FI901923A0 - FOERFARANDE FOER FRAMSTAELLNING AV ENHETLIGA TUNNA SKIKT. - Google Patents

FOERFARANDE FOER FRAMSTAELLNING AV ENHETLIGA TUNNA SKIKT.

Info

Publication number
FI901923A0
FI901923A0 FI901923A FI901923A FI901923A0 FI 901923 A0 FI901923 A0 FI 901923A0 FI 901923 A FI901923 A FI 901923A FI 901923 A FI901923 A FI 901923A FI 901923 A0 FI901923 A0 FI 901923A0
Authority
FI
Finland
Prior art keywords
enhetliga
tunna
skikt
foerfarande foer
foer framstaellning
Prior art date
Application number
FI901923A
Other languages
Finnish (fi)
Inventor
Harald Fuchs
Dirk Funhoff
Ulrike Licht
Wolfgang Schrepp
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of FI901923A0 publication Critical patent/FI901923A0/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/20—Processes for applying liquids or other fluent materials performed by dipping substances to be applied floating on a fluid
    • B05D1/202—Langmuir Blodgett films (LB films)
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/0427—Coating with only one layer of a composition containing a polymer binder
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
    • C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2379/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2483/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Composite Materials (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials Engineering (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Silicon Polymers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
FI901923A 1989-04-17 1990-04-17 FOERFARANDE FOER FRAMSTAELLNING AV ENHETLIGA TUNNA SKIKT. FI901923A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3912533A DE3912533A1 (en) 1989-04-17 1989-04-17 METHOD FOR THE PRODUCTION OF Uniform Thick Layers

Publications (1)

Publication Number Publication Date
FI901923A0 true FI901923A0 (en) 1990-04-17

Family

ID=6378824

Family Applications (1)

Application Number Title Priority Date Filing Date
FI901923A FI901923A0 (en) 1989-04-17 1990-04-17 FOERFARANDE FOER FRAMSTAELLNING AV ENHETLIGA TUNNA SKIKT.

Country Status (7)

Country Link
EP (1) EP0393551A3 (en)
JP (1) JPH02307572A (en)
KR (1) KR900017113A (en)
AU (1) AU5326090A (en)
CA (1) CA2012086A1 (en)
DE (1) DE3912533A1 (en)
FI (1) FI901923A0 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0506425A3 (en) * 1991-03-26 1992-12-02 Kabushiki Kaisha Toshiba Polysilane monomolecular film and polysilane built-up film
DE69220717T2 (en) * 1991-04-30 1997-11-06 Matsushita Electric Industrial Co., Ltd., Kadoma, Osaka Chemically adsorbed layer and process for its production
EP0799688B1 (en) * 1991-04-30 2002-10-02 Matsushita Electric Industrial Co., Ltd Hydrophilic chemically adsorbed film & method of manufacturing the same
WO1994021386A2 (en) * 1993-03-25 1994-09-29 Research Corporation Technologies, Inc. Polymers useful in forming self-assembled bonded anisotropic ultrathin layers and their use
DE4333107A1 (en) * 1993-09-29 1995-03-30 Bayer Ag Single-layer or multilayer layer elements attached to supports and their production
US6632872B1 (en) 2000-09-19 2003-10-14 3M Innovative Properties Company Adhesive compositions including self-assembling molecules, adhesives, articles, and methods

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4493714A (en) * 1982-05-06 1985-01-15 Teijin Limited Ultrathin film, process for production thereof, and use thereof for concentrating a specified gas in a gaseous mixture
EP0204963B1 (en) * 1985-05-10 1993-01-13 Hitachi, Ltd. Use of Alkali-Soluble Polyorganosilsesquioxane Polymers in a resist for preparing electronics parts.
US4822716A (en) * 1985-12-27 1989-04-18 Kabushiki Kaisha Toshiba Polysilanes, Polysiloxanes and silicone resist materials containing these compounds
EP0244835B1 (en) * 1986-05-09 1992-08-26 Nippon Oil And Fats Company, Limited Langmuir-blodgett ultrathin membrane of polyfumurate

Also Published As

Publication number Publication date
DE3912533A1 (en) 1990-10-18
EP0393551A2 (en) 1990-10-24
EP0393551A3 (en) 1991-11-27
AU5326090A (en) 1990-10-18
JPH02307572A (en) 1990-12-20
KR900017113A (en) 1990-11-15
CA2012086A1 (en) 1990-10-17

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Legal Events

Date Code Title Description
FD Application lapsed
MM Patent lapsed

Owner name: BASF AKTIENGESELLSCHAFT