FR1167737A - Nouveaux polymères photosensibles, procédé pour leur préparation et leurs applications industrielles - Google Patents

Nouveaux polymères photosensibles, procédé pour leur préparation et leurs applications industrielles

Info

Publication number
FR1167737A
FR1167737A FR1167737DA FR1167737A FR 1167737 A FR1167737 A FR 1167737A FR 1167737D A FR1167737D A FR 1167737DA FR 1167737 A FR1167737 A FR 1167737A
Authority
FR
France
Prior art keywords
preparation
industrial applications
photosensitive polymers
new photosensitive
polymers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Pathe SA
Original Assignee
Kodak Pathe SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Pathe SA filed Critical Kodak Pathe SA
Application granted granted Critical
Publication of FR1167737A publication Critical patent/FR1167737A/fr
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/08Anhydrides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/02Alkylation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/18Introducing halogen atoms or halogen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/44Preparation of metal salts or ammonium salts
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2800/00Copolymer characterised by the proportions of the comonomers expressed
    • C08F2800/20Copolymer characterised by the proportions of the comonomers expressed as weight or mass percentages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00Chemical modification of a polymer
    • C08F2810/30Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
FR1167737D 1955-09-15 1956-09-14 Nouveaux polymères photosensibles, procédé pour leur préparation et leurs applications industrielles Expired FR1167737A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US534598A US2811510A (en) 1955-09-15 1955-09-15 Light-sensitive polymeric stilbazoles and quaternary salts thereof

Publications (1)

Publication Number Publication Date
FR1167737A true FR1167737A (fr) 1958-11-28

Family

ID=24130746

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1167737D Expired FR1167737A (fr) 1955-09-15 1956-09-14 Nouveaux polymères photosensibles, procédé pour leur préparation et leurs applications industrielles

Country Status (3)

Country Link
US (1) US2811510A (fr)
FR (1) FR1167737A (fr)
GB (1) GB822932A (fr)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3131060A (en) * 1959-02-26 1964-04-28 Gevaert Photo Prod Nv Electrophotographic material
US3095404A (en) * 1959-04-07 1963-06-25 Hercules Powder Co Ltd Preparation of high viscosity watersoluble polycationics
DE1216690B (de) * 1960-10-03 1966-05-12 Renker Belipa G M B H Photoleitfaehige Schicht fuer ein elektrophotographisches Aufzeichnungsmaterial
DE1252060B (fr) * 1961-10-23
US3518081A (en) * 1964-02-17 1970-06-30 Xerox Corp Image formation and development
USRE29357E (en) * 1964-02-17 1977-08-16 Xerox Corporation Image formation and development
GB1098892A (en) * 1965-04-08 1968-01-10 Agfa Gevaert Ag Photosensitive materials prepared from homopolymers and copolymers of salts of n-vinylbenzyl-4-vinylpyridine
US3547634A (en) * 1965-11-02 1970-12-15 Keuffel & Esser Co Light sensitive composition containing a heterocyclic photoactivator having an -n+=c- group in the heterocyclic ring alkyl thereof and the photographic use thereof
US3907753A (en) * 1971-12-20 1975-09-23 Phillips Petroleum Co Sewage and water treatment with aldehyde modified quaternary salts of vinylpyridine copolymers
US3890147A (en) * 1972-04-18 1975-06-17 Xerox Corp Light activating imaging process
US3892180A (en) * 1972-04-18 1975-07-01 Xerox Corp Light activating imaging process
US3892570A (en) * 1972-04-18 1975-07-01 Xerox Corp Light activating imaging process
JPS5417831A (en) * 1977-07-11 1979-02-09 Fuji Photo Film Co Ltd Light image recording material and dry type light image recording method using this
US5334485A (en) * 1991-11-05 1994-08-02 The Chromaline Corporation Acid soluble photo-resist comprising a photosensitive polymer
US5326669A (en) * 1992-05-04 1994-07-05 Ulano Corporation Photosensitive compositions
US6020436A (en) * 1993-03-09 2000-02-01 The Chromaline Corporation Photosensitive resin composition
US5415971A (en) * 1993-04-02 1995-05-16 The Chromaline Corporation Photoresist laminate including photoimageable adhesive layer
WO1995012148A1 (fr) * 1993-10-26 1995-05-04 The Chromaline Corporation Composition pour pochoir de serigraphie presentant une resistance a l'eau amelioree
FR3046072B1 (fr) 2015-12-23 2018-05-25 L'oreal Procede de traitement des matieres keratiniques au moyen d'une composition comprenant un polymere photodimerisable modifie
FR3090364B1 (fr) 2018-12-21 2021-06-18 Oreal Composition comprenant un polymere photodimerisable modifie et un agent alcalin et/ou un derive amine d’alcoxysilane et procede de traitement mettant en œuvre la composition
FR3131200A1 (fr) 2021-12-23 2023-06-30 L'oreal Composition comprenant un polymère photoréticulable et un agent colorant
FR3131201A1 (fr) 2021-12-23 2023-06-30 L'oreal Procédé pour démaquiller des fibres kératiniques ayant été préalablement traitées par une composition comprenant un polymère photoréticulable
FR3131317A1 (fr) 2021-12-23 2023-06-30 L'oreal Polymères photodimérisables comprenant au moins un groupement polyoxyalkyléné, composition les comprenant et procédé de traitement cosmétique
FR3146276A1 (fr) 2023-03-03 2024-09-06 L'oreal Procede de traitement des fibres keratiniques mettant en œuvre un compose reticulable, un photo-initiateur polymerique et une irradiation lumineuse

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2255077A (en) * 1938-03-21 1941-09-09 Du Pont Film Mfg Corp Filter dyes for color photography
US2612446A (en) * 1949-09-15 1952-09-30 Du Pont Photographic elements having a light-sensitive silver halide layer and a stripping layer composed of a polyvinyl pyridine quaternary salt and process of using such elements

Also Published As

Publication number Publication date
GB822932A (en) 1959-11-04
US2811510A (en) 1957-10-29

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