876A FR 1517876 A FR1517876 A FR 1517876A FR 8288 A FR8288 A FR 8288A FR 06008288 A FR06008288 A FR 06008288A FR 1517876 A FR1517876 A FR 1517876A
- Authority
- FR
- France
- Prior art keywords
- manufacturing
- semiconductor elements
- foreign material
- material film
- foreign
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02172—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides
- H01L21/02175—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02318—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment
- H01L21/02337—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to a gas or vapour
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Ceramic Products (AREA)
- Formation Of Insulating Films (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEJ0029847 | 1966-01-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1517876A true FR1517876A (fr) | 1968-03-22 |
Family
ID=7203716
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8288A Expired FR1517876A (fr) | 1966-01-15 | 1967-01-11 | Film de matériau étranger pour des éléments semi-conducteurs et procédé de fabrication |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE1564108A1 (fr) |
FR (1) | FR1517876A (fr) |
GB (1) | GB1143864A (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2658304C2 (de) * | 1975-12-24 | 1984-12-20 | Tokyo Shibaura Electric Co., Ltd., Kawasaki, Kanagawa | Halbleitervorrichtung |
DE2700463A1 (de) * | 1977-01-07 | 1978-07-13 | Siemens Ag | Verfahren zum passivieren von halbleiterelementen |
US4161743A (en) * | 1977-03-28 | 1979-07-17 | Tokyo Shibaura Electric Co., Ltd. | Semiconductor device with silicon carbide-glass-silicon carbide passivating overcoat |
-
0
- GB GB1143864D patent/GB1143864A/en not_active Expired
-
1966
- 1966-01-15 DE DE19661564108 patent/DE1564108A1/de active Pending
-
1967
- 1967-01-11 FR FR8288A patent/FR1517876A/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE1564108A1 (de) | 1969-09-25 |
GB1143864A (fr) | 1900-01-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CH471664A (fr) | Film thermoplastique et procédé pour sa fabrication | |
FR1519072A (fr) | Couche granuleuse et son procédé de fabrication | |
CH477499A (fr) | Procédé de fabrication d'un matériau stratifié | |
FR1517876A (fr) | Film de matériau étranger pour des éléments semi-conducteurs et procédé de fabrication | |
CH515195A (fr) | Matériau composite et procédé pour sa fabrication | |
FR96606E (fr) | Procédé de fabrication d'un matériau supraconducteur. | |
FR1501354A (fr) | Procédé et appareil de fabrication d'éléments en béton | |
CH489870A (fr) | Procédé de fabrication d'un matériau composite Al-Mg-Al2O3-MgO extrudé | |
CH486036A (fr) | Matière pelliculaire polarisante et procédé de fabrication de cette matière | |
FR1513823A (fr) | Procédé de fabrication d'éléments photosensibles | |
FR1492567A (fr) | Matière de meulage et procédé pour sa fabrication et son utilisation | |
FR1544002A (fr) | Matériau ajouré à structure métallique et procédé pour sa fabrication | |
FR1529863A (fr) | Procédé et dispositifs de fabrication d'un matériau isolant acoustique et thermique | |
FR1539147A (fr) | éléments de construction précontraints et procédé de fabrication | |
FR1474029A (fr) | Matériau céramique et procédé de fabrication | |
FR1508449A (fr) | Matériau aggloméré et procédé de fabrication | |
FR1513102A (fr) | Dosimètre et procédé pour sa fabrication | |
BE754052A (fr) | Materiau de construction et procede de fabrication dudit materiau | |
FR1323644A (fr) | Matériaux ferromagnétiques et procédés pour leur fabrication | |
FR1511300A (fr) | Matériau électrophotographique et son procédé de fabrication | |
FR1538567A (fr) | Procédé et dispositif de fabrication de pièces de forme en matériau thermoplastique | |
FR1523471A (fr) | Procédé de fabrication de méthylisopropylphénols et notamment de carvacrol | |
FR1511474A (fr) | Nouvelle composition thermoplastique et procédé pour sa fabrication | |
FR1540390A (fr) | Procédé de fabrication de pommes-chips et installations pour la mise en pratique de ce procédé | |
FR1529987A (fr) | Résistance semiconductrice et procédé pour sa fabrication |