US2697690A
(en)
*
|
1948-12-22 |
1954-12-21 |
Federal Mogul Corp |
Electroplating rack
|
US2675348A
(en)
*
|
1950-09-16 |
1954-04-13 |
Greenspan Lawrence |
Apparatus for metal plating
|
US2727858A
(en)
*
|
1952-04-07 |
1955-12-20 |
Gen Motors Corp |
Plating fixture
|
US2761831A
(en)
*
|
1952-05-17 |
1956-09-04 |
Gen Motors Corp |
Electroplating fixture
|
US2739117A
(en)
*
|
1952-06-18 |
1956-03-20 |
Gen Motors Corp |
Electroplating fixture
|
US2801963A
(en)
*
|
1953-12-08 |
1957-08-06 |
Ann F Hull |
Apparatus for the determination of plating characteristics of plating baths
|
US2913170A
(en)
*
|
1954-07-16 |
1959-11-17 |
Phillips Petroleum Co |
Electrolytic analogue for approximately simulating extensions in space to infinity
|
US2944945A
(en)
*
|
1955-07-29 |
1960-07-12 |
Gen Motors Corp |
Electroplating
|
US2859166A
(en)
*
|
1955-09-15 |
1958-11-04 |
Pennsalt Chemicals Corp |
Shielding means for effecting uniform plating of lead dioxide in the formation of lead dioxide electrodes
|
US3226308A
(en)
*
|
1961-06-15 |
1965-12-28 |
Clevite Corp |
Electrochemical treating method and apparatus
|
US3133007A
(en)
*
|
1961-06-29 |
1964-05-12 |
Federal Mogul Bower Bearings |
Plating apparatus
|
US3282824A
(en)
*
|
1962-12-17 |
1966-11-01 |
Federal Mogul Bower Bearings |
Dual sided plating rack
|
US3290239A
(en)
*
|
1963-07-12 |
1966-12-06 |
Federal Mogul Corp |
Box plating rack
|
US3331764A
(en)
*
|
1964-02-24 |
1967-07-18 |
Federal Mogul Corp |
Box-type plating rack
|
US3929592A
(en)
*
|
1974-07-22 |
1975-12-30 |
Gen Motors Corp |
Plating apparatus and method for rotary engine housings
|
US4950375A
(en)
*
|
1989-05-26 |
1990-08-21 |
United Technologies Corporation |
Die for electroforming a part
|
US5200048A
(en)
*
|
1989-11-30 |
1993-04-06 |
Daido Metal Company Ltd. |
Electroplating apparatus for plating half bearings
|
JPH0781199B2
(en)
*
|
1989-11-30 |
1995-08-30 |
大同メタル工業株式会社 |
Method and apparatus for surface treatment of intermediate product of half type slide bearing
|
EP1052062A1
(en)
*
|
1999-05-03 |
2000-11-15 |
Applied Materials, Inc. |
Pré-conditioning fixed abrasive articles
|
US7678245B2
(en)
*
|
2000-02-17 |
2010-03-16 |
Applied Materials, Inc. |
Method and apparatus for electrochemical mechanical processing
|
US7077721B2
(en)
|
2000-02-17 |
2006-07-18 |
Applied Materials, Inc. |
Pad assembly for electrochemical mechanical processing
|
US20080156657A1
(en)
*
|
2000-02-17 |
2008-07-03 |
Butterfield Paul D |
Conductive polishing article for electrochemical mechanical polishing
|
US7125477B2
(en)
*
|
2000-02-17 |
2006-10-24 |
Applied Materials, Inc. |
Contacts for electrochemical processing
|
US20050092621A1
(en)
*
|
2000-02-17 |
2005-05-05 |
Yongqi Hu |
Composite pad assembly for electrochemical mechanical processing (ECMP)
|
US7303462B2
(en)
*
|
2000-02-17 |
2007-12-04 |
Applied Materials, Inc. |
Edge bead removal by an electro polishing process
|
US7303662B2
(en)
*
|
2000-02-17 |
2007-12-04 |
Applied Materials, Inc. |
Contacts for electrochemical processing
|
US7059948B2
(en)
*
|
2000-12-22 |
2006-06-13 |
Applied Materials |
Articles for polishing semiconductor substrates
|
US7029365B2
(en)
|
2000-02-17 |
2006-04-18 |
Applied Materials Inc. |
