FR1341482A - Process for manufacturing a high purity semiconductor material, in particular silicon - Google Patents
Process for manufacturing a high purity semiconductor material, in particular siliconInfo
- Publication number
- FR1341482A FR1341482A FR852095A FR852095A FR1341482A FR 1341482 A FR1341482 A FR 1341482A FR 852095 A FR852095 A FR 852095A FR 852095 A FR852095 A FR 852095A FR 1341482 A FR1341482 A FR 1341482A
- Authority
- FR
- France
- Prior art keywords
- manufacturing
- semiconductor material
- high purity
- particular silicon
- purity semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR852095A FR1341482A (en) | 1960-02-23 | 1961-02-08 | Process for manufacturing a high purity semiconductor material, in particular silicon |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DES67223A DE1185150B (en) | 1960-02-23 | 1960-02-23 | Process for the production of the purest semiconductor material, in particular silicon |
FR852095A FR1341482A (en) | 1960-02-23 | 1961-02-08 | Process for manufacturing a high purity semiconductor material, in particular silicon |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1341482A true FR1341482A (en) | 1963-11-02 |
Family
ID=25995991
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR852095A Expired FR1341482A (en) | 1960-02-23 | 1961-02-08 | Process for manufacturing a high purity semiconductor material, in particular silicon |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR1341482A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0090321A2 (en) * | 1982-03-29 | 1983-10-05 | Hüls Aktiengesellschaft | Reactor and process for the manufacture of semiconductor silicon |
-
1961
- 1961-02-08 FR FR852095A patent/FR1341482A/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0090321A2 (en) * | 1982-03-29 | 1983-10-05 | Hüls Aktiengesellschaft | Reactor and process for the manufacture of semiconductor silicon |
EP0090321A3 (en) * | 1982-03-29 | 1986-05-14 | Hüls Aktiengesellschaft | Reactor and process for the manufacture of semiconductor silicon |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR1244924A (en) | Semiconductor crystal manufacturing process | |
BE609586A (en) | Semiconductor material, and its manufacturing process | |
FR1221347A (en) | Semiconductor device manufacturing process | |
BE585390A (en) | Very high purity silicon manufacturing process. | |
FR1230911A (en) | High purity silicon manufacturing process | |
FR1287279A (en) | Semiconductor device manufacturing process | |
FR1233186A (en) | Semiconductor manufacturing process | |
CH392701A (en) | Semiconductor diode and its manufacturing process | |
BE610917A (en) | Semiconductor material manufacturing process | |
BE575837A (en) | Manufacturing process for semiconductor single crystals. | |
BE605340A (en) | Process for manufacturing high purity silicon. | |
FR1341482A (en) | Process for manufacturing a high purity semiconductor material, in particular silicon | |
FR1331325A (en) | Process for obtaining a high purity semiconductor material, in particular silicon | |
FR1292508A (en) | High purity silicon manufacturing process | |
BE583120A (en) | A method of manufacturing a silicon-based semiconductor. | |
FR1184331A (en) | Semiconductor device manufacturing process | |
FR1456437A (en) | High purity silicon manufacturing process | |
FR1319288A (en) | Process for manufacturing a semiconductor device, in particular a thermoelectric semiconductor device | |
FR1258133A (en) | Process for producing an extremely pure semiconductor material, in particular silicon | |
FR77774E (en) | Semiconductor crystal manufacturing process | |
FR1289336A (en) | Semiconductor device manufacturing process | |
FR1178317A (en) | Semiconductor material manufacturing process | |
BE581298A (en) | Very pure silicon manufacturing process. | |
BE586846A (en) | A process for manufacturing grain oriented silicon steel. | |
FR1201057A (en) | Very pure silicon manufacturing process |