FR1507796A - Procédé de fabrication et d'assemblage d'éléments de circuits plans - Google Patents
Procédé de fabrication et d'assemblage d'éléments de circuits plansInfo
- Publication number
- FR1507796A FR1507796A FR8263A FR06008263A FR1507796A FR 1507796 A FR1507796 A FR 1507796A FR 8263 A FR8263 A FR 8263A FR 06008263 A FR06008263 A FR 06008263A FR 1507796 A FR1507796 A FR 1507796A
- Authority
- FR
- France
- Prior art keywords
- assembly
- manufacturing process
- circuit elements
- planar circuit
- planar
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76297—Dielectric isolation using EPIC techniques, i.e. epitaxial passivated integrated circuit
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/026—Deposition thru hole in mask
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/029—Differential crystal growth rates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/043—Dual dielectric
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/049—Equivalence and options
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/05—Etch and refill
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/085—Isolated-integrated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/15—Silicon on sapphire SOS
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Recrystallisation Techniques (AREA)
- Led Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US51907566A | 1966-01-06 | 1966-01-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1507796A true FR1507796A (fr) | 1967-12-29 |
Family
ID=24066704
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8263A Expired FR1507796A (fr) | 1966-01-06 | 1967-01-05 | Procédé de fabrication et d'assemblage d'éléments de circuits plans |
Country Status (4)
Country | Link |
---|---|
US (1) | US3433686A (fr) |
DE (1) | DE1640500A1 (fr) |
FR (1) | FR1507796A (fr) |
GB (1) | GB1154868A (fr) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3492174A (en) * | 1966-03-19 | 1970-01-27 | Sony Corp | Method of making a semiconductor device |
US3905037A (en) * | 1966-12-30 | 1975-09-09 | Texas Instruments Inc | Integrated circuit components in insulated islands of integrated semiconductor materials in a single substrate |
NL6705847A (fr) * | 1967-04-26 | 1968-10-28 | ||
US3789276A (en) * | 1968-07-15 | 1974-01-29 | Texas Instruments Inc | Multilayer microelectronic circuitry techniques |
US3950479A (en) * | 1969-04-02 | 1976-04-13 | Siemens Aktiengesellschaft | Method of producing hollow semiconductor bodies |
US4368098A (en) * | 1969-10-01 | 1983-01-11 | Rockwell International Corporation | Epitaxial composite and method of making |
US4404265A (en) * | 1969-10-01 | 1983-09-13 | Rockwell International Corporation | Epitaxial composite and method of making |
US3664866A (en) * | 1970-04-08 | 1972-05-23 | North American Rockwell | Composite, method for growth of ii{11 {14 vi{11 {0 compounds on substrates, and process for making composition for the compounds |
US3658582A (en) * | 1970-04-13 | 1972-04-25 | North American Rockwell | Composites, of iib-via binary film compounds on iia-viia binary compound substrate crystals and process therefor |
US3737739A (en) * | 1971-02-22 | 1973-06-05 | Ibm | Single crystal regions in dielectric substrate |
US3935040A (en) * | 1971-10-20 | 1976-01-27 | Harris Corporation | Process for forming monolithic semiconductor display |
US4012243A (en) * | 1971-11-12 | 1977-03-15 | Motorola, Inc. | Method of fabricating multicolor light displays utilizing etch and refill techniques |
US3979237A (en) * | 1972-04-24 | 1976-09-07 | Harris Corporation | Device isolation in integrated circuits |
US3985590A (en) * | 1973-06-13 | 1976-10-12 | Harris Corporation | Process for forming heteroepitaxial structure |
US3984857A (en) * | 1973-06-13 | 1976-10-05 | Harris Corporation | Heteroepitaxial displays |
US4052251A (en) * | 1976-03-02 | 1977-10-04 | Rca Corporation | Method of etching sapphire utilizing sulfur hexafluoride |
EP0193830A3 (fr) * | 1980-04-10 | 1986-10-01 | Massachusetts Institute Of Technology | Dispositif à cellules solaires comportant plusieurs cellules solaires constitutives |
KR900001267B1 (ko) * | 1983-11-30 | 1990-03-05 | 후지쓰 가부시끼가이샤 | Soi형 반도체 장치의 제조방법 |
US4889832A (en) * | 1987-12-23 | 1989-12-26 | Texas Instruments Incorporated | Method of fabricating an integrated circuit with metal interconnecting layers above and below active circuitry |
US5064771A (en) * | 1990-04-13 | 1991-11-12 | Grumman Aerospace Corporation | Method of forming crystal array |
US5143862A (en) * | 1990-11-29 | 1992-09-01 | Texas Instruments Incorporated | SOI wafer fabrication by selective epitaxial growth |
US5625209A (en) * | 1992-08-26 | 1997-04-29 | Texas Instruments Incorporated | Silicon based sensor apparatus |
US8963285B2 (en) | 2013-03-08 | 2015-02-24 | Infineon Technologies Ag | Semiconductor device and method of manufacturing thereof |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3150299A (en) * | 1959-09-11 | 1964-09-22 | Fairchild Camera Instr Co | Semiconductor circuit complex having isolation means |
US3316128A (en) * | 1962-10-15 | 1967-04-25 | Nippon Electric Co | Semiconductor device |
US3300832A (en) * | 1963-06-28 | 1967-01-31 | Rca Corp | Method of making composite insulatorsemiconductor wafer |
US3320485A (en) * | 1964-03-30 | 1967-05-16 | Trw Inc | Dielectric isolation for monolithic circuit |
US3312879A (en) * | 1964-07-29 | 1967-04-04 | North American Aviation Inc | Semiconductor structure including opposite conductivity segments |
US3383760A (en) * | 1965-08-09 | 1968-05-21 | Rca Corp | Method of making semiconductor devices |
US3332137A (en) * | 1964-09-28 | 1967-07-25 | Rca Corp | Method of isolating chips of a wafer of semiconductor material |
US3381182A (en) * | 1964-10-19 | 1968-04-30 | Philco Ford Corp | Microcircuits having buried conductive layers |
FR1483570A (fr) * | 1965-06-23 | 1967-09-06 | ||
US3372070A (en) * | 1965-07-30 | 1968-03-05 | Bell Telephone Labor Inc | Fabrication of semiconductor integrated devices with a pn junction running through the wafer |
US3322581A (en) * | 1965-10-24 | 1967-05-30 | Texas Instruments Inc | Fabrication of a metal base transistor |
-
1966
- 1966-01-06 US US519075A patent/US3433686A/en not_active Expired - Lifetime
- 1966-12-07 GB GB54787/66A patent/GB1154868A/en not_active Expired
- 1966-12-30 DE DE19661640500 patent/DE1640500A1/de active Pending
-
1967
- 1967-01-05 FR FR8263A patent/FR1507796A/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB1154868A (en) | 1969-06-11 |
US3433686A (en) | 1969-03-18 |
DE1640500A1 (de) | 1970-08-27 |
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