FI901923A0 - Foerfarande foer framstaellning av enhetliga tunna skikt. - Google Patents

Foerfarande foer framstaellning av enhetliga tunna skikt.

Info

Publication number
FI901923A0
FI901923A0 FI901923A FI901923A FI901923A0 FI 901923 A0 FI901923 A0 FI 901923A0 FI 901923 A FI901923 A FI 901923A FI 901923 A FI901923 A FI 901923A FI 901923 A0 FI901923 A0 FI 901923A0
Authority
FI
Finland
Prior art keywords
enhetliga
tunna
skikt
foerfarande foer
foer framstaellning
Prior art date
Application number
FI901923A
Other languages
English (en)
Finnish (fi)
Inventor
Harald Fuchs
Dirk Funhoff
Ulrike Licht
Wolfgang Schrepp
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of FI901923A0 publication Critical patent/FI901923A0/fi

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/18Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/185Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/18Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/20Processes for applying liquids or other fluent materials performed by dipping substances to be applied floating on a fluid
    • B05D1/202Langmuir Blodgett films (LB films)
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/0427Coating with only one layer of a composition containing a polymer binder
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2379/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
    • C08J2379/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2379/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2483/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Materials Engineering (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Composite Materials (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Silicon Polymers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
FI901923A 1989-04-17 1990-04-17 Foerfarande foer framstaellning av enhetliga tunna skikt. FI901923A0 (fi)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3912533A DE3912533A1 (de) 1989-04-17 1989-04-17 Verfahren zur herstellung von gleichmaessigen duennen schichten

Publications (1)

Publication Number Publication Date
FI901923A0 true FI901923A0 (fi) 1990-04-17

Family

ID=6378824

Family Applications (1)

Application Number Title Priority Date Filing Date
FI901923A FI901923A0 (fi) 1989-04-17 1990-04-17 Foerfarande foer framstaellning av enhetliga tunna skikt.

Country Status (7)

Country Link
EP (1) EP0393551A3 (fr)
JP (1) JPH02307572A (fr)
KR (1) KR900017113A (fr)
AU (1) AU5326090A (fr)
CA (1) CA2012086A1 (fr)
DE (1) DE3912533A1 (fr)
FI (1) FI901923A0 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0506425A3 (fr) * 1991-03-26 1992-12-02 Kabushiki Kaisha Toshiba Film monomoléculaire de polysilane et film composé de couches de polysilane
DE69220717T2 (de) * 1991-04-30 1997-11-06 Matsushita Electric Ind Co Ltd Chemisch adsorbierte Schicht und Verfahren zu deren Herstellung
EP0799688B1 (fr) * 1991-04-30 2002-10-02 Matsushita Electric Industrial Co., Ltd Couche chimiquement adsorbé hydrophilique et procédé pour sa fabrication
WO1994021386A2 (fr) * 1993-03-25 1994-09-29 Research Corporation Technologies, Inc. Polymeres utiles pour la formation de couches ultra-minces anisotropes collees auto-assemblees et leur utilisation
DE4333107A1 (de) * 1993-09-29 1995-03-30 Bayer Ag Auf Trägern angebrachte ein- oder mehrlagige Schichtelemente und ihre Herstellung
US6632872B1 (en) 2000-09-19 2003-10-14 3M Innovative Properties Company Adhesive compositions including self-assembling molecules, adhesives, articles, and methods

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4493714A (en) * 1982-05-06 1985-01-15 Teijin Limited Ultrathin film, process for production thereof, and use thereof for concentrating a specified gas in a gaseous mixture
EP0204963B1 (fr) * 1985-05-10 1993-01-13 Hitachi, Ltd. Utilisation des Polymères de silsesquioxanes solubles dans un milieu alcalin dans un résiste pour la préparation des composants électroniques.
US4822716A (en) * 1985-12-27 1989-04-18 Kabushiki Kaisha Toshiba Polysilanes, Polysiloxanes and silicone resist materials containing these compounds
EP0244835B1 (fr) * 1986-05-09 1992-08-26 Nippon Oil And Fats Company, Limited Membrane ultra-mince du type Langmuir-Blodgett comportant des polyfumurates

Also Published As

Publication number Publication date
EP0393551A2 (fr) 1990-10-24
DE3912533A1 (de) 1990-10-18
CA2012086A1 (fr) 1990-10-17
KR900017113A (ko) 1990-11-15
EP0393551A3 (fr) 1991-11-27
AU5326090A (en) 1990-10-18
JPH02307572A (ja) 1990-12-20

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Legal Events

Date Code Title Description
FD Application lapsed
MM Patent lapsed

Owner name: BASF AKTIENGESELLSCHAFT