Pad assembly for electrochemical mechanical processing
|
US6979248B2
(en)
*
|
2002-05-07 |
2005-12-27 |
Applied Materials, Inc. |
Conductive polishing article for electrochemical mechanical polishing
|
US20040020789A1
(en)
*
|
2000-02-17 |
2004-02-05 |
Applied Materials, Inc. |
Conductive polishing article for electrochemical mechanical polishing
|
US7670468B2
(en)
*
|
2000-02-17 |
2010-03-02 |
Applied Materials, Inc. |
Contact assembly and method for electrochemical mechanical processing
|
US7374644B2
(en)
*
|
2000-02-17 |
2008-05-20 |
Applied Materials, Inc. |
Conductive polishing article for electrochemical mechanical polishing
|
US6991528B2
(en)
*
|
2000-02-17 |
2006-01-31 |
Applied Materials, Inc. |
Conductive polishing article for electrochemical mechanical polishing
|
US7066800B2
(en)
*
|
2000-02-17 |
2006-06-27 |
Applied Materials Inc. |
Conductive polishing article for electrochemical mechanical polishing
|
US6962524B2
(en)
*
|
2000-02-17 |
2005-11-08 |
Applied Materials, Inc. |
Conductive polishing article for electrochemical mechanical polishing
|
US6321712B1
(en)
|
2000-04-07 |
2001-11-27 |
Dana Corporation |
Racing engine having trimetal bearings with a thick overlay for high speed and/or high load applications
|
US7137879B2
(en)
*
|
2001-04-24 |
2006-11-21 |
Applied Materials, Inc. |
Conductive polishing article for electrochemical mechanical polishing
|
US7344432B2
(en)
*
|
2001-04-24 |
2008-03-18 |
Applied Materials, Inc. |
Conductive pad with ion exchange membrane for electrochemical mechanical polishing
|
US20050194681A1
(en)
*
|
2002-05-07 |
2005-09-08 |
Yongqi Hu |
Conductive pad with high abrasion
|
US20050178666A1
(en)
*
|
2004-01-13 |
2005-08-18 |
Applied Materials, Inc. |
Methods for fabrication of a polishing article
|
US20060030156A1
(en)
*
|
2004-08-05 |
2006-02-09 |
Applied Materials, Inc. |
Abrasive conductive polishing article for electrochemical mechanical polishing
|
US7084064B2
(en)
*
|
2004-09-14 |
2006-08-01 |
Applied Materials, Inc. |
Full sequence metal and barrier layer electrochemical mechanical processing
|
WO2006039436A2
(en)
*
|
2004-10-01 |
2006-04-13 |
Applied Materials, Inc. |
Pad design for electrochemical mechanical polishing
|
US7520968B2
(en)
*
|
2004-10-05 |
2009-04-21 |
Applied Materials, Inc. |
Conductive pad design modification for better wafer-pad contact
|
US20060219663A1
(en)
*
|
2005-03-31 |
2006-10-05 |
Applied Materials, Inc. |
Metal CMP process on one or more polishing stations using slurries with oxidizers
|
US7427340B2
(en)
*
|
2005-04-08 |
2008-09-23 |
Applied Materials, Inc. |
Conductive pad
|
TW200720494A
(en)
*
|
2005-11-01 |
2007-06-01 |
Applied Materials Inc |
Ball contact cover for copper loss reduction and spike reduction
|
US20070135024A1
(en)
*
|
2005-12-08 |
2007-06-14 |
Itsuki Kobata |
Polishing pad and polishing apparatus
|
US20080293343A1
(en)
*
|
2007-05-22 |
2008-11-27 |
Yuchun Wang |
Pad with shallow cells for electrochemical mechanical processing
|
DE102010000853A1
(en)
|
2010-01-13 |
2011-07-14 |
Federal-Mogul Wiesbaden GmbH, 65201 |
Holder for galvanic coating of plain bearings and tools with a holder
|
GB2512939A
(en)
*
|
2013-04-12 |
2014-10-15 |
Mahle Int Gmbh |
Electroplating rack
|